Elaine G Kokinda

US Patent:

57190046, Feb 17, 1998

Filed:

Aug 7, 1996

Appl. No.:

8/695157

Inventors:

Ping-Hung Lu - Bridgewater NJ
Ralph R. Dammel - Flemington NJ
Elaine G. Kokinda - Somerville NJ
Sunit S. Dixit - Flemington NJ

Assignee:

Clariant Finance (BVI) Limited

International Classification:

G03F 7023

US Classification:

430191

Abstract:

A light-sensitive positive photoresist composition containing a film forming novolak resin, a quinone-diazide photoactive compound, a solvent, and a 2,4-dinitro-1-naphthol dye, where the dye is present at a level greater than 0. 5 weight percent of the total photoresist composition. The dye reduces the linewidth variation of the resist pattern on a reflective substrate without significantly reducing the lithographic performance of the light-sensitive composition.

US Patent:

56655177, Sep 9, 1997

Filed:

Jan 11, 1996

Appl. No.:

8/587874

Inventors:

M. Dalil Rahman - Flemington NJ
Daniel P. Aubin - Voluntown CT
Elaine G. Kokinda - Somerville NJ
Dana L. Durham - Flemington NJ

Assignee:

Hoechst Celanese Corporation - Somerville NJ

International Classification:

G03F 7004
C08F 600
C02F 142

US Classification:

4302701

Abstract:

The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having consistent molecular weight and a very low level of metal ions, utilizing a solid acid condensation catalyst. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.