Francis J Burns

US Patent:

46875395, Aug 18, 1987

Filed:

Oct 29, 1986

Appl. No.:

6/924519

Inventors:

Francis C. Burns - Endicott NY
Russell W. Dreyfus - Mt. Kisco NY
John R. Susko - Owego NY

Assignee:

International Business Machines Corp. - Armonk NY

International Classification:

C23F 102
B44C 122
C03C 1500
C03C 2506

US Classification:

156626

Abstract:

An end point detection technique indicates when a pulsed excimer laser, operating on a chromium clad copper substrate in the presence of chlorine gas, has etched through the chromium layer. The excimer laser vaporizes successive layers of the chromium chloride reaction product, which form on the region being etched, until, when all of the chromium has been removed from the region, a copper chloride reaction product layer forms on the region and is vaporized. A dye laser directs a probe beam into a zone spaced above the region being etched and is pulsed about 12 microseconds after each pulse of the excimer laser to allow time for the vaporized reaction products to reach the zone. The probe beam has a first wavelength of 433. 3 nm. which induces the vaporized copper chloride in the zone to fluoresce at a second wavelength of 441. 2 nm. A narrow band photodetector detects the fluoresced 441. 2 nm.

US Patent:

59027126, May 11, 1999

Filed:

Jan 14, 1997

Appl. No.:

8/783048

Inventors:

Francis Charles Burns - Apalachin NY
William Weathers Fleming - Virginia Beach VA
Victor Yee-Way Lee - San Jose CA
Randy William Snyder - Vestal NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03C1/805;1/76

US Classification:

430269

Abstract:

The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.

US Patent:

49068032, Mar 6, 1990

Filed:

Nov 8, 1988

Appl. No.:

7/268449

Inventors:

Stanley M. Albrechta - Binghamton NY
Francis C. Burns - Endicott NY
Gary R. Carden - Endwell NY
William T. Chen - Endicott NY
Andrew R. Gresko - Binghamton NY
John J. Kaufman - Windsor NY
Eugene P. Skarvinko - Binghamton NY
Nadia Tonsi - Endicott NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H05K 100

US Classification:

174254

Abstract:

A flexible supporting cable for an electronic device which includes a steel foil substrate, a layer of polymer on portions of the substrate, circuit pads on the polymer layer having both the bottom and top surfaces of the pads exposed; circuit lines extending from the top surface of the pads, a window free from steel beneath a portion of the circuit lines, and a second, smaller window free from both steel and the polymer beneath a portion of the circuit lines. Methods are provided for fabricating these flexible supporting cables.

US Patent:

51182998, Jun 2, 1992

Filed:

May 7, 1990

Appl. No.:

7/520335

Inventors:

Francis C. Burns - Apalachin NY
John J. Kaufman - Windsor NY
David E. King - Endicott NY
Alan D. Knight - Newark Valley NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01R 900

US Classification:

439 74

Abstract:

An electrical interconnection, which includes a method for fabricating the device, is disclosed. The interconnection comprises two contact surfaces, on at least one of which is disposed at least one conical projection in predetermined dimension and location. Rather than being permanently cojoined, the contact surfaces are attachable and detachable when desired. The individual conical projections are comprised of an ablative material, and at least some of the conical projections include a surface which is substantially comprised of material in a thickness capable of making ohmic contact, either by wiping with an intermeshing like structure or by contacting a substantially flat contact pad. An interconnection, in this invention, is the combination of at least one contact having individual conical projections and another contact, optionally having individual conical projections. The conical projections are formed by laser.

US Patent:

59198680, Jul 6, 1999

Filed:

Jul 22, 1997

Appl. No.:

8/898285

Inventors:

Francis Charles Burns - Apalachin NY
William Weathers Fleming - Virginia Beach VA
Victor Yee-Way Lee - San Jose CA

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

C08F 0830
C08F 0838
C08F12010

US Classification:

5253304

Abstract:

The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.

US Patent:

61564451, Dec 5, 2000

Filed:

Feb 24, 1998

Appl. No.:

9/028371

Inventors:

Francis Charles Burns - Apalachin NY
William Weathers Fleming - Virginia Beach VA
Victor Yee-Way Lee - San Jose CA
Randy William Snyder - Vestal NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B32B 2930
B32B 1508
B32B 1800
H01L 2912

US Classification:

428620

Abstract:

The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.

US Patent:

57055700, Jan 6, 1998

Filed:

Jun 7, 1995

Appl. No.:

8/476760

Inventors:

Francis Charles Burns - Apalachin NY
William Weathers Fleming - Virginia Beach VA
Victor Yee-Way Lee - San Jose CA
Randy William Snyder - Vestal NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

C08F22002
C08F22600
G03F 7039

US Classification:

5253299

Abstract:

The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.

US Patent:

51724731, Dec 22, 1992

Filed:

Sep 25, 1991

Appl. No.:

7/765299

Inventors:

Francis C. Burns - Apalachin NY
John J. Kaufman - Windsor NY
David E. King - Endicott NY
Alan D. Knight - Newark Valley NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01R 4300

US Classification:

29885

Abstract:

A method of making an electrical contact comprised of at least one, and preferably several, conical projections, is provided. The individual conical projections are comprised of an ablative material, and at least some of the conical projections include a surface which is substantially comprised of material in a thickness capable of making ohmic contact, either by wiping with an intermeshing like structure or by contacting a substantially flat contact pad. An interconnection, in this invention, is the combination of at least one contact having individual conical projections and another contact, optionally having individual conical projections. The conical projections are formed by laser. The conical projections are optionally formed on the head of a contact pin.

Address:

611 Barnum Rd, Friendsville, PA 18818

Phone:

5707441465

VIN:

1FTEX1E86AFB66043

Make:

FORD

Model:

F-150

Year:

2010