Eugene B Recla

Deceased

from Hamburg, NY

Also known as:
  • Gene Recla
Phone and address:
37 Birkshire Rd, Hamburg, NY 14075
7166496326

Eugene Recla Phones & Addresses

  • 37 Birkshire Rd, Hamburg, NY 14075 • 7166496326

Us Patents

  • Process For The Conversion Of Boron Trifluoride Dimethyl Ether Complex To The Boron Trifluoride Dialkyl Ether Complex

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  • US Patent:
    43717071, Feb 1, 1983
  • Filed:
    Dec 15, 1980
  • Appl. No.:
    6/216045
  • Inventors:
    Richard E. Eibeck - Orchard Park NY
    Martin A. Robinson - East Amherst NY
    Francis E. Evans - Hamburg NY
    Eugene B. Recla - Hamburg NY
  • Assignee:
    Allied Corporation - Morris Township, Morris County NJ
  • International Classification:
    C07F 502
  • US Classification:
    568 6
  • Abstract:
    A process for the conversion of boron trifluoride dimethyl ether complex to boron trifluoride dialkyl ether complex substantially free of dimethyl ether impurities, which comprises reacting the boron trifluoride-dimethyl ether complex, in the liquid phase, in the presence of dialkyl ether wherein at least one of the alkyl groups contains at least two carbon atoms, in a restricted vapor equilibration region, while simultaneously sweeping the said vapor equilibration region with a substantially inert gas, and heating to distill off the dimethyl ether. High purity of the boron trifluoride dialkyl ether complex is attained with this method, with only minimal traces of the boron trifluoride dimethyl ether complex, dimethyl ether remaining. The preferred product is boron trifluoride diethyl ether.
  • Recovery Of Gadolinium And Gallium Oxides

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  • US Patent:
    43754538, Mar 1, 1983
  • Filed:
    Dec 28, 1981
  • Appl. No.:
    6/334719
  • Inventors:
    David Nalewajek - West Seneca NY
    Eugene B. Recla - Hamburg NY
    Robert A. Wiles - Hamburg NY
    Richard E. Eibeck - Orchard Park NY
  • Assignee:
    Allied Corporation - Morris Township, Morris County NJ
  • International Classification:
    C01G 1500
    C01F 1700
  • US Classification:
    423 211
  • Abstract:
    Gd. sub. 2 O. sub. 3 and Ga. sub. 2 O. sub. 3 are currently used for the fabrication of Gd. sub. 3 Ga. sub. 5 O. sub. 12 (GGG) wafers which are employed as substrates for bubble domain memory devices. In the processing, in the order of 25% of the starting material ends up as process "saw kerf" contaminated with variable amounts of iron, nickel, magnesium, aluminum, zirconium, iridium and silicon. A process is described whereby the "saw kerf" can be reprocessed in sufficient purity to be re-used in the process, thereby improving the economics of production of GGG wafers significantly. Gadolinium and gallium oxides are recovered and separated from transition metal impurities introduced during fabrication of GGG wafers. The process "saw kerf" produced from slicing the crystal boule is dissolved in HCl, treated with H. sub. 2 SO. sub. 4, and the resulting sulfates separated.

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Roy Recla Ir Mountain MI

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Stella Recla Iron Mountain, MI 75 Daniel Recla La Barge, WY 47 Eugene Recla Iron Mountain, MI 78

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