Gary Lynn Bultman
age ~67
from Los Altos, CA
- Also known as:
-
- Gary L Bultman
- Gary C Bultman
- Gary N
- Phone and address:
-
10274 Kenbar Rd, Los Altos, CA 94024
4089489109
Gary Bultman Phones & Addresses
- 10274 Kenbar Rd, Los Altos Hills, CA 94024 • 4089489109
- Los Altos, CA
- Malibu, CA
- Kalispell, MT
- San Francisco, CA
- Whitefish, MT
- Marion, MT
- San Jose, CA
Work
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Company:Lam researchMay 2010
-
Position:Senior vice president strategic development, corporate marketing and communications
Education
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Degree:Bachelors, Bachelor of Science
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School / High School:Kansas State University
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Specialities:Nuclear Engineering
Skills
Strategy • Semiconductors • Start Ups • Product Development • Business Strategy • Cross Functional Team Leadership • Mergers and Acquisitions • Business Development • Product Management • Manufacturing • Marketing Strategy • Go To Market Strategy • Semiconductor Industry • Engineering Management • Product Marketing • Program Management • Strategic Alliances • Mergers • Metrology • Venture Capital • Leadership • Strategic Partnerships • Management • P&L Management • R&D • Ic • Product Lifecycle Management • Thin Films • Competitive Analysis • Market Analysis • New Business Development • Research and Development • Marketing • Product Launch • Operations Management • Strategy Development • Executive Management • International Business • Integrated Circuits • Project Planning • Patents • Forecasting
Industries
Semiconductors
Resumes
Senior Vice President Strategic Development, Corporate Marketing And Communications
view sourceLocation:
San Francisco, CA
Industry:
Semiconductors
Work:
Lam Research
Senior Vice President Strategic Development, Corporate Marketing and Communications
Bultman Consulting Jan 2008 - May 2010
Principal
Kla-Tencor 2001 - 2007
Senior V.p Business Development, Chief Marketing Officer
Blue29 2004 - 2006
Member of Bod
Kla-Tencor 2000 - 2001
V.p and G.m Integraged Products Divison
Senior Vice President Strategic Development, Corporate Marketing and Communications
Bultman Consulting Jan 2008 - May 2010
Principal
Kla-Tencor 2001 - 2007
Senior V.p Business Development, Chief Marketing Officer
Blue29 2004 - 2006
Member of Bod
Kla-Tencor 2000 - 2001
V.p and G.m Integraged Products Divison
Education:
Kansas State University
Bachelors, Bachelor of Science, Nuclear Engineering
Bachelors, Bachelor of Science, Nuclear Engineering
Skills:
Strategy
Semiconductors
Start Ups
Product Development
Business Strategy
Cross Functional Team Leadership
Mergers and Acquisitions
Business Development
Product Management
Manufacturing
Marketing Strategy
Go To Market Strategy
Semiconductor Industry
Engineering Management
Product Marketing
Program Management
Strategic Alliances
Mergers
Metrology
Venture Capital
Leadership
Strategic Partnerships
Management
P&L Management
R&D
Ic
Product Lifecycle Management
Thin Films
Competitive Analysis
Market Analysis
New Business Development
Research and Development
Marketing
Product Launch
Operations Management
Strategy Development
Executive Management
International Business
Integrated Circuits
Project Planning
Patents
Forecasting
Semiconductors
Start Ups
Product Development
Business Strategy
Cross Functional Team Leadership
Mergers and Acquisitions
Business Development
Product Management
Manufacturing
Marketing Strategy
Go To Market Strategy
Semiconductor Industry
Engineering Management
Product Marketing
Program Management
Strategic Alliances
Mergers
Metrology
Venture Capital
Leadership
Strategic Partnerships
Management
P&L Management
R&D
Ic
Product Lifecycle Management
Thin Films
Competitive Analysis
Market Analysis
New Business Development
Research and Development
Marketing
Product Launch
Operations Management
Strategy Development
Executive Management
International Business
Integrated Circuits
Project Planning
Patents
Forecasting
Us Patents
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Methods And Systems For Determining A Presence Of Macro Defects And Overlay Of A Specimen
view source -
US Patent:6673637, Jan 6, 2004
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Filed:Sep 20, 2001
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Appl. No.:09/956851
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Inventors:Dan Wack - Los Altos CA
Ady Levy - Sunnyvale CA
Kyle A. Brown - Irvine CA
Gary Bultman - Los Altos CA
Mehrdad Nikoonahad - Menlo Park CA
John Fielden - Los Altos CA -
Assignee:KLA-Tencor Technologies - Milpitas CA
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International Classification:H01L 2166
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US Classification:438 14, 356 72
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Abstract:Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a presence of macro defects and overlay of a specimen. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
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Methods And Systems For Determining At Least Four Properties Of A Specimen
view source -
US Patent:6694284, Feb 17, 2004
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Filed:Sep 20, 2001
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Appl. No.:09/956839
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Inventors:Mehrdad Nikoonahad - Menlo Park CA
Ady Levy - Sunnyvale CA
Kyle A. Brown - Irvine CA
Gary Bultman - Los Altos CA
Dan Wack - Los Altos CA
John Fielden - Los Altos CA -
Assignee:KLA-Tencor Technologies Corp. - Milpitas CA
-
International Classification:G01B 1500
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US Classification:702155, 702 35
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Abstract:Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, at least four properties of a specimen such as critical dimension, overlay, a presence of macro defects, and thin film characteristics. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
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Methods And Systems For Determining A Critical Dimension An A Presence Of Defects On A Specimen
view source -
US Patent:6782337, Aug 24, 2004
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Filed:Sep 20, 2001
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Appl. No.:09/956848
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Inventors:Dan Wack - Los Altos CA
Ady Levy - Sunnyvale CA
Kyle A. Brown - Irvine CA
Gary Bultman - Los Altos CA
Mehrdad Nikoonahad - Menlo Park CA
John Fielden - Los Altos CA -
Assignee:KLA-Tencor Technologies Corp. - Milpitas CA
-
International Classification:G06F 1900
-
US Classification:702155, 702167, 356625, 356630, 356369, 25055924, 25055942
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Abstract:Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, critical dimension and a presence of defects. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
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Methods And Systems For Determining At Least One Characteristic Of Defects On At Least Two Sides Of A Specimen
view source -
US Patent:6806951, Oct 19, 2004
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Filed:Sep 20, 2001
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Appl. No.:09/956846
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Inventors:Dan Wack - Los Altos CA
Ady Levy - Sunnyvale CA
Kyle A. Brown - Irvine CA
Rodney C. Smedt - Los Gatos CA
Gary Bultman - Los Altos CA
Mehrdad Nikoonahad - Menlo Park CA
John Fielden - Los Altos CA -
Assignee:KLA-Tencor Technologies Corp. - Miliptas CA
-
International Classification:G01N 2100
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US Classification:3562372, 3562374
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Abstract:Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, at least one characteristic of defects on at least two sides of a specimen. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
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Methods And Systems For Determining A Characteristic Of A Specimen Prior To, During, Or Subsequent To Ion Implantation
view source -
US Patent:6812045, Nov 2, 2004
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Filed:Sep 20, 2001
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Appl. No.:09/956842
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Inventors:Mehrdad Nikoonahad - Menlo Park CA
Ady Levy - Sunnyvale CA
Kyle A. Brown - Irvine CA
Gary Bultman - Los Altos CA
Dan Wack - Los Altos CA
John Fielden - Los Altos CA -
Assignee:KLA-Tencor, Inc. - San Jose CA
-
International Classification:H01L 2166
-
US Classification:438 14, 438 15
-
Abstract:Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a characteristic of a specimen prior to, during, or subsequent to ion implantation. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
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Methods And Systems For Determining A Presence Of Macro Defects And Overlay Of A Specimen
view source -
US Patent:6818459, Nov 16, 2004
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Filed:Oct 22, 2003
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Appl. No.:10/691307
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Inventors:Dan Wack - Los Altos CA
Ady Levy - Sunnyvale CA
Kyle A. Brown - Irvine CA
Gary Bultman - Los Altos CA
Mehrdad Nikoonahad - Menlo Park CA
John Fielden - Los Altos CA -
Assignee:KLA-Tencor Technologies Corp. - Milpitas CA
-
International Classification:H01L 2166
-
US Classification:438 14, 438 16, 356 72
-
Abstract:Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a presence of macro defects and overlay of a specimen. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
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Methods And Systems For Determining A Presence Of Macro And Micro Defects On A Specimen
view source -
US Patent:6829559, Dec 7, 2004
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Filed:Sep 20, 2001
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Appl. No.:09/957450
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Inventors:Gary Bultman - Los Altos CA
Ady Levy - Sunnyvale CA
Kyle A. Brown - Irvine CA
Mehrdad Nikoonahad - Menlo Park CA
Dan Wack - Los Altos CA
John Fielden - Los Altos CA -
Assignee:K.L.A.-Tencor Technologies - Milpitas CA
-
International Classification:G01B 1500
-
US Classification:702155, 702 35
-
Abstract:Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a presence of macro and micro defects. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
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Methods And Systems For Determining An Implant Characteristic And A Presence Of Defects On A Specimen
view source -
US Patent:6891610, May 10, 2005
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Filed:Sep 20, 2001
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Appl. No.:09/956836
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Inventors:Mehrdad Nikoonahad - Menlo Park CA, US
Ady Levy - Sunnyvale CA, US
Kyle A. Brown - Irvine CA, US
Gary Bultman - Los Altos CA, US
Dan Wack - Los Altos CA, US
John Fielden - Los Altos CA, US -
Assignee:KLA-Tencor Technologies Corp. - Milpitas CA
-
International Classification:G01N021/00
G01B011/00
G01B011/14 -
US Classification:3562372, 3562373, 3562375, 3562374, 356 73, 356625
-
Abstract:Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, an implant characteristic and a presence of defects. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
Classmates
Gary Bultman Manhattan K...
view sourceGary Bultman 1980 graduate of Kansas State University - Engineering in Manhattan, KS is on Classmates.com. See pictures, plan your class reunion and get caught up with Gary and ...
Gary Bultman St. paul MN...
view sourceGary Bultman 1960 graduate of Wilson High School in St. paul, MN is on Classmates.com. See pictures, plan your class reunion and get caught up with Gary and other high school alumni
Kansas State University -...
view sourceGraduates:
Gary Bultman (1975-1980),
Johnny Steele (1960-1961),
Kenneth Matney (1973-1976),
Justin Crawshaw (1990-1996)
Johnny Steele (1960-1961),
Kenneth Matney (1973-1976),
Justin Crawshaw (1990-1996)
Googleplus
Gary Bultman
Education:
Kansas State University - Nuclear Engineering
Myspace
Gary Bultman
view sourceBirthday:
1942
Youtube
Plaxo
Gary Bultman
view sourceSilicon Valley
Gary Bultman's Public
view sourceGary Bultman's Public Profile on Plaxo. Plaxo helps members like Gary Bultman keep in touch with the people who really matter, helping them to connect, keep each other's contact ...
Gary Bultman
view sourceFriends:
Jenny Boll, Tammy Fox, Mike Ryan, Sam Stevens, Christine Bultman Valley
Gary Bultman Sr
view sourceFriends:
Chris Prokop, Dillon Anderson, Matt Krenik, Jim Zondlo, Amber Burdick
Get Report for Gary Lynn Bultman from Los Altos, CA, age ~67