Hung Minh Pham

US Patent:

6563586, May 13, 2003

Filed:

Jul 10, 2000

Appl. No.:

09/613176

Inventors:

Fred E. Stanke - Cupertino CA
Clinton B. Carlisle - Palo Alto CA
Hung Pham - San Jose CA
Edric Tong - Sunnyvale CA
Douglas E. Ruth - Sunnyvale CA
James M. Cahill - San Jose CA
Michael Weber - Sunnyvale CA
Elliot Burke - Santa Barbara CA

Assignee:

Therma-Wave, Inc. - Fremont CA

International Classification:

G01N 2188

US Classification:

356445, 3562372

Abstract:

This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

US Patent:

6919958, Jul 19, 2005

Filed:

Mar 26, 2003

Appl. No.:

10/397917

Inventors:

Fred E. Stanke - Cupertino CA, US
Clinton B. Carlisle - Palo Alto CA, US
Hung Van Pham - San Jose CA, US
Edric Tong - Sunnyvale CA, US
Douglas E. Ruth - Sunnyvale CA, US
Elliot Burke - Goleta CA, US
Adam E. Norton - Palo Alto CA, US

Assignee:

Therma-Wave, Inc. - Fremont CA

International Classification:

G01N021/88

US Classification:

3562372

Abstract:

This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

US Patent:

6965895, Nov 15, 2005

Filed:

Jul 12, 2002

Appl. No.:

10/194920

Inventors:

Shawn B. Smith - Palo Alto CA, US
Brian P. Grigsby - Austin TX, US
Hung J. Pham - Leander TX, US
Tony L. Davis - Austin TX, US
Manjunath S. Yedatore - Austin TX, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

G06F017/30

US Classification:

707 10, 707 5, 707 6, 707101, 7071041, 706 25

Abstract:

A method for data mining information obtained in an integrated circuit fabrication factory (“fab”) that includes steps of: (a) gathering data from the fab from one or more of systems, tools, and databases that produce data in the fab or collect data from the fab; (b) formatting the data and storing the formatted data in a source database; (c) extracting portions of the data for use in data mining in accordance with a user specified configuration file; (d) data mining the extracted portions of data in response to a user specified analysis configuration file; (e) storing results of data mining in a results database; and (f) providing access to the results.

US Patent:

6974618, Dec 13, 2005

Filed:

Jan 16, 2004

Appl. No.:

10/758269

Inventors:

Eugenia Kumacheva - Toronto, CA
Hung H. Pham - Fremont CA, US
Ilya Gourevich - Toronto, CA

International Classification:

B32B003/02

US Classification:

428 641, 428 644, 428407, 43027014

Abstract:

An optical data storage device comprised of periodic nanostructured polymer-based material produced from core-shell particles containing one dye in the core and a second dye in the shell. The combinations of dyes can be UV-Vis-dyes or Vis-NIR or UV-NIR. It is shown that selective single-photon photobleaching of the two dyes leads to increase in density of data storage and allows one to employ single-photon photobleaching to achieve the same storage density as in two-photon-writing.

US Patent:

7042580, May 9, 2006

Filed:

Mar 22, 2000

Appl. No.:

09/533613

Inventors:

Fred E. Stanke - Cupertino CA, US
Clinton B. Carlisle - Palo Alto CA, US
Hung Pham - San Jose CA, US
Edric Tong - Sunnyvale CA, US
Douglas E. Ruth - Sunnyvale CA, US
James M. Cahill - San Jose CA, US
Michael Weber - Sunnyvale CA, US
Elliot Burke - Santa Barbara CA, US

Assignee:

Tokyo Electron Limited - Tokyo

International Classification:

G01B 11/24

US Classification:

356601, 3562372, 356455, 356630

Abstract:

This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

US Patent:

7177019, Feb 13, 2007

Filed:

Feb 1, 2005

Appl. No.:

11/048552

Inventors:

Fred E. Stanke - Cupertino CA, US
Douglas E. Ruth - Sunnyvale CA, US
James M. Cahill - San Jose CA, US
Michael Weber - Sunnyvale CA, US
Clinton B. Carlisle - Palo Alto CA, US
Hung Pham - San Jose CA, US
Edric Tong - Sunnyvale CA, US
Elliot Burke - Santa Barbara CA, US

Assignee:

Tokyo Electron Limited - Tokyo

International Classification:

G01B 11/24

US Classification:

3562372, 356601, 356630

Abstract:

This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

US Patent:

20040201486, Oct 14, 2004

Filed:

Apr 10, 2003

Appl. No.:

10/410844

Inventors:

Thomas Knowles - Norco CA, US
Rakesh Malhotra - Chino Hills CA, US
Hung Pham - Rancho Cucamonga CA, US
John Sharkey - Elgin IL, US

International Classification:

G08B021/00

US Classification:

340/657000, 246/020000, 340/641000

Abstract:

A solid state crossing controller for a railroad crossing signal system with two independent outputs for controlling illumination of lamps in the signal system share a common neutral or return wire, with sensing of a common neutral or return line shared by the two independent outputs to determine any loss of the neutral line. When a failure has been detected in the neutral line, the controller modifies the voltages for the lamps in the signaling system for better illumination of the lamps during the failure condition, such as to the highest voltage available from a battery in the system. Upon detection of the failure in the neutral line, the controller may provide a call or message that there is a failure in the system that is in need of repair. If the failure in the neutral line is intermittent, the controller will resume normal operation after that train, has cleared the crossing. However, a call or message that a failure has occurred in the neutral line is provided. Tests for the failure will be repeated when the next train approaches the crossing. Related methods for determining whether a failure has occurred in the neutral line are also disclosed.

US Patent:

20080275479, Nov 6, 2008

Filed:

May 1, 2008

Appl. No.:

12/113547

Inventors:

Albert K. Chin - Palo Alto CA, US
Arthur M. Lin - Fremont CA, US
Alfredo R. Cantu - Pleasanton CA, US
Hung Pham - San Jose CA, US

International Classification:

A61B 17/11

US Classification:

606153, 606155

Abstract:

Described herein are methods and devices for loading an anastomotic seal into a delivery lumen. A loading device can fold the seal into a configuration for insertion into the delivery lumen. For example, the loading device can fold the seal into a prolate spheroidal shape. The delivery lumen can then be inserted into the loading device and mated with the folded seal.