Gary C Sypherd

US Patent:

20100192773, Aug 5, 2010

Filed:

Jan 29, 2010

Appl. No.:

12/696808

Inventors:

Daniel O. Clark - Pleasanton CA, US
Colin John Dickinson - San Jose CA, US
Jay J. Jung - Sunnyvale CA, US
Daniel Stephan Brown - Los Gatos CA, US
Mehran Moalem - Cupertino CA, US
Frank F. Hooshdaran - Pleasanton CA, US
Morteza Farnia - Campbell CA, US
Barry Page - San Jose CA, US
Gary Sypherd - Glendale AZ, US
Jonathan Dahm - Austin TX, US
Phil Chandler - Clifton, GB

Assignee:

APPLIED MATERIALS, INC. - Santa Clara CA

International Classification:

B01D 47/14
B01D 47/12
B01D 47/10
B03C 3/34

US Classification:

96 27, 96327, 96325, 96323, 96290

Abstract:

Embodiments of an abatement apparatus are disclosed herein. In some embodiments, an abatement apparatus may include a scrubber configured to receive an effluent stream from a process chamber and further configured to remove first particles from the effluent stream; a scrubber conduit coupled to the scrubber to receive the effluent stream therefrom and configured to remove second particles from the effluent stream, the scrubber conduit having one or more inlets configured to provide a fluid to sufficiently wet an interior surface of the scrubber conduit to trap the second particles thereon and to wash the second particles therealong; and a central scrubber coupled to the scrubber via the scrubber conduit. In some embodiments, the scrubber conduit is downward sloping from the scrubber to the central scrubber. In some embodiments, a plurality of scrubbers may be coupled to the central scrubber via a plurality of scrubber conduits.

US Patent:

6277347, Aug 21, 2001

Filed:

Feb 24, 1997

Appl. No.:

8/805989

Inventors:

Ranald Stearns - Los Altos CA
Gary Sypherd - Milpitas CA
Stuardo Robles - Sunnyvale CA
Maria Galiano - Fishkill NY

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C01B 700

US Classification:

423240R

Abstract:

A method and apparatus for abating a compound in a substrate processing system's effluent gases. The method of the present invention begins by introducing ozone and the effluent gases into an abatement device's combustion chamber. Energy is then applied to the effluent gas and ozone. The application of energy, such as thermal or radio frequency energy, then causes a reaction in and between the effluent gases and the ozone, thereby rendering the compound inert. The resultant gases produced are then exhausted out of the combustion chamber.