Glenn A Carroll

US Patent:

6911393, Jun 28, 2005

Filed:

Nov 12, 2003

Appl. No.:

10/706178

Inventors:

Martin Nosowitz - Paoli PA, US
Nicholas M. Martyak - Doylestown PA, US
Glenn Carroll - Norristown PA, US
Patrick K. Janney - Ridley Park PA, US

Assignee:

Arkema Inc. - Philadelphia PA

International Classification:

H01L021/44

US Classification:

438678, 438692, 438745, 510175, 510176, 252 791

Abstract:

A family of slurries are disclosed which are useful in modifying exposed surfaces of wafers for semiconductor fabrication are provided along with methods of modifying exposed surfaces of wafers for semiconductor fabrication utilizing such a family of working slurries, and semiconductor wafers. The slurries of the invention are comprised of a liquid carrier; a sulfur-bearing compounds capable of converting copper to copper sulfide; optionally, abrasive particles (polishing agent; optionally a chelating agent; optionally a buffering agent; optionally, a stopping compound; optionally, other additives; and optionally, a co-solvent. The method of the invention comprises the steps of: a) providing a wafer comprising a first material having a surface etched to form a pattern and a second material deposited over the surface of the first material; b) contacting the second material of the wafer with abrasive in the presence of the working slurry; and c) relatively moving the wafer or polishing pad or both while the second material is in contact with the slurry and abrasive particles until an exposed surface of the wafer is planar and comprises at least one area of exposed first material and one area of exposed second material.

US Patent:

7208599, Apr 24, 2007

Filed:

Oct 26, 2004

Appl. No.:

10/973610

Inventors:

Glenn T. Carroll - Norristown PA, US
Gary S. Smith - Collegeville PA, US
Gary E. Stringer - Birdsboro PA, US

Assignee:

Arkema Inc. - Philadelphia PA

International Classification:

C07D 241/04

US Classification:

544358

Abstract:

The present invention relates to a process for the preparation of substituted alkanesulfonates by the reaction of an aqueous metal substituted 2-hydroxyethanesulfonate with a nucleophile. 2-Alkylaminoalkanesulfonate is formed when the nucleophile is an amine. The invention also relates to the optimization of reaction conditions to produce an optimum yield.

US Patent:

20080214414, Sep 4, 2008

Filed:

Jul 12, 2006

Appl. No.:

11/994527

Inventors:

Glenn T. Carroll - Jeffersonville PA, US
Gary E. Stringer - Birdsboro PA, US
Gary S. Smith - Collegeville PA, US

Assignee:

Arkema Inc. - Philadelphia PA

International Classification:

C23F 11/16

US Classification:

507247

Abstract:

Oil wells are treated with latent acids containing a sulfonyl moiety, wherein the latent acid is capable of providing an active acid after injection into an oil well. The latent acids are converted to active acids, such as mineral acids or strong organic acids, in the oil well, with resultant dissolution of acid-soluble minerals that impede oil or gas flow. RYSO2X is an exemplary latent acid, where: R is C(1)-C(30) hydrocaryl alone, or appended to an oligomeric or polymeric chain, or substituted; X is halogen; and Y is O, S, Se, or NR or a direct bond. M is a Group IVA metal, a Group IVB metal, a Group IB metal, or a Group HB metal. Other exemplary latent acids include amine functionality.

US Patent:

20110136706, Jun 9, 2011

Filed:

Feb 17, 2011

Appl. No.:

13/029358

Inventors:

Glenn T. Carroll - Jeffersonville PA, US
Gary E. Stringer - Birdsboro PA, US
Gary S. Smith - Collegeville PA, US

Assignee:

Arkema Inc. - Philadelphia PA

International Classification:

C09K 8/58

US Classification:

507259

Abstract:

Oil wells are treated with latent acids containing a sulfonyl moiety, wherein the latent acid is capable of providing an active acid after injection into an oil well. The latent acids are converted to active acids such as mineral acids or strong organic acids in the oil well, with resultant dissolution of acid-soluble minerals that impede oil or gas flow. Exemplary latent acids are according to any of formulas (I), (II), and (III)In formulas (I), (II), and (III), Ris selected from the group consisting of C-Chydrocarbyl moieties, C-Chydrocarbyl moieties appended to an oligomeric or polymeric chain, and C-Chydrocarbyl moieties substituted with functional groups containing halogen, oxygen, sulfur, selenium, silicon, tin, lead, nitrogen, phosphorous, antimony, bismuth, aluminum, boron, or metals selected from Groups IA-IIA and IB-VIIIB of the periodic table; X is a halogen or ZCRRR; Y and Z are independently O, S, Se, or NR, and Y may also be a direct bond; R, R, Rand Rare independently hydrogen or as defined for Rand wherein any two or more of R, R, R, Rand Rmay be interconnected to form one or more cyclic structures; M is a Group IVA metal, a Group IVB metal, a Group IB metal, or a Group IIB metal; and p+q+r=n wherein n is the valence of metal M.

US Patent:

51868482, Feb 16, 1993

Filed:

Mar 28, 1991

Appl. No.:

7/678905

Inventors:

Glenn T. Carroll - Jeffersonville PA
Michael J. Lindstrom - Downingtown PA

Assignee:

Elf Atochem North America, Inc. - Philadelphia PA

International Classification:

E21B 3700

US Classification:

252 8552

Abstract:

A process is disclosed for preparing a composition having improved solvent power for sulfur wherein a composition comprising a sulfide having the general formula RSSaSR' wherein R and R' are defined carbon-containing radicals and a is 0 to 3, and a catalyst for improving the ability of said composition to take up sulfur is treated, either before, during or after the addition of said catalyst to said composition, with a primary or secondary amine in an effective amount and for an effective time period.

US Patent:

52426726, Sep 7, 1993

Filed:

May 2, 1988

Appl. No.:

7/188863

Inventors:

Jeffrey H. Yen - Woolwich NJ
Glenn T. Carroll - Jeffersonville PA
Vijay R. Srinivas - Uwchlan PA
William J. Tuszynski - Milford Township, Bucks County PA
John A. Wismer - Devon PA

Assignee:

Elf Atochem North America, Inc. - Philadelphia PA

International Classification:

C01B 1720
E21B 3706

US Classification:

423562

Abstract:

A process for removing sulfur from an organic polysulfide by reaction with an aqueous stripping solution of at least one sulfide salt and/or hydrosulfide salt in a multi-stage, continuous, countercurrent flow, reaction system wherein the sulfur is stripped from the polysulfide into the aqueous stripping solution phase which is separated from the polysulfide organic phase.

US Patent:

48044857, Feb 14, 1989

Filed:

May 8, 1987

Appl. No.:

7/047956

Inventors:

Glenn T. Carroll - Jeffersonville PA
Michael J. Lindstrom - Downingtown PA
William J. Tuszynski - Spinnerstown PA

Assignee:

Pennwalt Corporation - Philadelphia PA

International Classification:

E21B 3700
B08B 902

US Classification:

252 8552

Abstract:

A composition, useful for dissolving sulfur, which comprises a major amount of a disulfide or polysulfide and a catalyst comprising one or more polyalkyleneoxyamines or polyamines, and methods for using the composition in a system to prevent sulfur-plugging, are disclosed.

US Patent:

53129920, May 17, 1994

Filed:

Oct 23, 1991

Appl. No.:

7/780608

Inventors:

Roger T. Clark - Pottstown PA
Michael J. Lindstrom - Downington PA
Glenn T. Carroll - Jeffersonville PA
Jeffrey H.-G. Yen - Woolwich NJ

Assignee:

Elf Atochem North America, Inc. - Philadelphia PA

International Classification:

C07C31922

US Classification:

568 21

Abstract:

A process for removing sulfur from an organic sulfide containing three or more chemically bound sulfur atoms is disclosed wherein said sulfide is contacted with a defined catalyst at elevated temperature to increase the disproportionation rate and the corresponding sulfide of lower sulfur rank is continuously removed from the reaction zone.