George S Emond

US Patent:

6395194, May 28, 2002

Filed:

Dec 18, 1998

Appl. No.:

09/216679

Inventors:

Michael W. Russell - Norwalk CT
Peter C. Van Buskirk - Newtown CT
Jonathan J. Wolk - Bridgewater CT
George E. Emond - Southington CT

Assignee:

Intersurface Dynamics Inc. - Bethel CT
Advanced Technology Materials, Inc. - Danbury CT

International Classification:

C09K 1300

US Classification:

252 791, 252 794, 438692

Abstract:

A method of removing noble metal material from a substrate having the noble metal material deposited thereon, such as a semiconductor device structure including thereon a layer of the noble metal material, e. g. , iridium, patterned for use as an electrode. The substrate is subjected to chemical mechanical polishing with a chemical mechanical polishing composition containing abrasive polishing particles and a halide-based oxidizing agent. The CMP composition and method of the invention provide efficient planarization and noble metal material removal from the substrate, in applications such as the fabrication of ferroelectric or high permittivity capacitor devices.

US Patent:

6699402, Mar 2, 2004

Filed:

Dec 28, 2001

Appl. No.:

10/034764

Inventors:

Michael W. Russell - Norwalk CT
Peter C. Van Buskirk - Newtown CT
Jonathan J. Wolk - Bridgewater CT
George E. Emond - Southington CT

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

C09K 1300

US Classification:

252 791, 252 792, 438691, 438692

Abstract:

A chemical mechanical polishing (CMP) slurry composition for removing noble metal material from a substrate having the noble metal material deposited thereon, for example, a semiconductor device structure including thereon a layer of the noble metal material, e. g. , iridium, patterned for use as an electrode. Such polishing slurry composition contains abrasive polishing particles, a bromide compound, a bromate compound for providing free bromine as an oxidizing agent in the composition, and an organic acid for mediating decomposition of the bromate compound in the composition. The CMP slurry composition of the invention is particularly effective for planarization and/or removal of noble metal(s) from the substrate, in applications such as the fabrication of ferroelectric or high permittivity capacitor devices.

US Patent:

44734743, Sep 25, 1984

Filed:

Oct 23, 1981

Appl. No.:

6/314307

Inventors:

Eugene A. Ostreicher - Farmington CT
Rodney A. Knight - New Milford CT
Joseph V. Fiore - Fairfield CT
George T. Emond - Southington CT
Kenneth C. Hou - San Antonio TX

Assignee:

AMF Inc. - White Plains NY

International Classification:

B01D 1300

US Classification:

210636

Abstract:

A cationic charge modified microporous membrane, process for producing said membrane and use thereof are provided. The membrane comprises a hydrophilic organic polymeric microporous membrane and a charge modifying amount of a primary cationic charge modifying agent bonded to substantially all of the wetted surfaces of the membrane. The primary charge modifying agent if a water soluble organic polymer having a molecular weight greater than about 1000 wherein each monomer thereof has at least one epoxide group capable of bonding to the surface of the membrane and at least one tertiary amine or quaternary ammonium group. Preferably, a portion of the epoxy groups on the organic polymer are bonded to a secondary charge modifying agent selected from the group consisting of: (i) aliphatic amines having at least one primary amine or at least two secondary amines; and (ii) aliphatic amines having at least one secondary amine and a carboxyl or hydroxyl substituent. The charge modified microporous membrane of this invention may be used for the filtration of fluids, particularly parenteral or biological liquids. The membrane has low extractables and is sanitizable or sterilizable.

US Patent:

46735046, Jun 16, 1987

Filed:

Sep 11, 1984

Appl. No.:

6/649561

Inventors:

Eugene A. Ostreicher - Farmington CT
Rodney A. Knight - New Milford CT
Joseph V. Fiore - Fairfield CT
George T. Emond - Southington CT
Kenneth C. Hou - San Antonio TX

Assignee:

Cuno Inc. - Meriden CT

International Classification:

B01D 1300

US Classification:

21050022

Abstract:

A cationic charge modified microporous membrane comprising a hydrophilic organic polymeric microporous membrane and a cationic charge modifying agent bonded to substantially all of the wetted surfaces of the membrane, the charge modifying agent being an epichlorohydrin modified polyamide having tertiary amine or quaternary ammonium groups. A secondary charge modifying agent may be employed selected from: (i) aliphatic polyamines having at least one primary amine or at least two secondary amines; and (ii) aliphatic amines having at least one secondary amine and a carboxyl or hydroxyl substituent. Processes for producing and using the membrane are also described.

US Patent:

47088036, Nov 24, 1987

Filed:

Sep 6, 1984

Appl. No.:

6/648401

Inventors:

Eugene A. Ostreicher - Farmington CT
Rodney A. Knight - New Milford CT
Joseph V. Fiore - Fairfield CT
George T. Emond - Southington CT
Kenneth C. Hou - San Antonio TX

Assignee:

Cuno Incorporated - Meriden CT

International Classification:

B01D 1300

US Classification:

210650

Abstract:

A cationic charge modified microporous membrane comprising a hydrophilic organic polymeric microporous membrane and a cationic charge modifying agent bonded to substantially all of the wetted surfaces of the membrane, the charge modifying agent being an epichlorohydrin modified polyamide having tertiary amine or quaternary ammonium groups. A secondary charge modifying agent may be employed selected from: (i) aliphatic polyamines having at least one primary amine or at least two secondary amines; and (ii) aliphatic amines having at least one secondary amine and a carboxyl or hydroxyl substituent. Processes for producing and using the membrane are also described.

US Patent:

47434180, May 10, 1988

Filed:

Aug 17, 1984

Appl. No.:

6/642211

Inventors:

Robert G. Barnes - Meriden CT
Chaokang Chu - East Hartford CT
George T. Emond - Southington CT
Asit K. Roy - Seguin TX

Assignee:

Cuno Incorporated - Meriden CT

International Classification:

B01D 1300

US Classification:

264 48

Abstract:

A cationic charge modified microporous membrane is provided. The membrane comprises a hydrophilic organic polymeric microporous membrane having bonded thereto, through a cross-linking agent, a charge modifying amount of a cationic charge modifying agent. The charge modifying agent is an aliphatic amine or polyamine, preferably tetraethylene pentamine, and the cross-linking agent is an aliphatic polyepoxide having a molecular weight of less than about 500, preferably 1, 4 butanediol diglycidyl ether. The microporous membrane is preferably nylon. The process for applying the charge modifying agent to the membrane, preferably comprises contacting the membrane with an aqueous solution of the charge modifying agent and then contacting the membrane with a substantially aqueous solution of the cross-linking agent. The preferred process uses high purity water, i. e. water having no significant ionic content, to produce a membrane suitable for use in filtering ultra pure (18 megohm-cm resistivity) water for use in producing electronic devices.

US Patent:

47117931, Dec 8, 1987

Filed:

Sep 18, 1984

Appl. No.:

6/651749

Inventors:

Eugene A. Ostreicher - Farmington CT
Rodney A. Knight - New Milford CT
Joseph V. Fiore - Fairfield CT
George T. Emond - Southington CT
Kenneth C. Hou - San Antonio TX

Assignee:

Cuno Incorporated - Meriden CT

International Classification:

B05D 500

US Classification:

427244

Abstract:

A process is provided for for cationically charge modifying a microporous filter membrane, wherein the membrane is a substantially symmetrical isotropic, hydrophilic, organic polymeric microporous filter membrane, preferably nylon, having a microstructure throughout the membrane. The process comprises bonding a primary charge modifying amount of a water soluble cationic charge modifying agent to substantially all of the membrane microstructure, without substantial pore size reduction or pore blockage. The charge modifying agent is a reaction product of a polyamine with epichlorohydrin, the reactive product having (i) tertiary amine or quaternary ammonium groups, and (ii) epoxide groups along a polyamine chain, the epoxide groups capable of bonding to the microstructure of the membrane.

US Patent:

53665260, Nov 22, 1994

Filed:

Apr 21, 1993

Appl. No.:

8/051114

Inventors:

George T. Emond - Southington CT
Shih Y. Kuo - Salt Lake City UT

Assignee:

Norton Company - Worcester MA

International Classification:

C09K 314

US Classification:

51307

Abstract:

A method of removing material from a surface comprising abrading a surface comprising the step of abrading a surface with an abrasive tool or an abrasive powder comprising a boron suboxide (BxO) composition, wherein during the abrading step the boron suboxide (BxO) composition is maintained at low temperatures. The abrasive which is from the boron suboxide (BxO) family of compounds exhibits an unexpectedly high quality of abrading comparable with the highest quality particulate natural and synthetic diamond, which has a hardness about double that of the boron suboxide (BxO) of the present invention. Further, the invention includes a lapping and polishing powder and lapping slurry wherein the powder is made from a dense, finely crystalline boron suboxide material with a Knoop hardness KHN. sub. 100 of at least about 2800 kg/mm. sup. 2 and preferably at least 3800 kg/mm. sup. 2.