Giovanni Te Nocerino from Brentwood, CA, age 73

Vehicle Records

Giovanni Nocerino
view source
Address:

3760 Trenery Dr, Pleasanton, CA 94588
VIN:

WDDNG71X67A066097
Make:

MERCEDES-BENZ
Model:

S-CLASS
Year:

2007

Name / Title

Company / Classification

Phones & Addresses

Giovanni Nocerino
President

Media Lario USA Inc
Marketing and Advertising · Communication Services

4309 Hacienda Dr, Pleasanton, CA 94588
9254601465

Resumes

Giovanni Nocerino

view source

Location:

Pleasanton, CA

Industry:

Management Consulting

Us Patents

Source-Collector Module With Gic Mirror And Lpp Euv Light Source
view source
US Patent:

8330131, Dec 11, 2012
Filed:

Jun 18, 2010
Appl. No.:

12/803075
Inventors:

Natale M. Ceglio - Pleasanton CA, US
Giovanni Nocerino - Pleasanton CA, US
Fabio Zocchi - Samarate, IT
Assignee:

Media Lario, S.R.L. - Bosisio Parini
International Classification:

G21K 5/04
G03B 27/42
US Classification:

250504R, 359350, 359355, 359359
Abstract:

A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.

Source-Collector Module With Gic Mirror And Tin Rod Euv Lpp Target System
view source
US Patent:

8344339, Jan 1, 2013
Filed:

Aug 30, 2010
Appl. No.:

12/807166
Inventors:

Richard A. Levesque - Livermore CA, US
Natale M. Ceglio - Pleasanton CA, US
Giovanni Nocerino - Pleasanton CA, US
Fabio Zocchi - Samarate, IT
Assignee:

Media Lario S.R.L. - Bosisio Parini
International Classification:

H01J 37/20
US Classification:

250504R
Abstract:

A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates a rotating Sn rod in the target portion to generate the EUV radiation. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Source-Collector Module With Gic Mirror And Tin Vapor Lpp Target System
view source
US Patent:

20110318694, Dec 29, 2011
Filed:

Jun 28, 2010
Appl. No.:

12/803461
Inventors:

Richard Levesque - Livermore CA, US
Natale M. Ceglio - Pleasanton CA, US
Giovanni Nocerino - Pleasanton CA, US
Fabio Zocchi - Samarate, IT
International Classification:

H05G 2/00
G03F 7/20
G03B 27/70
US Classification:

430319, 250504 R, 2504921
Abstract:

A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Sn vapor from a Sn vapor source of the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device may be used to increase the amount of EUV radiation provided to the intermediate focus. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Source-Collector Module With Gic Mirror And Xenon Liquid Euv Lpp Target System
view source
US Patent:

20120050704, Mar 1, 2012
Filed:

Aug 30, 2010
Appl. No.:

12/807165
Inventors:

Richard A. Levesque - Livermore CA, US
Natale M. Ceglio - Pleasanton CA, US
Giovanni Nocerino - Pleasanton CA, US
Fabio Zocchi - Samarate, IT
International Classification:

G03B 27/42
H05G 2/00
US Classification:

355 53, 250504 R
Abstract:

A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Source-Collector Module With Gic Mirror And Xenon Ice Euv Lpp Target System
view source
US Patent:

20120050706, Mar 1, 2012
Filed:

Aug 30, 2010
Appl. No.:

12/807167
Inventors:

Richard A. Levesque - Livermore CA, US
Natale M. Ceglio - Pleasanton CA, US
Giovanni Nocerino - Pleasanton CA, US
Fabio Zocchi - Samarate, IT
International Classification:

G03B 27/52
H05G 2/00
US Classification:

355 55, 250504 R
Abstract:

A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon ice provided by the target portion to an irradiation location. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Source-Collector Module With Gic Mirror And Tin Wire Euv Lpp Target System
view source
US Patent:

20120050707, Mar 1, 2012
Filed:

Aug 30, 2010
Appl. No.:

12/807170
Inventors:

Richard A. Levesque - Livermore CA, US
Natale M. Ceglio - Pleasanton CA, US
Giovanni Nocerino - Pleasanton CA, US
Fabio Zocchi - Samarate, IT
International Classification:

G03B 27/52
H05G 2/00
US Classification:

355 55, 250504 R
Abstract:

A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates a Sn wire provided by the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Source-Collector Module Wth Gic Mirror And Lpp Euv Light Source
view source
US Patent:

20140152967, Jun 5, 2014
Filed:

Dec 2, 2012
Appl. No.:

13/691804
Inventors:

Natale M. Ceglio - Pleasanton CA, US
Giovanni Nocerino - Pleasanton CA, US
Fabio Zocchi - Samarate (VA), IT
International Classification:

G21K 5/04
G03F 7/20
US Classification:

355 67, 250504 R
Abstract:

A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.