Hung Manh Pham

Address:

4726 Campbell Ave, San Jose, CA 95130

Phone:

4089609934

VIN:

WMWZC5C56CWL61153

Make:

MINI

Model:

COOPER COUNTRYMAN

Year:

2012

Address:

2774 Henessy Dr, San Jose, CA 95148

Phone:

4084600391

VIN:

WBAVC53597FZ76946

Make:

BMW

Model:

3 SERIES

Year:

2007

US Patent:

6563586, May 13, 2003

Filed:

Jul 10, 2000

Appl. No.:

09/613176

Inventors:

Fred E. Stanke - Cupertino CA
Clinton B. Carlisle - Palo Alto CA
Hung Pham - San Jose CA
Edric Tong - Sunnyvale CA
Douglas E. Ruth - Sunnyvale CA
James M. Cahill - San Jose CA
Michael Weber - Sunnyvale CA
Elliot Burke - Santa Barbara CA

Assignee:

Therma-Wave, Inc. - Fremont CA

International Classification:

G01N 2188

US Classification:

356445, 3562372

Abstract:

This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

US Patent:

6919958, Jul 19, 2005

Filed:

Mar 26, 2003

Appl. No.:

10/397917

Inventors:

Fred E. Stanke - Cupertino CA, US
Clinton B. Carlisle - Palo Alto CA, US
Hung Van Pham - San Jose CA, US
Edric Tong - Sunnyvale CA, US
Douglas E. Ruth - Sunnyvale CA, US
Elliot Burke - Goleta CA, US
Adam E. Norton - Palo Alto CA, US

Assignee:

Therma-Wave, Inc. - Fremont CA

International Classification:

G01N021/88

US Classification:

3562372

Abstract:

This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

US Patent:

6965895, Nov 15, 2005

Filed:

Jul 12, 2002

Appl. No.:

10/194920

Inventors:

Shawn B. Smith - Palo Alto CA, US
Brian P. Grigsby - Austin TX, US
Hung J. Pham - Leander TX, US
Tony L. Davis - Austin TX, US
Manjunath S. Yedatore - Austin TX, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

G06F017/30

US Classification:

707 10, 707 5, 707 6, 707101, 7071041, 706 25

Abstract:

A method for data mining information obtained in an integrated circuit fabrication factory (“fab”) that includes steps of: (a) gathering data from the fab from one or more of systems, tools, and databases that produce data in the fab or collect data from the fab; (b) formatting the data and storing the formatted data in a source database; (c) extracting portions of the data for use in data mining in accordance with a user specified configuration file; (d) data mining the extracted portions of data in response to a user specified analysis configuration file; (e) storing results of data mining in a results database; and (f) providing access to the results.

US Patent:

6974618, Dec 13, 2005

Filed:

Jan 16, 2004

Appl. No.:

10/758269

Inventors:

Eugenia Kumacheva - Toronto, CA
Hung H. Pham - Fremont CA, US
Ilya Gourevich - Toronto, CA

International Classification:

B32B003/02

US Classification:

428 641, 428 644, 428407, 43027014

Abstract:

An optical data storage device comprised of periodic nanostructured polymer-based material produced from core-shell particles containing one dye in the core and a second dye in the shell. The combinations of dyes can be UV-Vis-dyes or Vis-NIR or UV-NIR. It is shown that selective single-photon photobleaching of the two dyes leads to increase in density of data storage and allows one to employ single-photon photobleaching to achieve the same storage density as in two-photon-writing.

US Patent:

7042580, May 9, 2006

Filed:

Mar 22, 2000

Appl. No.:

09/533613

Inventors:

Fred E. Stanke - Cupertino CA, US
Clinton B. Carlisle - Palo Alto CA, US
Hung Pham - San Jose CA, US
Edric Tong - Sunnyvale CA, US
Douglas E. Ruth - Sunnyvale CA, US
James M. Cahill - San Jose CA, US
Michael Weber - Sunnyvale CA, US
Elliot Burke - Santa Barbara CA, US

Assignee:

Tokyo Electron Limited - Tokyo

International Classification:

G01B 11/24

US Classification:

356601, 3562372, 356455, 356630

Abstract:

This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

US Patent:

7177019, Feb 13, 2007

Filed:

Feb 1, 2005

Appl. No.:

11/048552

Inventors:

Fred E. Stanke - Cupertino CA, US
Douglas E. Ruth - Sunnyvale CA, US
James M. Cahill - San Jose CA, US
Michael Weber - Sunnyvale CA, US
Clinton B. Carlisle - Palo Alto CA, US
Hung Pham - San Jose CA, US
Edric Tong - Sunnyvale CA, US
Elliot Burke - Santa Barbara CA, US

Assignee:

Tokyo Electron Limited - Tokyo

International Classification:

G01B 11/24

US Classification:

3562372, 356601, 356630

Abstract:

This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

US Patent:

7916350, Mar 29, 2011

Filed:

Apr 15, 2008

Appl. No.:

12/102929

Inventors:

Hung M. Pham - Torrance CA, US

Assignee:

Xerox Corporation - Norwalk CT

International Classification:

H04N 1/405

US Classification:

358 305, 358 303

Abstract:

What is disclosed is a novel system and method for minimizing visual artifacts, such as ROS skew and laserbeam bow, in a brick-layer halftone structure. The present method involves determining a line pattern from ROS skew and laserbeam bow profiles which traverses through successive halftone cells displacing pixels along scanlines in the process direction. The amount of displacement is varied as a function of the cross-process location as determined by the line pattern. Pixels along scanlines are shifted in a direction defined by the error profiles. In each halftone cell within which the line pattern traverses, extra pixels (empty pixel spaces created in the halftone cell by the shifting operation) are filled with lost pixels (pixels bumped from the halftone cell during the shifting operation) such that overall density of the halftone cell is maintained. The lost pixels are buffered such that lost pixels are preserved.

US Patent:

7940278, May 10, 2011

Filed:

Dec 8, 2005

Appl. No.:

11/296416

Inventors:

Hung Manh Pham - Torrance CA, US
Chi Minh Pham - Lawndale CA, US

Assignee:

Xerox Corporation - Norwalk CT

International Classification:

G09G 5/36
G06F 12/02
G06F 12/06
G06K 9/00
G06K 9/56

US Classification:

345556, 382165, 382205, 345565, 345572

Abstract:

In a method of programming for image enhancement, a content addressable memory is accessed. At least one template is transferred into the content addressable memory. A random access memory is accessed. Enhancement data is transferred into the random access memory. Video data input is inputted into the content addressable memory. Enhancement data is outputted from the random access memory based on the video data matching at least one template.