- San Francisco CA, US Xiaoyuan Yang - Pleasanton CA, US Ho Jin Kim - San Francisco CA, US Steven Ward - Moraga CA, US
International Classification:
G06N 5/04 G06N 20/00
Abstract:
In some embodiments, a computer-implemented method for predicting agronomic field property data for one or more agronomic fields using a trained machine learning model is disclosed. The method comprises receiving, at an agricultural intelligence computer system, agronomic training data; training a machine learning model, at the agricultural intelligence computer system, using the agronomic training data; in response to receiving a request from a client computing device for agronomic field property data for one or more agronomic fields, automatically predicting the agronomic field property data for the one or more agronomic fields using the machine learning model configured to predict agronomic field property data; based on the agronomic field property data, automatically generating a first graphical representation; and causing to display the first graphical representation on the client computing device.
Identifying Impending User-Competitor Relationships On An Online Social Networking System
An online social networking system receives a first set of data associated with activities between its members and its competitors. The system uses the first set of data to develop and train propensity models to predict when the members and the competitors are likely to establish a business relationship. The system tests the propensity models to determine a best propensity model and selects that best propensity model. The system receives a second set of data associated with activities between a particular member and particular competitor. The system uses the best propensity model for predicting when the particular member and the particular competitor are likely to establish a business relationship based on the second set of data, and transmits an electronic message to the particular member relating to the business relationship between the particular member and the particular competitor.
Systems And Methods For Timely Propagation Of Network Content
- Mountain View CA, US Ho jeong Kim - Belmont CA, US
International Classification:
H04L 29/08
Abstract:
A content propagation system includes processors, memory storing user activity data and interaction data on a social network, and a content propagation engine configured to receive an indication of a share event from the sharing user, the share event including a content item, identify a plurality of target users for the share event, identify a plurality of time blocks, compute an activity value for each target user of the plurality of target users, and for each time block of the plurality of time blocks, the activity value is based on the user activity data, compute an engagement value for each target user based at least in part on the interaction data, determine a share time based at least in part on the plurality of activity values and the plurality of engagement values, and publish the content item to the plurality of target users at the share time.
Network-Based Publications Using Feature Engineering
- Mountain View CA, US Ho Jeong Kim - Belmont CA, US
International Classification:
G06Q 50/00 G06N 99/00 H04L 29/08
Abstract:
A content analysis system includes one or more hardware processors, a memory storing historical content engagement information associated with a user, a user summary, first and second content items including content summaries, and a content analysis engine. The content analysis engine is configured to identify a past content item from the historical content engagement information, combine the user summary and the past content item into a combined summary, apply the combined summary to a model, thereby generating a user vector having a plurality of terms, each term representing a word or word-phrase in a dictionary of terms, apply the first content item and second content item to the model, thereby generating first and second item vectors, compare the user vector with the first item vector and the second item vector and, based on the comparing, select the first content item for presentation to the user.
Method For Forming Features In A Silicon Containing Layer
- Santa Clara CA, US HOON SANG LEE - Hwasung City, KR JINSU KIM - Kyung-Ki-Do, KR HO JEONG KIM - San Jose CA, US XIAOSONG JI - Milpitas CA, US HUN SANG KIM - San Ramon CA, US JINHAN CHOI - San Ramon CA, US
International Classification:
H01L 21/3065 H01L 21/762
US Classification:
438424, 438719, 438723, 438724
Abstract:
Embodiments of methods for forming features in a silicon containing layer of a substrate disposed on a substrate support are provided herein. In some embodiments, a method for forming features in a silicon containing layer of a substrate disposed on a substrate support in a processing volume of a process chamber includes: exposing the substrate to a first plasma formed from a first process gas while providing a bias power to the substrate support, wherein the first process gas comprises one or more of a chlorine-containing gas or a bromine containing gas; and exposing the substrate to a second plasma formed from a second process gas while no bias power is provided to the substrate support, wherein the second process gas comprises one or more of an oxygen-containing gas or nitrogen gas, and wherein a source power provided to form the first plasma and the second plasma is continuously provided.
Aspect Ratio Dependent Etch (Arde) Lag Reduction Process By Selective Oxidation With Inert Gas Sputtering
- Santa Clara CA, US Xiaosong JI - Milpitas CA, US Jinhan CHOI - San Ramon CA, US Ho Jeong KIM - San Jose CA, US Byungkook KONG - San Ramon CA, US Hoon Sang LEE - Hwasung City, KR
Assignee:
APPLIED MATERIALS, INC. - Santa Clara CA
International Classification:
H01L 21/3065
US Classification:
438712
Abstract:
Embodiments of methods for etching a substrate include exposing the substrate to a first plasma formed from an inert gas; exposing the substrate to a second plasma formed from an oxygen-containing gas to form an oxide layer on a bottom and sides of a low aspect ratio feature and a high aspect ratio feature, wherein the oxide layer on the bottom of the low aspect ratio feature is thicker than on the bottom of the high aspect ratio feature; etching the oxide layer from the bottom of the low and high aspect ratio features with a third plasma to expose the bottom of the high aspect ratio feature while the bottom of the low aspect ratio feature remains covered; and exposing the substrate to a fourth plasma formed from a halogen-containing gas to etch the bottom of the low aspect ratio feature and the high aspect ratio feature.
Name / Title
Company / Classification
Phones & Addresses
Mr. Ho Kim Business Owner
Camacc Systems Inc Security Control Equipment. Sys/Monitor