Gregory K Lowe

US Patent:

20130095380, Apr 18, 2013

Filed:

Oct 4, 2012

Appl. No.:

13/644933

Inventors:

John D. Affinito - Tucson AZ, US
Gregory K. Lowe - Tucson AZ, US

Assignee:

Sion Power Corporation - Tucson AZ

International Classification:

H01M 10/056
H01M 4/13

US Classification:

429207, 42923195

Abstract:

Electrode structures, and more specifically, electrode structures for use in electrochemical cells, are provided. The electrode structures described herein may include one or more protective layers. In one set of embodiments, a protective layer may be formed by exposing a lithium metal surface to a plasma comprising ions of a gas to form a ceramic layer on top of the lithium metal. The ceramic layer may be highly conductive to lithium ions and may protect the underlying lithium metal surface from reaction with components in the electrolyte. In some cases, the ions may be nitrogen ions and a lithium nitride layer may be formed on the lithium metal surface. In other embodiments, the protective layer may be formed by converting lithium to lithium nitride at high pressures. Other methods for forming protective layers are also provided.

US Patent:

20130216915, Aug 22, 2013

Filed:

Mar 26, 2013

Appl. No.:

13/850437

Inventors:

Sion Power Corporation - , US
Gregory K. Lowe - Tucson AZ, US

Assignee:

Sion Power Corporation - Tucson AZ

International Classification:

H01M 4/38

US Classification:

42923195

Abstract:

Electrode structures, and more specifically, electrode structures for use in electrochemical cells, are provided. The electrode structures described herein may include one or more protective layers. In one set of embodiments, a protective layer may be formed by exposing a lithium metal surface to a plasma comprising ions of a gas to form a ceramic layer on top of the lithium metal. The ceramic layer may be highly conductive to lithium ions and may protect the underlying lithium metal surface from reaction with components in the electrolyte. In some cases, the ions may be nitrogen ions and a lithium nitride layer may be formed on the lithium metal surface. In other embodiments, the protective layer may be formed by converting lithium to lithium nitride at high pressures. Other methods for forming protective layers are also provided.

US Patent:

63158736, Nov 13, 2001

Filed:

May 26, 2000

Appl. No.:

9/579654

Inventors:

Gregory Kent Lowe - Tucson AZ
Donald Bennett Hilliard - Tucson AZ

International Classification:

C23C 1434

US Classification:

20419215

Abstract:

A method for depositing films of a fluorinated compound is disclosed, wherein a reactive sputtering process allows the use of a metal or other non-fluorinated material as the target material. The process developed also utilizes XeF. sub. 2 as a vapor source, which provides fluorine for the formation of the fluorinated compound. Unlike reactive process gases, such as SF. sub. 4 and CF. sub. 4, used in previous experiments attempting reactive sputtering of fluoride compounds, the XeF. sub. 2 vapor does not result in unwanted contamination due to a reactive gas cation, i. e. , inclusions of carbon or sulfur. These, and other considerations, have allowed the development of a process for fabricating dense, optical quality fluoride films. At the same time, the material costs and handling expenses related to the XeF. sub. 2 source are also relatively low.