Harshal T Vasa

US Patent:

20170114448, Apr 27, 2017

Filed:

Oct 26, 2015

Appl. No.:

14/923357

Inventors:

- San Jose CA, US
Harish Varma Penmethsa - Sunnyvale CA, US
Harshal T. Vasa - Santa Clara CA, US
Srikanth Dasaradhi - San Jose CA, US
Lee LaBlanc - Sunnyvale CA, US

International Classification:

C23C 14/35
H01J 37/32
H01J 37/34
C23C 14/50
C23C 14/54

Abstract:

A circular PVD chamber has a plurality of sputtering targets mounted on a top wall of the chamber. A pallet in the chamber is coupled to a motor for rotating the pallet about its center axis. The pallet has a diameter less than the diameter of the circular chamber. The pallet is also shiftable in an XY direction to move the center of the pallet beneath any of the targets so all areas of a workpiece supported by the pallet can be positioned directly below any one of the targets. A scanning magnet is in back of each target and is moved, via a programmed controller, to only be above portions of the workpiece so that no sputtered material is wasted. For depositing a material onto small workpieces, a cooling backside gas volume is created between the pallet and the underside of sticky tape supporting the workpieces.