Feng Pan

US Patent:

8173347, May 8, 2012

Filed:

Aug 11, 2005

Appl. No.:

11/201915

Inventors:

Jeffrey T. Koberstein - Storrs CT, US
Feng Pan - New York NY, US
Kwangjoo Lee - New York NY, US
Peng Wang - New York NY, US

Assignee:

The Trustees of Columbia University in the City of New York - New York NY

International Classification:

G03F 7/00

US Classification:

430269, 4302701, 430296, 430322, 430324, 430396

Abstract:

A method for surface micropatterning includes forming on a surface containing a first polymer a first coating containing a second polymer having first functionalities capable of being converted to second functionalities by exposure to an acid. A second coating containing a photoacid generator is formed on the first coating. The second coating containing the photoacid generator is selectively irradiated in one or more regions thereof with radiation having a spatially varying internsity pattern to generate an acid in each irradiated region of the second coating. The acid converts the first functionalities of each region of the second polymer underlying a respective irradiated region of the second coating to second functionalities. A first molecular patterned surface having one or more regions of the first functionalities and one or more regions of the second functionalities is formed.

US Patent:

8263192, Sep 11, 2012

Filed:

Jun 16, 2006

Appl. No.:

11/454652

Inventors:

Jeffrey T. Koberstein - Storrs CT, US
Peng Wang - Ann Arbor MI, US
Feng Pan - New York NY, US

Assignee:

The Trustees of Columbia University in the City of New York - New York NY

International Classification:

B05D 5/00
B05D 3/06
C08J 7/18

US Classification:

427553, 427 213, 427333, 4274071

Abstract:

The invention is directed to methods for coating monolayer films of surface-active polymers onto substrates of arbitrary shape, and molecular-based methods and processes to control the chemical and physical nature of surfaces and interfaces. The invention is also directed to methods for modifying a surface of a monolayer comprising a) coating a monolayer on a substrate, wherein the monolayer is formed by self-assembly of end-surfactant molecules, thereby positioning a photoactive functional group at the air-monolayer interface; and b) exposing the monolayer to radiation, wherein each organic group of the monolayer contains a first functionality that is not converted to a second functionality upon exposure to acid.

US Patent:

20200350762, Nov 5, 2020

Filed:

Apr 30, 2020

Appl. No.:

16/863756

Inventors:

- Richland WA, US
Yonghong Chen - Zionsville IN, US
Feng Pan - Sugar Land TX, US
Edward Rothberg - Portland OR, US

Assignee:

BATTELLE MEMORIAL INSTITUTE - Richland WA

International Classification:

H02J 3/00
G06Q 50/06

Abstract:

Fast simultaneous feasibility testing (SFT) for management of an electrical power grid is achieved through various innovations. The computation problem relates to evaluation of candidate solutions for external power flows into a power grid, with respect to predetermined constraints and contingencies. Storage and computations are reduced by formulating the problem in terms of transactional nodes (e.g. third party connections for generators and loads) instead of the larger number of bus nodes. Further advantages are achieved by precomputing matrices that can be reused across multiple SFT invocations, organizing matrices and operations to reduce storage and computation, and eliminating branches that have no contingency violations. The fast SFT further enables new applications for integrating SFT with a Security-Constrained Unit Commitment (SCUC) optimizer for efficient single pass solutions; operating SFT as a service to multiple SCUC solvers; or integration with Security-Constrained Economic Dispatch (SCED) optimization.