Hui Bin Huang

US Patent:

7642270, Jan 5, 2010

Filed:

Sep 12, 2006

Appl. No.:

11/519611

Inventors:

Mark R. Player - Phoenixville PA, US
Hui Huang - Monroe Township NJ, US
Daniel A. Hutta - Belle Mead NJ, US
Renee L. DesJarlais - Saint Davids PA, US

Assignee:

Janssen Pharmaceutica N.V. - Beerse

International Classification:

A61K 31/44
C07D 471/06

US Classification:

514303, 544279

Abstract:

The invention addresses the current need for selective and potent protein tyrosine kinase inhibitors by providing potent inhibitors of c-fms kinase. The invention is directed to the novel compounds of Formula I:.

US Patent:

7728003, Jun 1, 2010

Filed:

Sep 12, 2006

Appl. No.:

11/519662

Inventors:

Mark R. Player - Phoenixville PA, US
Hui Huang - Monroe Township NJ, US
Hu Huaping - Pennington NJ, US
Renee L. DesJarlais - Saint Davids PA, US

Assignee:

Janssen Pharmaceutica N.V. - Beerse

International Classification:

A61K 31/44
C07D 471/04

US Classification:

514303, 544279

Abstract:

The invention addresses the current need for selective and potent protein tyrosine kinase inhibitors by providing potent inhibitors of c-fms kinase. The invention is directed to the novel compounds of Formula I:.

US Patent:

20210323115, Oct 21, 2021

Filed:

Apr 18, 2020

Appl. No.:

16/852418

Inventors:

- Newark DE, US
Katsumasa KAWABATA - Kyoto, JP
Hui Bin HUANG - Monroeville NJ, US
Akane UEHARA - Kyoto, JP
Yosuke TAKEI - Shimane, JP

International Classification:

B24B 37/24

Abstract:

The invention provides a porous polyurethane polishing pad that includes a porous matrix. The matrix has large pores that extend upward from a base surface and open to an upper surface. The large pores are interconnected with tertiary pores, a portion of the large pores is open to a top polishing surface and at least a portion of the large pores extend to the top polishing surface. Spring-arm sections connect lower and upper sections of the large pores. The spring-arm sections all are in a same horizontal direction as measured from the vertical orientation and they combine for increasing compressibility of the polishing pad and contact area of the top polishing surface during polishing.

US Patent:

20210323116, Oct 21, 2021

Filed:

Apr 18, 2020

Appl. No.:

16/852422

Inventors:

- Newark DE, US
Katsumasa KAWABATA - Kyoto, JP
Hui Bin HUANG - Monroeville NJ, US
Akane UEHARA - Kyoto, JP
Yosuke TAKEI - Shimane, JP

International Classification:

B24B 37/26
B24B 37/24

Abstract:

The invention provides a porous polyurethane polishing pad that includes a porous matrix having large pores that extend upward from a base surface and open to an upper surface. The large pores extend to the top polishing surface and have lower and upper sections with a vertical orientation. The lower and upper sections are offset in a horizontal direction. Middle-sized pores with a columnar shape and a vertical orientation originate adjacent the middle sections and small pores with a columnar shape and a vertical orientation originate between the middle-sized pores. The pores combine for increasing compressibility of the polishing pad and contact area of the top polishing surface during polishing.

US Patent:

20210323202, Oct 21, 2021

Filed:

Apr 18, 2020

Appl. No.:

16/852420

Inventors:

- Newark DE, US
Katsumasa KAWABATA - Kyoto, JP
Hui Bin HUANG - Monroeville NJ, US
Akane UEHARA - Kyoto, JP
Yosuke TAKEI - Shimane, JP

International Classification:

B29C 43/30
B24B 37/24
C08J 5/18
B29C 43/00

Abstract:

The invention provides a method of forming porous polyurethane polishing pad that includes feeding liquid polyurethane onto a web sheet with a doctor blade while back tensioning the web. Coagulating liquid polyurethane onto the web sheet forms a two-layer substrate. The two-layer substrate has a porous matrix wherein the porous matrix has large pores extending upward from a base surface and open to an upper surface. Spring-arm sections connect lower and upper sections of the large pores.

US Patent:

20180036860, Feb 8, 2018

Filed:

Aug 4, 2016

Appl. No.:

15/229009

Inventors:

- Newark DE, US
Kazutaka Miyamoto - Mie, JP
Katsumasa Kawabata - Kyoto, JP
Henry Sanford-Crane - Elkton MD, US
Hui Bin Huang - Monroeville NJ, US
George C. Jacob - Newark DE, US
Shuiyuan Luo - Newark DE, US

International Classification:

B24B 37/24
B24D 18/00
B24B 37/26

Abstract:

The method forms a porous polyurethane polishing pad by coagulating thermoplastic polyurethane to create a porous matrix having large pores extending upward from a base surface and open to an upper surface. The large pores are interconnected with small pores. Heating a press to temperature below or above the softening onset temperature of the thermoplastic polyurethane forms a series of pillows. Plastic deforming side walls of the pillow structures forms downwardly sloped side walls. The downwardly sloped side walls extend from all sides of the pillow structures. The large pores open to the downwardly sloped sidewalls are less vertical than the large pores open to the top polishing surface and are offset 10 to 60 degrees from the vertical direction.

US Patent:

20180036862, Feb 8, 2018

Filed:

Aug 4, 2016

Appl. No.:

15/228988

Inventors:

- Newark DE, US
Kazutaka Miyamoto - Mie, JP
Katsumasa Kawabata - Kyoto, JP
Henry Sanford-Crane - Elkton MD, US
Hui Bin Huang - Monroeville NJ, US
George C. Jacob - Newark DE, US
Shuiyuan Luo - Newark DE, US

International Classification:

B24B 37/26
B24B 37/24

Abstract:

The porous polyurethane polishing pad includes a porous polyurethane matrix having large pores extending upward from a base surface and open to a polishing surface. A series of pillow structures is formed from the porous matrix that include the large pores and the small pores. The pillow structures have a downward surface extending from the top polishing surface for forming downwardly sloped side walls at an angle from 30 to 60 degrees from the polishing surface. The large pores open to the downwardly sloped sidewalls and are less vertical than the large pores. The large pores are offset 10 to 60 degrees from the vertical direction in a direction more orthogonal to the sloped sidewalls.

US Patent:

20170291908, Oct 12, 2017

Filed:

Apr 11, 2017

Appl. No.:

15/484174

Inventors:

- Beerse, BE
Mark R. Player - Phoenixville PA, US
Hui Huang - Blue Bell PA, US
Michael P. Winters - Morgantown PA, US

International Classification:

C07D 495/04
C07D 409/14
C07D 409/12

Abstract:

Disclosed are compounds, compositions and methods for treating of disorders that are affected by the modulation of the GPR40 receptor. Such compounds are represented by Formula (I) as follows:wherein U, U, U, R, R, Z, and W are defined herein.