Xpo Logistics, Inc.
Operations Manager, Supply Chain
Saint-Gobain Performance Plastics Jun 2018 - Sep 2019
Plant Engineering and Facilities Manager
Saint-Gobain Performance Plastics Mar 2016 - Dec 2018
Production Manager
Toray Plastics (America), Inc. Jun 2015 - Mar 2016
Production Manager
Axalta Coating Systems Aug 2013 - Jun 2015
Area Manager, Contract Administration
Education:
West Virginia University 1994 - 1996
Bachelors, Bachelor of Science, Mechanical Engineering
Davis and Elkins College 1991 - 1994
Skills:
Six Sigma Continuous Improvement Lean Manufacturing Process Improvement Manufacturing Process Engineering 5S Leadership Supply Chain Management Supply Chain Management Engineering Spc Root Cause Analysis Design of Experiments Kaizen Dmaic Project Management Process Simulation Minitab Cross Functional Team Leadership Polymers Chemical Engineering Process Safety Manufacturing Operations Management Coaching Iso Fmea Coatings Value Stream Mapping Validation Change Management Mindsets and Behaviors Quality System
Interests:
Human Rights Children Education Disaster and Humanitarian Relief
Certifications:
Lean Six Sigma Black Belt
Us Patents
Metal Compositions, Thermal Imaging Donors And Patterned Multilayer Compositions Derived Therefrom
Richard Kevin Bailey - Newark DE, US Graciela Beatriz Blanchet - Greenville DE, US Jonathan V. Caspar - Wilmington DE, US John W. Catron - Smyrna DE, US Reid John Chesterfield - Wilmington DE, US Thomas C. Felder - Kennett Square PA, US Feng Gao - Hockessin DE, US Lynda Kaye Johnson - Wilmington DE, US Roupen Leon Keusseyan - Raleigh NC, US Dalen E. Keys - Landenberg PA, US Irina Malajovich - Swarthmore PA, US Jeffrey Scott Meth - Landenberg PA, US Geoffrey Nunes - Swarthmore PA, US Gerard O'Neil - Newark DE, US Rinaldo S. Schiffino - Wilmington DE, US Nancy G. Tassi - Gibbstown NJ, US
Assignee:
E. I. du Pont de Nemours and Company - Wilmington DE
International Classification:
B41M 5/40 H01B 1/22 G03C 3/00 G03C 5/18
US Classification:
430200, 430 18, 252500
Abstract:
The invention provides metal compositions, including silver compositions, and thermal imaging donors prepared with the compositions. The donors are useful for thermal transfer patterning of a metal layers and optionally, a corresponding proximate portion of an additional transfer layer onto a thermal imaging receiver. The compositions are useful for dry fabrication of electronic devices. Also provided are patterned multilayer compositions comprising one or more base film(s), and one or more patterned metal layers, including EMI shields and touchpad sensors.
Metal Compositions, Thermal Imaging Donors And Patterned Multilayer Compositions Derived Therefrom
Richard Kevin Bailey - Newark DE, US Graciela Beatriz Blanchet - Wilmington DE, US Jonathan V Caspar - Wilmington DE, US John Catron, Jr. - Smyrna DE, US Reid John Chesterfield - Santa Barbara CA, US Thomas C. Felder - Kennett Square PA, US Feng Gao - Hockessin DE, US Lynda Kaye Johnson - Wilmington DE, US Roupen Leon Keusseyan - Raleigh NC, US Dalen E. Keys - Landenberg PA, US Irina Malajovich - Swarthmore PA, US Jeffrey Scott Meth - Landenberg PA, US Geoffrey Nunes - Swarthmore PA, US Gerard O'Neil - Newark DE, US Rinaldo Soria Schiffino - Wilmington DE, US Nancy G. Tassi - Gibbstown NJ, US
Assignee:
E.I. du Pont de Nemours and Company - Wilmington DE
International Classification:
H01B 1/02 H01B 1/22
US Classification:
252512, 252514
Abstract:
Metal compositions including silver compositions are used in preparing thermal imaging donors. The donors are useful for thermal transfer patterning of a metal layer and optionally, a corresponding proximate portion of an additional transfer layer onto a thermal imaging receiver. The compositions are useful for dry fabrication of electronic devices. Also provided are patterned multilayer compositions comprising one or more base film(s), and one or more patterned metal layers, including EMI shields and touchpad sensors.
Metal Compositions, Thermal Imaging Donors And Patterned Multilayer Compositions Derived Therefrom
Richard Kevin Bailey - Newark DE, US Graciela Beatriz Blanchet - Wilmington DE, US Jonathan V. Caspar - Wilmington DE, US John Catron, Jr. - Smyrna DE, US Reid John Chesterfield - Santa Barbara CA, US Thomas C. Felder - Kennett PA, US Feng Gao - Hockessin DE, US Lynda Kaye Johnson - Wilmington DE, US Roupen Leon Keusseyan - Raleigh NC, US Dalen E. Keys - Landenberg PA, US Irina Malajovich - Swarthmore PA, US Jeffrey Scott Meth - Landenberg PA, US Geoffrey Nunes - Swarthmore PA, US Gerard O'Neil - Newark DE, US Rinaldo Soria Schiffino - Wilmington DE, US Nancy G. Tassi - Gibbstown NJ, US
Assignee:
E I du Pont de Nemours and Company - Wilmington DE
International Classification:
G03C 3/00 G03C 5/00 G03C 8/00
US Classification:
430200, 430 18, 430964
Abstract:
Thermal imaging donors are useful for thermal transfer patterning of a metal layer and optionally, a corresponding proximate portion of an additional transfer layer onto a thermal imaging receiver. The compositions are useful for dry fabrication of electronic devices. Also provided are patterned multilayer compositions comprising one or more base film(s), and one or more patterned metal layers. These include electromagnetic interference shields and touchpad sensors.
Thin Film Transistor Comprising Novel Conductor And Dielectric Compositions
Richard Kevin Bailey - Newark DE, US Graciela Beatriz Blanchet - Greenville DE, US John W. Catron - Smyrna DE, US Reid John Chesterfield - Wilmington DE, US Feng Gao - Hockessin DE, US Howard David Glicksman - Durham NC, US Marc B. Goldfinger - West Chester PA, US Gary Delmar Jaycox - West Chester PA, US Lynda Kaye Johnson - Wilmington DE, US Roupen Leon Keusseyan - Raleigh NC, US Irina Malajovich - Swarthmore NC, US Hong Meng - Wilmington DE, US Jeffrey Scott Meth - Landenberg PA, US Gerard O'Neil - Newark DE, US Kenneth George Sharp - Landenberg PA, US Nancy G. Tassi - Gibbstown NJ, US Geoffrey Nunes - Swarthmore PA, US
International Classification:
H01L 51/10 H01L 29/786
US Classification:
257 40, 257347, 257E29273, 257E51006
Abstract:
The invention relates to thin film transistors comprising novel dielectric layers and novel electrodes comprising metal compositions that can be provided by a dry thermal transfer process.
Thin Film Transistor Comprising Novel Conductor And Dielectric Compositions
Richard Kevin Bailey - Newark DE, US Graciela Beatriz Blanchet - Wilmington DE, US Reid John Chesterfield - Santa Barbara CA, US Howard David Glicksman - Durham NC, US Marc B. Goldfinger - West Chester PA, US Gary Delmar Jaycox - West Chester PA, US Lynda Kaye Johnson - Wilmington DE, US Roupen Leon Keusseyan - Raleigh NC, US Irina Malajovich - Swarthmore PA, US Hong Meng - Wilmington DE, US Jeffrey Scott Meth - Landenberg PA, US Geoffrey Nunes - Swarthmore PA, US Gerard O'Neil - Newark DE, US Kenneth George Sharp - Landenberg PA, US Feng Gao - Hockessin DE, US
Assignee:
E.I. DU PONT DE NEMOURS AND COMPANY - Wilmington DE
International Classification:
H01L 51/10
US Classification:
257 40, 977742, 977773, 257347, 257E51003
Abstract:
The invention relates to thin film transistors comprising novel dielectric layers and novel electrodes comprising metal compositions that can be provided by a dry thermal transfer process.
Thermally Imageable Dielectric Layers, Thermal Transfer Donors And Receivers
Gerald Donald Andrews - Hockessin DE, US Richard Kevin Bailey - Newark DE, US Graciela Beatriz Blanchet - Greenville DE, US Jonathan V. Caspar - Wilmington DE, US John Catron - Smyrna DE, US Reid John Chesterfield - Wilmington DE, US Feng Gao - Hockessin DE, US Marc B. Goldfinger - West Chester PA, US Gary Delmar Jaycox - West Chester PA, US Lynda Kaye Johnson - Wilmington DE, US Irina Malajovich - Swarthmore P DE, US William J. Marshall - Wilmington DE, US Elizabeth Forrester McCord - Hockessin DE, US Charles Nehemiah McEwan - Newark DE, US Jeffrey Scott Meth - Landenberg PA, US Geoffrey Nunes - Swarthmore PA, US Gerard O'Neil - Newark DE, US Paul J. Shannon - Exton PA, US Kenneth George Sharp - Landenberg PA, US Karyn B. Visscher - Voorhees NJ, US
The invention is related to thermal imageable dielectric layers and thermal transfer donors and receivers comprising dielectric layers. The thermal transfer donors are useful in making electronic devices by thermal transfer of dielectric layers having excellent resistivity, good transfer properties and good adhesion to a variety of receivers.
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