Emmanuel G Cooper

US Patent:

20180148669, May 31, 2018

Filed:

Nov 22, 2017

Appl. No.:

15/821217

Inventors:

- Billerica MA, US
Emmanuel I. Cooper - Scarsdale NY, US
WonLae Kim - Gyeonggi-do, KR
Eric Hong - Gyeonggi-do, KR
Sean Kim - Gyeonggi-do, KR

International Classification:

C11D 3/33
C11D 1/62
C11D 3/28
C11D 3/06
C11D 3/20
C11D 3/43
C11D 3/39
H01L 21/02

Abstract:

The disclosure relates to a cleaning composition that aids in the removal of post-etch residues in the production of semiconductors. There is provided a stock composition comprising: a tetraalkylammonium hydroxide base or a quaternary trialkylalkanolamine base; a corrosion inhibitor; and a combination of at least two or more polyprotic acids or salts thereof, wherein at least one said polyprotic acid or salt thereof contains phosphorous.