Frederick W Martin

US Patent:

20130264477, Oct 10, 2013

Filed:

Mar 23, 2013

Appl. No.:

13/849496

Inventors:

Frederick Wight Martin - North Stratford NH, US

International Classification:

H01J 3/22
H01J 37/141

US Classification:

250307, 250396 ML

Abstract:

An objective lens for use in probe-forming particle-optical columns such as focused ion beam equipment, scanning electron microscopes, and helium microscopes is described. It comprises two interleaved (quadrupole/octopole) lenses and two or three ancillary octopole lenses, and is capable of simultaneous compensation of spherical (Cs) and chromatic (Cc) aberrations of the objective lens alone or of the complete particle-optical column. Additional apparatus comprising a gridded aperture and position-sensitive detector is specified, together with a method to measure and minimize all of the five independent third-order aberration coefficients of the objective lens.

US Patent:

53692799, Nov 29, 1994

Filed:

Aug 20, 1993

Appl. No.:

8/109976

Inventors:

Frederick W. Martin - North Stratford NH

International Classification:

H01J 326

US Classification:

250396R

Abstract:

A particle-beam column comprising a needle-type ions source such as a liquid metal ion source, one or more round lenses, and a plurality of interleaved quadrupole lenses, by means of which the chromatic aberration of the column may be reduced or entirely compensated. Also an ion-beam column comprising a liquid alloy ion source, interleaved quadrupole lenses, and a Wien velocity filter, whereby a focused beam of ions of a single atomic number may be produced. Such columns produce a more finely focused beam than columns based only on electrostatic lenses, and allow increased lens apertures and larger beam currents.

US Patent:

45556660, Nov 26, 1985

Filed:

May 19, 1982

Appl. No.:

6/379736

Inventors:

Frederick W. Martin - North Stratford NH

International Classification:

H01J 2300
H01J 2334

US Classification:

326233

Abstract:

A high voltage particle accelerator and an energy analyzer fed back to the accelerator, in which the beam of extremely small diameter from a particle source of the field-emission or field-ionization type and the energy analyzer function to produce precisely defined high voltages; use of such an accelerator and focusing lenses to produce a microbeam with reduced chromatic aberration; and production of a microbeam by use of such an accelerator and focusing lenses of the achromatic quadrupole type, further compensated for aperture aberration.

US Patent:

43529852, Oct 5, 1982

Filed:

Sep 18, 1979

Appl. No.:

6/076573

Inventors:

Frederick W. Martin - North Stratford NH

International Classification:

H01J 3726

US Classification:

250306

Abstract:

A scanning ion microscope is described in which the prior arts of scanning microscopy and achromatic quadrupole lens design as perfected for electrons are utilized for massive high-energy positive ions. Because the DeBroglie wavelength of the massive ions is smaller than the wavelength of electrons, diffraction in the objective lens is reduced. In principle resolution better than one Angstrom can be achieved. Because of the copious production of X-rays and Auger electrons in the specimen by such ions, specimens of atomic dimensions can be examined with a minimum of radiation damage by the ions. The specifically new, novel, and useful feature of this invention is the use of properly focused high-energy heavy-ion beams and the detection of single atomic events in the specimen, which together enable much greater sensitivity and resolution than attainable by other means.

US Patent:

40888959, May 9, 1978

Filed:

Jul 8, 1977

Appl. No.:

5/813888

Inventors:

Frederick W. Martin - North Stratford NH

International Classification:

G01M 2300

US Classification:

250492A

Abstract:

The invention is a memory for use in computing machines, in which the presence of a stored bit of information in a substrate is detected by a scanned ion beam of high brightness focused to a very small diameter. Bits of 4000 Angstrom dimension may be written in times as short as 100 nanoseconds by means of ion beams, and read out in times shorter than one nanosecond. A memory with such a bit size having a capacity of 10. sup. 8 bits occupies 4. times. 4 mm. sup. 2 of substrate surface. By detecting the charge of high-energy ions transmitted through a thin substrate, bits smaller than 1000 Angstroms in dimension may be detected with good signal-to-noise ratio in less than 1 nanosecond.

US Patent:

45903794, May 20, 1986

Filed:

Sep 16, 1982

Appl. No.:

6/418794

Inventors:

Frederick W. Martin - North Stratford NH

International Classification:

H01J 2958
H01J 2970

US Classification:

250396R

Abstract:

The process of achromatic deflection by substantially uniform, crossed electric and magnetic fields with certain magnitudes. When the magnetic force is opposite to the electric force and twice as large, deflection is independent of particle velocity. An achromatic deflector produced by proper excitation of the poles of an achromatic quadrupole lens by means of suitable power supplies, without additional parts within the lens. An achromatic quadrupole lens having no yoke and only four electrodes, suitable for deflections varying at high frequency.

US Patent:

20160042914, Feb 11, 2016

Filed:

Aug 3, 2015

Appl. No.:

14/816185

Inventors:

Frederick Wight Martin - North Stratford NH, US

International Classification:

H01J 37/22
H01J 37/28

Abstract:

A mulch-beam focused ion beam instrument containing a micro fabrication beam () for sputtering and surface polishing and a micro analysis beam () which passes through a spherically and chromatically corrected quadrupole objective lens system (), for use with bulk specimens () and detectors () or transmission specimens () and transmitted particle detectors ().