Ivin Varghese

age ~44

from San Ramon, CA

Ivin Varghese Phones & Addresses

  • San Ramon, CA
  • Bellerose, NY
  • Livermore, CA
  • 7 Pine St, Potsdam, NY 13676 • 3152680123
  • 1550 Springtown Blvd APT 17K, Livermore, CA 94551

Education

  • Degree:
    Graduate or professional degree

Resumes

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Ivin Varghese

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Ivin Varghese

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Us Patents

  • Co2 Nozzles

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  • US Patent:
    20110059681, Mar 10, 2011
  • Filed:
    Sep 10, 2009
  • Appl. No.:
    12/556643
  • Inventors:
    Charles W. BOWERS - Livermore CA, US
    Ivin VARGHESE - Livermore CA, US
    Mehdi BALOOCH - Berkeley CA, US
  • International Classification:
    B24C 11/00
    B24C 5/00
    B24C 5/04
  • US Classification:
    451 39, 451102, 451 75, 451 91
  • Abstract:
    A nozzle and method of providing COfor cleaning includes providing a COflow; phase transferring the COflow into gaseous COand COpellets; interrupting the COflow with a screen member; retaining the COpellets of a select larger size upstream of the screen member; permitting the COpellets of a select smaller size to pass through the screen member for cleaning.
  • Integrated Substrate Cleaning System And Method

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  • US Patent:
    20120279519, Nov 8, 2012
  • Filed:
    Oct 28, 2011
  • Appl. No.:
    13/284078
  • Inventors:
    Gordon Scott Swanson - Livermore CA, US
    Ivin Varghese - Livermore CA, US
    Mehdi Balooch - Berkeley CA, US
  • Assignee:
    RAVE N.P., INC. - Delray Beach FL
  • International Classification:
    B08B 7/00
    B08B 13/00
  • US Classification:
    134 11, 15634543
  • Abstract:
    A method for cleaning a substrate having organic and inorganic residues disposed thereon is provided. The method includes removing organic residue from the substrate using atmospheric oxygen plasma, and removing inorganic residue from the substrate using cryogenic CO. The substrate may be pretreated using a benign cooling agent, and post-treated using a dilute wet chemical cleaning method.
  • Co2 Nozzles

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  • US Patent:
    20130244550, Sep 19, 2013
  • Filed:
    May 3, 2013
  • Appl. No.:
    13/886594
  • Inventors:
    Ivin Varghese - Livermore CA, US
    Mehdi Balooch - Berkeley CA, US
  • Assignee:
    RAVE N.P., INC. - Delray Beach FL
  • International Classification:
    H01L 21/67
  • US Classification:
    451102
  • Abstract:
    A nozzle for providing carbon dioxide for cleaning is disclosed. The nozzle includes a reservoir for receiving liquid carbon dioxide, a barrel defining a passageway therethrough, the passageway extending to an outlet of the barrel, an orifice effecting fluid communication between the reservoir and the passageway, and a screen member constructed and arranged for interrupting flow of the carbon dioxide pellets greater than a select size from being emitted from the passageway of the barrel. Liquid carbon dioxide flows through the orifice to phase transfer into gaseous carbon dioxide and carbon dioxide pellets in the passageway. An internal diameter of the passageway is smaller than an internal diameter of the reservoir.
  • Contamination Removal Apparatus And Method

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  • US Patent:
    20130306101, Nov 21, 2013
  • Filed:
    May 20, 2013
  • Appl. No.:
    13/897552
  • Inventors:
    Ivin Varghese - Livermore CA, US
    Mehdi Balooch - Berkeley CA, US
  • International Classification:
    B08B 7/00
    B08B 7/04
  • US Classification:
    134 11, 15634543
  • Abstract:
    A substrate dry cleaning apparatus, a substrate dry cleaning system, and a method of cleaning a substrate are disclosed. The substrate dry cleaning system includes a substrate support and a reactive species generator. The reactive species generator includes a first conduit defining a first flow channel that extends to an outlet of the first conduit, the Gullet of the first conduit facing the substrate support, a first electrode, a second electrode facing the first electrode, the first flow channel disposed between the first electrode and the second electrode, a first inert wall disposed between the first electrode and the first flow channel, and a second inert wall disposed between the second electrode and the first flow channel.

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Ivin Varghese Photo 3

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Ivin Varghese


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