New London VA Outpatient Clinic 4 Shaws Cv STE 101, New London, CT 06320 8604373611 (phone), 8604371801 (fax)
East Haven Counseling & Community Services 595 Thompson Ave, East Haven, CT 06512 2034683297 (phone), 2034683334 (fax)
VA Connecticut Healthcare System Psychiatry 950 Campbell Ave Blg1 Fl7, New Haven, CT 06516 2039325711 (phone), 2039373886 (fax)
Languages:
English Spanish
Description:
Dr. Lin works in East Haven, CT and 2 other locations and specializes in Psychiatry. Dr. Lin is affiliated with VA Connecticut Healthcare System West Haven Campus and Yale-New Haven Childrens Hospital.
Hong Lin - Palo Alto CA Katherine Y. Lin - Mountain View CA
Assignee:
Calmar Optcom, Inc. - Mountain View CA
International Classification:
H01S 3098
US Classification:
372 18, 372 6, 372 75, 372 98
Abstract:
A passive mode-locked linear-resonator fiber laser using polarization-maintaining fibers and a saturable absorber to produce ultra short pulses and a long-term reliable operation with reduced maintenance. Such a fiber laser can be configured to produce tunable pulse repetition rate and tunable laser wavelength.
Hong Lin - Palo Alto CA Katherine Y. Lin - Mountain View CA
Assignee:
Calmar Optcom, Inc. - Mountain View CA
International Classification:
H01S 3098
US Classification:
372 6, 372 18
Abstract:
A passive mode-locked linear-resonator fiber laser using polarization-maintaining fibers and a saturable absorber to produce ultra short pulses and a long-term reliable operation with reduced maintenance. Such a fiber laser can be configured to produce tunable pulse repetition rate and tunable laser wavelength.
Actively Mode-Locked Fiber Laser With Controlled Chirp Output
Bi-metal and other passive thermal compensators for mitigating thermal-induced variations in the length of a fiber loop. Exemplary applications in fiber lasers are described.
Method Of Reducing Leakage Using Si3N4 Or Sion Block Dielectric Films
Hong Lin - Vancouver WA Shiqun Gu - Vancouver WA Peter McGrath - Portland OR
Assignee:
LSI Logic Corporation - Milpitas CA
International Classification:
H01L 218234
US Classification:
438238, 438210, 438382
Abstract:
A dielectric film block is used in semiconductor processing to protect selected areas of the wafer from silicidation. The selected areas may include resistors. A first layer of oxide is formed on the resistor and a second layer comprising SiON or Si N is disposed on the oxide. A mask is patterned to allow etching to take place in the areas where silicide formation is desired. The oxide layer serves as an etch stop layer during etching of the second layer.
High-K Dielectric Birds Beak Optimizations Using In-Situ O2 Plasma Oxidation
In a method of forming an integrated circuit device, sidewall oxides are formed by plasma oxidation on the patterned gate. This controls encroachment beneath a dielectric layer underlying the patterned gate. The patterned gate is oxidized using in-situ O plasma oxidation. The presence of the sidewall oxides minimizes encroachment under the gate edge.
Name / Title
Company / Classification
Phones & Addresses
Hong Lin CEO
Calmar Com Nonclassifiable Establishments
914 Colorado Ave, Palo Alto, CA 94303
Hong Lin President
Calmar Com, Inc. Elementary and Secondary Schools
914 Colorado Ave., Palo Alto, CA 94303
Hong Lin
Giant Realty Inc Real Estate Agents and Managers
20375 Stevens Creek Blvd, Cupertino, CA 95014
Hong Lin Principle
Calmar Optcom, Inc Electric and Other Services Combined