Hongyou Y Fan

Address:

8421 S Sandoval St NE, Albuquerque, NM 87122

Phone:

5054740066

VIN:

WBAVC93587K032554

Make:

BMW

Model:

3 SERIES

Year:

2007

US Patent:

6387453, May 14, 2002

Filed:

Mar 2, 2000

Appl. No.:

09/517873

Inventors:

C. Jeffrey Brinker - Albuquerque NM
Yunfeng Lu - San Jose CA
Hongyou Fan - Albuquerque NM

Assignee:

Sandia Corporation - Albuquerque NM

International Classification:

B05D 302

US Classification:

427387, 427240, 427245, 427346, 4273762, 427377, 4273977, 427421, 4274301

Abstract:

An evaporation-induced self-assembly method to prepare a porous, surfactant-templated, thin film by mixing a silica sol, a solvent, a surfactant, and an interstitial compound, evaporating a portion of the solvent to form a liquid, crystalline thin film mesophase material, and then removal of the surfactant template. Coating onto a substrate produces a thin film with the interstitial compound either covalently bonded to the internal surfaces of the ordered or disordered mesostructure framework or physically entrapped within the ordered or disordered mesostructured framework. Particles can be formed by aerosol processing or spray drying rather than coating onto a substrate. The selection of the interstitial compound provides a means for developing thin films for applications including membranes, sensors, low dielectric constant films, photonic materials and optical hosts.

US Patent:

6471761, Oct 29, 2002

Filed:

Apr 20, 2001

Appl. No.:

09/838153

Inventors:

Hongyou Fan - Albuquerque NM
Gabriel P. Lopez - Albuquerque NM
Charles Jeffrey Brinker - Albuquerque NM
Yunfeng Lu - Metairie LA

Assignee:

University of New Mexico - Albuquerque NM
Sandia National Laboratories - Albuquerque NM

International Classification:

C09D 500

US Classification:

10628716, 10628711, 10628713, 10628714, 427256, 427387, 1014501, 347 96

Abstract:

The present invention provides a coating composition comprising: A coating composition comprising: TEOS; a surfactant; at least one organosilane; HCl; water; and ethanol. The present invention also provides films made from such a coating composition and a method for making such films.

US Patent:

6808867, Oct 26, 2004

Filed:

Mar 19, 2002

Appl. No.:

10/100108

Inventors:

Dhaval Doshi - Albuquerque NM
Hongyou Fan - Albuquerque NM
Nicola Huesing - Vienna, AT
Alan Hurd - Tijeras NM
Charles Jeffrey Brinker - Albuquerque NM

Assignee:

Science Technology Corporation University of New Mexico - Albuquerque NM

International Classification:

G03F 700

US Classification:

430320, 430322, 430330, 430396

Abstract:

The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: a templating molecule, a photoactivator generator, a material capable of being sol-gel processed, water, and a solvent; and exposing the film to light to form a patterned mesoporous material.

US Patent:

6913832, Jul 5, 2005

Filed:

Jun 7, 2002

Appl. No.:

10/163425

Inventors:

Hongyou Fan - Albuquerque NM, US
Gabriel P. Lopez - Albuquerque NM, US
Charles Jeffrey Brinker - Albuquerque NM, US
Yunfeng Lu - Metairie LA, US

Assignee:

Science & Technology Corporation at University of New Mexico - Albuquerque NM

International Classification:

B32B025/20

US Classification:

428447, 528 39, 528 12, 528 38, 528 30, 528 42, 528 35

Abstract:

The present invention provides a coating composition comprising: A coating composition comprising: TEOS; a surfactant; at least one organosilane; HCl; water; and ethanol. The present invention also provides films made from such a coating composition and a method for making such films.

US Patent:

7332264, Feb 19, 2008

Filed:

Feb 26, 2003

Appl. No.:

10/373565

Inventors:

Dhaval Doshi - Los Alamos NM, US
Hongyou Fan - Albuquerque NM, US
Nicola Huesing - Vienna, AT
Alan Hurd - Tijeras NM, US
Charles Jeffrey Brinker - Albuquerque NM, US

Assignee:

STC.UNM - Albuquerque NM

International Classification:

G03F 7/26

US Classification:

430322

Abstract:

The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: at least one photoactivator generator, at least one material capable of being sol-gel processed; and exposing the film to light to form a patterned mesoporous material.

US Patent:

8092595, Jan 10, 2012

Filed:

Feb 27, 2008

Appl. No.:

12/038037

Inventors:

Hongyou Fan - Albuquerque NM, US
C. Jeffrey Brinker - Albuquerque NM, US
Gabriel P. Lopez - Albuquerque NM, US

Assignee:

Sandia Corporation - Albuquerque NM

International Classification:

C30B 7/04

US Classification:

117 70, 117 68, 117 69, 427226, 427294, 427350, 4273722, 252582

Abstract:

A method for forming an ordered array of nanocrystals where a hydrophobic precursor solution with a hydrophobic core material in an organic solvent is added to a solution of a surfactant in water, followed by removal of a least a portion of the organic solvent to form a micellar solution of nanocrystals. A precursor co-assembling material, generally water-soluble, that can co-assemble with individual micelles formed in the micellar solution of nanocrystals can be added to this micellar solution under specified reaction conditions (for example, pH conditions) to form an ordered-array mesophase material. For example, basic conditions are used to precipitate an ordered nanocrystal/silica array material in bulk form and acidic conditions are used to form an ordered nanocrystal/silica array material as a thin film.

US Patent:

8257676, Sep 4, 2012

Filed:

Nov 28, 2006

Appl. No.:

11/560191

Inventors:

Hongyou Fan - Albuquerque NM, US

Assignee:

Sandia Corporation - Albuquerque NM

International Classification:

C01B 31/02

US Classification:

423445R, 502423

Abstract:

A method for preparing a precursor solution for synthesis of carbon nanomaterials, where a polar solvent is added to at least one block copolymer and at least one carbohydrate compound, and the precursor solution is processed using a self-assembly process and subsequent heating to form nanoporous carbon films, porous carbon nanotubes, and porous carbon nanoparticles.

US Patent:

8288001, Oct 16, 2012

Filed:

Feb 16, 2010

Appl. No.:

12/706003

Inventors:

Hongyou Fan - Albuquerque NM, US
Zaicheng Sun - Albuquerque NM, US

Assignee:

Sandia Corporation - Albuquerque NM

International Classification:

B32B 5/02
B32B 5/16

US Classification:

428402, 428403, 428404, 4272133, 427212

Abstract:

A method of making particles of either spherical or cylindrical geometry with a characteristic diameter less than 50 nanometers by mixing at least one structure directing agent dissolved in a solvent with at least one amphiphilic block copolymer dissolved in a solvent to make a solution containing particles, where the particles can be subsequently separated and dispersed in a solvent of choice.