Shu Yang - Blue Bell PA, US Ying Zhang - Corning NY, US Randall Kamien - Philadelphia PA, US James Makoto Kikkawa - Swarthmore PA, US Elisabetta Matsumoto - Kensington CA, US Dinesh Chandra - Amherst MA, US
Assignee:
The Trustees Of The University Of Pennsylvania - Philadelphia PA
International Classification:
B05D 3/00
US Classification:
427271, 427256, 427261, 427264, 427275
Abstract:
Aspects of the present invention describe soft imprint lithography methods capable of preparing structural features on surfaces. Disclosed methods include surmounting a deformable substrate, having an original form, with a composition, wherein the deformable substrate is capable of achieving at least one predetermined deformed state; predictably deforming said deformable substrate from its original form to the at least one predetermined deformed state; and transferring at least a portion of the composition surmounting the deformed substrate to a receiving substrate.
David D. Awschalom - Santa Barbara CA Pierre M. Petroff - Santa Barbara CA Jing Shi - Goleta CA James M. Kikkawa - Santa Barbara CA
Assignee:
The Regents of the Unversity of California - Oakland CA
International Classification:
H01L 2982
US Classification:
257421
Abstract:
Submicron ferromagnets, of selected size and spacing, are introduced into semiconductor by means of ion implantation and subsequent heat treatments. The resulting semiconductor contains ferromagnets at high density and which exhibit Curie temperatures exceeding room temperature. The semiconductor retains its intrinsic physical properties, such as optical and transport properties, after incorporation of the ferromagnetic nanostructures.