Feng Pan

US Patent:

8173347, May 8, 2012

Filed:

Aug 11, 2005

Appl. No.:

11/201915

Inventors:

Jeffrey T. Koberstein - Storrs CT, US
Feng Pan - New York NY, US
Kwangjoo Lee - New York NY, US
Peng Wang - New York NY, US

Assignee:

The Trustees of Columbia University in the City of New York - New York NY

International Classification:

G03F 7/00

US Classification:

430269, 4302701, 430296, 430322, 430324, 430396

Abstract:

A method for surface micropatterning includes forming on a surface containing a first polymer a first coating containing a second polymer having first functionalities capable of being converted to second functionalities by exposure to an acid. A second coating containing a photoacid generator is formed on the first coating. The second coating containing the photoacid generator is selectively irradiated in one or more regions thereof with radiation having a spatially varying internsity pattern to generate an acid in each irradiated region of the second coating. The acid converts the first functionalities of each region of the second polymer underlying a respective irradiated region of the second coating to second functionalities. A first molecular patterned surface having one or more regions of the first functionalities and one or more regions of the second functionalities is formed.

US Patent:

8263192, Sep 11, 2012

Filed:

Jun 16, 2006

Appl. No.:

11/454652

Inventors:

Jeffrey T. Koberstein - Storrs CT, US
Peng Wang - Ann Arbor MI, US
Feng Pan - New York NY, US

Assignee:

The Trustees of Columbia University in the City of New York - New York NY

International Classification:

B05D 5/00
B05D 3/06
C08J 7/18

US Classification:

427553, 427 213, 427333, 4274071

Abstract:

The invention is directed to methods for coating monolayer films of surface-active polymers onto substrates of arbitrary shape, and molecular-based methods and processes to control the chemical and physical nature of surfaces and interfaces. The invention is also directed to methods for modifying a surface of a monolayer comprising a) coating a monolayer on a substrate, wherein the monolayer is formed by self-assembly of end-surfactant molecules, thereby positioning a photoactive functional group at the air-monolayer interface; and b) exposing the monolayer to radiation, wherein each organic group of the monolayer contains a first functionality that is not converted to a second functionality upon exposure to acid.

US Patent:

20190286993, Sep 19, 2019

Filed:

Mar 15, 2019

Appl. No.:

16/355574

Inventors:

Feng Pan - Sugarland TX, US
Jesse T. Holzer - Kennewick WA, US
Yonghong Chen - Carmel IN, US
Edward Rothberg - Houston TX, US

International Classification:

G06N 5/00
G06F 9/54
H02J 3/14

Abstract:

Apparatus and methods are disclosed for solving Mixed Integer Programming (MIP) problems, such as Security Constrained Unit Commitment (SCUC) problems used by power grid authorities to perform day-ahead market clearing. In certain examples, a plurality of threads of a software tool implementing a concurrent optimizer can be executed concurrently and sequentially to generate new solutions to a SCUC problem for an upcoming planning horizon. Data can be shared among the concurrently executing threads, such as intermediate/incumbent solutions and hints regarding the fixing of variables and constraints to reduce the size of the SCUC problem. In some examples, the threads are seeded with historical solutions from prior planning horizons. The software tool can select a best solution from the solutions generated by the threads, and determine dispatch instructions for a device coupled to the power grid for the upcoming planning horizon based at least in part on the selected solution.