Erik A Johnson

US Patent:

7830252, Nov 9, 2010

Filed:

Aug 28, 2003

Appl. No.:

10/650464

Inventors:

Shawn P. Keeney - Eatontown NJ, US
Joseph Kosich - South Toms River NJ, US
Luy B. Nguyen - Colts Neck NJ, US
John Yerger - Harleysville PA, US
Erik Johnson - Philadelphia PA, US

Assignee:

Wheelock, Inc. - Long Branch NJ

International Classification:

G08B 21/00

US Classification:

340540, 34053927, 340577, 340581, 340628, 340692

Abstract:

The present invention is an ASIC-controlled alarm unit. The ASIC circuit performs all the necessary control functions to provide audible and visual signaling when used with external horn and strobe circuits.

US Patent:

20110050448, Mar 3, 2011

Filed:

Nov 8, 2010

Appl. No.:

12/941897

Inventors:

SHAWN P. KEENEY - Eatontown NJ, US
Joseph Kosich - South Toms River NJ, US
Luy B. Nguyen - Colts Neck NJ, US
John Yerger - Harleysville PA, US
Erik Johnson - Philadelphia PA, US

International Classification:

G08B 5/38

US Classification:

3406918

Abstract:

The present invention is an ASIC-controlled alarm unit. The ASIC circuit performs all the necessary control functions to provide audible and visual signaling when used with external horn and strobe circuits.

US Patent:

56795025, Oct 21, 1997

Filed:

Mar 15, 1995

Appl. No.:

8/405662

Inventors:

David Peter Siddons - Shoreham NY
Erik D. Johnson - Ridge NY
Henry Guckel - Madison WI
Jonathan L. Klein - Madison WI

Assignee:

Wisconsin Alumni Research Foundation - Madison WI

International Classification:

B23P 1700

US Classification:

430397

Abstract:

An X-ray source such as a synchrotron which provides a significant spectral content of hard X-rays is used to expose relatively thick photoresist such that the portions of the photoresist at an exit surface receive at least a threshold dose sufficient to render the photoresist susceptible to a developer, while the entrance surface of the photoresist receives an exposure which does not exceed a power limit at which destructive disruption of the photoresist would occur. The X-ray beam is spectrally shaped to substantially eliminate lower energy photons while allowing a substantial flux of higher energy photons to pass through to the photoresist target. Filters and the substrate of the X-ray mask may be used to spectrally shape the X-ray beam. Machining of photoresists such as polymethylmethacrylate to micron tolerances may be obtained to depths of several centimeters, and multiple targets may be exposed simultaneously. The photoresist target may be rotated and/or translated in the beam to form solids of rotation and other complex three-dimensional structures.