Hennepin Technical College Brooklyn Park, MN Oct 2011 to Dec 2012 Computer Lab AssistantNoble Academy K-8 Charter School Minneapolis, MN Sep 2010 to Jun 2011 Educational AssistantHunter Douglas Inc West Sacramento, CA Nov 1998 to Aug 2010 Repair Blind/Customer ServiceBurger King Elk Grove, CA Jun 1996 to Oct 1997 Customer Service
Education:
Hennepin Technical College Brooklyn Park, MN Aug 2010 to 2000 A.A.SSacramento City Community College Sacramento, CA Aug 1998 to Jun 2000Luther Burbank High School Sacramento, CA Sep 1994 to Jun 1998 High School Diploma
Us Patents
Photothermographic Materials Containing Developer And Co-Developer
Chaofeng Zou - Maplewood MN, US Fong Vang - Forest Lake MN, US Doreen C. Lynch - Afton MN, US William D. Ramsden - Afton MN, US Sharon M. Simpson - Lake Elmo MN, US Kumars Sakizadeh - Woodbury MN, US
International Classification:
G03C 5/00
US Classification:
430330, 430564
Abstract:
Use of a combination of a trisphenol reducing agent (developer) and a substituted olefinic co-developer in photothermographic materials provides a number of improvements including a reduction of sensitivity to high humidity and improved processing latitude.
Photothermographic Materials Containing Developer And Co-Developer
Chaofeng Zou - Maplewood MN, US Fong Vang - Forest Lake MN, US Doreen C. Lynch - Afton MN, US William D. Ramsden - Afton MN, US Sharon M. Simpson - Lake Elmo MN, US Kumars Sakizadeh - Woodbury MN, US
International Classification:
G03C 1/06 G03C 5/26
US Classification:
430440, 430619, 430441, 430435
Abstract:
Use of a combination of a trisphenol reducing agent (developer) and a substituted olefinic co-developer in photothermographic materials reduces their sensitivity to high humidity and improves processing latitude.
Maggie Nelson, Will Hall, Zel Habtemariam, Joseph Kim, Cassei Markstrom, Jake Sajevic, Elizabeth Callicoat, Joe Dwyer, Justin Lindahl, Michael Ezebuiro, Kyra Anderson