Enrico G Zordan

US Patent:

20110194094, Aug 11, 2011

Filed:

Feb 7, 2011

Appl. No.:

13/022247

Inventors:

Enrico ZORDAN - Norwalk CT, US

Assignee:

ASML Holding NV - Veldhoven

International Classification:

G03B 27/58

US Classification:

355 72, 355 77

Abstract:

A support structure for positioning an exchangeable object in a lithographic apparatus. The support structure has a chuck to support and clamp the object and an actuating structure. The actuating structure may have a first actuating structure (e.g., spring) and a second actuating structure (e.g., linear actuator). The first actuating structure is moveable relative to the chuck and is configured to move the second actuating structure between a first position in contact with a side of the object and a second position out of contact with the side of the object. The second actuating structure is configured to move at least a portion thereof relative to the first actuating structure between a first position in contact with the side of the object and a second position out of contact with the side of the object and to apply a pushing force to the side of the object.

US Patent:

20120002187, Jan 5, 2012

Filed:

Jun 24, 2011

Appl. No.:

13/168109

Inventors:

Enrico ZORDAN - Norwalk CT, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G03B 27/60

US Classification:

355 73

Abstract:

A support structure for positioning an exchangeable object (e.g., patterning device) in a lithographic apparatus. The support structure has a chuck and at least two clamp mechanisms spaced from one another in a first direction. Each clamp mechanism has a plurality of vacuum sections to support the object and apply a localized clamping force to the object to hold the object. The separation between the vacuum sections is in a second direction different from the first direction. The support structure may have a chuck and a clamp mechanism having a plurality of clamp sections to support the object and apply a clamping force to the object. The sections may move relative to each other. Each section may include a channel to communicate a low pressure to hold the object. The stiffness of the clamp mechanism(s) reduces and/or avoids stress and/or slip at the interface of the chuck/clamp and object.

US Patent:

20120170016, Jul 5, 2012

Filed:

Dec 8, 2011

Appl. No.:

13/315194

Inventors:

Enrico ZORDAN - Norwalk CT, US

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G03B 27/58
H02K 15/00
H02K 41/02

US Classification:

355 72, 310 1229, 310 1219, 310 1206, 29593

Abstract:

A linear motor for vacuum environment includes a core and a housing. The core includes a plurality of cooling plates and a plurality of electrical coils sandwiched between the plurality of cooling plates. The core further includes a plurality of thermally conductive epoxy layers positioned between the plurality of electrical coils and the plurality of cooling plates, and a plurality of shims located between the plurality of electrical coils and the plurality of cooling plates to determine a distance between the plurality of electrical coils and the plurality of cooling plates. The core is assembled and tested independently and before being assembled in the housing. The housing encloses the core and includes a body, a plurality of feed throughs, and a lid.

US Patent:

20100195081, Aug 5, 2010

Filed:

Nov 30, 2009

Appl. No.:

12/627771

Inventors:

Santiago E. DEL PUERTO - Milton NY, US
Enrico Zordan - Norwalk CT, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G03B 27/58
G03B 27/32

US Classification:

355 72, 355 77

Abstract:

A system and method substantially eliminate reticle slip during the movement of a reticle stage. The system includes a mask holding system, a mask force device, and a support transport device. The mask holding system includes a support device and a holding device where the holding device releasably couples a mask, e.g., a patterning device such as a reticle having a pattern, to the support device. The mask force device is releasably connected to the mask in order to provide an accelerating force to the mask, such that a projection optic in a lithographic apparatus may accurately project a pattern imparted by the patterning device onto a target portion of the substrate by using a radiation beam. The support transport device is coupled to and moves the mask support device concurrently with the mask force device.

US Patent:

20160258972, Sep 8, 2016

Filed:

Oct 15, 2014

Appl. No.:

15/028823

Inventors:

- Tarrytown NY, US
Enrico Zordan - Darien CT, US

Assignee:

Siemens Healthcare Diagnostics Inc. - Tarrytown NY

International Classification:

G01N 35/10
G01N 35/00
G01L 11/04
B01L 3/02

Abstract:

An aspiration apparatus adapted to allow aspiration verification of a liquid such as of a biological liquid or reagent liquid, especially at low aspiration volumes (e.g., less than 25 μL). The apparatus includes a pump operable at an operating frequency, the pump optionally including a pumping chamber, a probe having a probe interior, a main supply line containing a backing liquid coupled to and extending from the pump and including the probe interior, a striction coupled to the main supply line, or the pump chamber, if present, and a reservoir fluidly coupled to the striction, wherein the striction is sized to minimize backing liquid flow through the striction at one or more disturbance frequencies above the operating frequency. Systems and methods for carrying out the liquid aspiration are provided, as are other aspects.