Huibert Visser - Zevenhuizen, NL David William Callan - Norwalk CT, US Robert-Han Munnig Schmidt - Hapert, NL George Howard Robbins - New Canaan CT, US
Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.
Lithographic Apparatus And Device Manufacturing Method
Huibert Visser - Zevenhuizen, NL David Callan - Norwalk CT, US Robert-Han Schmidt - Hapert, NL Roberto Wiener - Bethel CT, US Johannes Theodorus Van de Ven - Eindhoven, NL George Robbins - New Canaan CT, US
Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.
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George Robbins Owner
George Robbins Consultant Business Consulting Services
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MILLENNIUM CHEMICALS INC.
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