Eric M Cox

US Patent:

6367414, Apr 9, 2002

Filed:

Jan 10, 2001

Appl. No.:

09/758839

Inventors:

Matthew R. Witzman - Rohnert Park CA
Christopher W. Lantman - Santa Rosa CA
Eric R. Cox - Healdsburg CA

Assignee:

Flex Products, Inc. - Santa Rosa CA

International Classification:

C23C 1414

US Classification:

118723VE, 118726, 118718

Abstract:

A linear aperture deposition apparatus and process are provided for coating substrates with sublimed or evaporated coating materials. The apparatus and process are particularly suited for producing flexible films having an optical interference coating with a very high surface thickness uniformity and which is substantially free of defects from particulate ejection of a source material. The apparatus includes a source box containing a source material, a heating element to sublime or evaporate the source material, and a chimney to direct the source material vapor from the source box to a substrate. A flow restricting baffle having a plurality of holes is positioned between the source material and the substrate to confine and direct the vapor flow, and an optional floating baffle is positioned on the surface of the source material to further restrict the vapor flow, thereby substantially eliminating source material spatter.

US Patent:

6534705, Mar 18, 2003

Filed:

Jul 24, 2001

Appl. No.:

09/912775

Inventors:

Jesus Berrios - Daly City CA
Eric L. Cox - Burlingame CA
Terry J. Porter - Ridgecrest CA

Assignee:

Power Beaming Corporation - Burlingame CA

International Classification:

H01L 31042

US Classification:

136292, 136244, 136291, 244173, 244 1 R, 323906, 323221, 322 2 R

Abstract:

Methods and apparatus for beaming power from one location to another are provided. Energy is used to power one or more lasers to provide a coherent, wide-aperture beam, which is directed to the receiving platform. Photovoltaic cells on the receiving platform convert energy of the laser beam into electrical energy. Receiving platforms are provided that take advantage of the higher energy density in the laser beam.

US Patent:

20010005553, Jun 28, 2001

Filed:

Jan 10, 2001

Appl. No.:

09/758408

Inventors:

Matthew Witzman - Rohnert Park CA, US
Richard Bradley - Santa Rosa CA, US
Christopher Lantman - Santa Rosa CA, US
Eric Cox - Healdsburg CA, US

International Classification:

C23C016/00

US Classification:

428/402000, 427/248100, 118/7230VE

Abstract:

A linear aperture deposition apparatus and process are provided for coating substrates with sublimed or evaporated coating materials. The apparatus and process are particularly suited for producing flexible films having an optical interference coating with a very high surface thickness uniformity and which is substantially free of defects from particulate ejection of a source material. The apparatus includes a source box containing a source material, a heating element to sublime or evaporate the source material, and a chimney to direct the source material vapor from the source box to a substrate. A flow restricting baffle having a plurality of holes is positioned between the source material and the substrate to confine and direct the vapor flow, and an optional floating baffle is positioned on the surface of the source material to further restrict the vapor flow, thereby substantially eliminating source material spatter.

US Patent:

20010021455, Sep 13, 2001

Filed:

Jan 10, 2001

Appl. No.:

09/758837

Inventors:

Matthew Witzman - Rohnert Park CA, US
Richard Bradley - Santa Rosa CA, US
Christopher Lantman - Santa Rosa CA, US
Eric Cox - Healdsburg CA, US

International Classification:

B32B009/00
C23C014/00

US Classification:

428/428000, 428/432000, 428/458000, 428/691000

Abstract:

A linear aperture deposition apparatus and process are provided for coating substrates with sublimed or evaporated coating materials. The apparatus and process are particularly suited for producing flexible films having an optical interference coating with a very high surface thickness uniformity and which is substantially free of defects from particulate ejection of a source material. The apparatus includes a source box containing a source material, a heating element to sublime or evaporate the source material, and a chimney to direct the source material vapor from the source box to a substrate. A flow restricting baffle having a plurality of holes is positioned between the source material and the substrate to confine and direct the vapor flow, and an optional floating baffle is positioned on the surface of the source material to further restrict the vapor flow, thereby substantially eliminating source material spatter.

US Patent:

62025910, Mar 20, 2001

Filed:

Nov 10, 1999

Appl. No.:

9/437684

Inventors:

Matthew R. Witzman - Rohnert Park CA
Richard A. Bradley - Santa Rosa CA
Christopher W. Lantman - Santa Rosa CA
Eric R. Cox - Healdsburg CA

Assignee:

Flex Products, Inc. - Santa Rosa CA

International Classification:

C23C 1414
C23C 1424
C23C 1426

US Classification:

118723VE

Abstract:

A linear aperture deposition apparatus and process are provided for coating substrates with sublimed or evaporated coating materials. The apparatus and process are particularly suited for producing flexible films having an optical interference coating with a very high surface thickness uniformity and which is substantially free of defects from particulate ejection of a source material. The apparatus includes a source box containing a source material, a heating element to sublime or evaporate the source material, and a chimney to direct the source material vapor from the source box to a substrate. A flow restricting baffle having a plurality of holes is positioned between the source material and the substrate to confine and direct the vapor flow, and an optional floating baffle is positioned on the surface of the source material to further restrict the vapor flow, thereby substantially eliminating source material spatter.