Feng Pan

US Patent:

8173347, May 8, 2012

Filed:

Aug 11, 2005

Appl. No.:

11/201915

Inventors:

Jeffrey T. Koberstein - Storrs CT, US
Feng Pan - New York NY, US
Kwangjoo Lee - New York NY, US
Peng Wang - New York NY, US

Assignee:

The Trustees of Columbia University in the City of New York - New York NY

International Classification:

G03F 7/00

US Classification:

430269, 4302701, 430296, 430322, 430324, 430396

Abstract:

A method for surface micropatterning includes forming on a surface containing a first polymer a first coating containing a second polymer having first functionalities capable of being converted to second functionalities by exposure to an acid. A second coating containing a photoacid generator is formed on the first coating. The second coating containing the photoacid generator is selectively irradiated in one or more regions thereof with radiation having a spatially varying internsity pattern to generate an acid in each irradiated region of the second coating. The acid converts the first functionalities of each region of the second polymer underlying a respective irradiated region of the second coating to second functionalities. A first molecular patterned surface having one or more regions of the first functionalities and one or more regions of the second functionalities is formed.

US Patent:

8263192, Sep 11, 2012

Filed:

Jun 16, 2006

Appl. No.:

11/454652

Inventors:

Jeffrey T. Koberstein - Storrs CT, US
Peng Wang - Ann Arbor MI, US
Feng Pan - New York NY, US

Assignee:

The Trustees of Columbia University in the City of New York - New York NY

International Classification:

B05D 5/00
B05D 3/06
C08J 7/18

US Classification:

427553, 427 213, 427333, 4274071

Abstract:

The invention is directed to methods for coating monolayer films of surface-active polymers onto substrates of arbitrary shape, and molecular-based methods and processes to control the chemical and physical nature of surfaces and interfaces. The invention is also directed to methods for modifying a surface of a monolayer comprising a) coating a monolayer on a substrate, wherein the monolayer is formed by self-assembly of end-surfactant molecules, thereby positioning a photoactive functional group at the air-monolayer interface; and b) exposing the monolayer to radiation, wherein each organic group of the monolayer contains a first functionality that is not converted to a second functionality upon exposure to acid.