James Peter Levin

age ~75

from South Burlington, VT

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Also known as:

James P Levin
Peter Levin

Connected to:

James Levin Phones & Addresses

South Burlington, VT
54 Starbird Rd, Jericho, VT 05465 • 8028994544
70 Starbird Rd, Jericho, VT 05465
Winooski, VT
S Burlington, VT

Amazon

Meteorology w/ESP CD-ROM

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Meteorology 2e, is an introduction to atmospheric science for science and non-science majors. The text covers all topics expected of an introductory text, organized and presented in a way that offers the instructor considerable flexibility of sequence.The authors feel this text is distinctive in thr...

Author
Eric W Danielson, James Levin, Elliot Abrams

Binding
Hardcover

Pages
558

Publisher
McGraw-Hill Science/Engineering/Math

ISBN #
0072420723

EAN Code
9780072420722

ISBN #
7

Principles of Classroom Management: A Professional Decision-Making Model (6th Edition)

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In its sixth edition, Principles of Classroom Management approaches creating positive learning environments by providing teachers with a theoretically based yet highly practical system for preventing disruptive behavior and influencing appropriate behavior. Written for classroom management and g...

Author
James Levin, James F. Nolan

Binding
Paperback

Pages
288

Publisher
Pearson

ISBN #
0205625029

EAN Code
9780205625024

ISBN #
6

Principles of Classroom Management: A Professional Decision-Making Model (5th Edition)

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Written for classroom management and general methods courses, the Fourth Edition of Principles of Classroom Management provides a theoretically-based and practical system for helping teachers prevent disruptive behavior, influence appropriate behavior and continue to provide a positive learning envi...

Author
James Levin, James F. Nolan

Binding
Paperback

Pages
288

Publisher
Allyn & Bacon

ISBN #
0205482953

EAN Code
9780205482955

ISBN #
2

Elementary Statistics in Social Research: Essentials (3rd Edition)

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This text provides a streamlined and accessible introduction to statistics for students in sociology, criminal justice, political science, social work, and other social sciences. This text offers an essential and accessible overview to the introduction to social statistics. Clearly written with det...

Author
Jack A. Levin, James Alan Fox

Binding
Paperback

Pages
400

Publisher
Pearson

ISBN #
0205638007

EAN Code
9780205638000

ISBN #
1

Elementary Statistics in Social Research (11th Edition)

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This best-selling introduction to statistical analysis in the social sciences provides the right balance of conceptual understanding and step-by-step computational techniques.

Author
Jack A. Levin, James Alan Fox, David R. Forde

Binding
Hardcover

Pages
576

Publisher
Pearson

ISBN #
0205570690

EAN Code
9780205570690

ISBN #
4

Lawyers & Attorneys

James Levin - Lawyer

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ISLN:

905492825

Admitted:

1971

University:

Cornell University, B.S.M.E., 1968

Law School:

Yale University, J.D., 1971

Us Patents

Euvl Mask Structure And Method Of Formation
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US Patent:

6777137, Aug 17, 2004
Filed:

Jul 10, 2002
Appl. No.:

10/064401
Inventors:

Emily E. Fisch - Burlington VT
Louis M. Kindt - Milton VT
James P. Levin - South Burlington VT
Michael R. Schmidt - Milton VT
Carey T. Williams - South Burlington VT
Assignee:

International Business Machines Corporation - Armonk NY
International Classification:

G03F 900
US Classification:

430 5
Abstract:

An extreme ultraviolet lithography (EUVL) mask structure and associated method of formation. A first conductive layer is provided between a buffer layer and an absorber layer such that the buffer layer is on a multilayer stack. The multilayer stack is adapted to substantially reflect EUV radiation incident thereon. The absorber layer is adapted to absorb essentially all of EUV radiation incident thereon. A mask pattern is formed in the absorber layer. Formation of the mask pattern in the absorber layer is accompanied by inadvertent formation of a defect in the absorber layer. The defect is subsequently repaired. The mask pattern may be extended into the first conductive layer and into the buffer layer in a substantially defect-free process that exposes a portion of the multilayer stack. A second conductive layer may be provided on the absorber layer, wherein the mask pattern is also formed in the second conductive layer.

Method To Etch Chrome For Photomask Fabrication
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US Patent:

7754394, Jul 13, 2010
Filed:

Nov 14, 2006
Appl. No.:

11/559417
Inventors:

Shaun B Crawford - Jericho VT, US
Thomas B Faure - Milton VT, US
Cuc K Huynh - Jericho VT, US
James P Levin - South Burlington VT, US
Assignee:

International Business Machines Corporation - Armonk NY
International Classification:

G03F 1/00
H01L 21/00
US Classification:

430 5, 430311
Abstract:

Methods for manufacturing a photomask, such as a chrome on glass photomask and a phase shift photomask are provided. A selective main chrome etch and a selective chrome overetch in the fabrication process provides a photomask having improved image quality and provides nominal image size control and image size uniformity across the photomask within current process flows and manufacturing steps. The selective etch process utilizes a main etch where the resist etch selectivity (amount of chrome removed to resist removed) is higher than in the overetch step in which the etch is more selective to removal of the resist layer relative to the chrome layer. To control the etch selectivities the composition of the etchant chemistry and/or the etchant reactor hardware settings (power, voltage, etc. ) can be adjusted.

Mask Set Mismatch
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US Patent:

43883869, Jun 14, 1983
Filed:

Jun 7, 1982
Appl. No.:

6/385591
Inventors:

Bruce D. King - Burlington VT
James P. Levin - Shelburne VT
Assignee:

International Business Machines Corporation - Armonk NY
International Classification:

G03C 506
US Classification:

430 5
Abstract:

A method for marking a mask set to insure minimum mismatch between the masks when they are assembled into a set. Each mask in the set is evaluated against a known fixed standard, identified and marked such that when the set is assembled and utilized to produce an integrated circuit minimum mismatch between each element in each mask in the set will be realized.

Grid Structure For Reducing Current Density In Focussed Ion Beam
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US Patent:

51591707, Oct 27, 1992
Filed:

Apr 26, 1991
Appl. No.:

7/692105
Inventors:

James P. Levin - Jericho VT
Alfred Wagner - Brewster NY
Assignee:

International Business Machines Corporation - Armonk NY
International Classification:

B23K 1500
US Classification:

21912125
Abstract:

A transmission grid is disposed in a conventional focussed ion beam system which includes an ion beam source emitter or ion gun, electrodes to turn the ion beam off and on, a beam defining aperture and electrostatic lenses to focus the ion beam onto a target. The elements of the ion beam system are disposed in a chamber which is provided with an inlet port and an outlet port. Gas is introduced into chamber via the inlet port where it is ionized by the ion beam into an ion plasma to be used to deposit materials onto the target. The transmission grid, is interposed which is a fine mesh, passive element is located in the path of the ion beam and reduces the ion beam current density by a desired value. The transmission grid may be configured with a variety of different transmissions so the current density can be adjusted in different increments depending on the gas/type of deposition to be performed.

Gas Delivery For Ion Beam Deposition And Etching
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US Patent:

51499746, Sep 22, 1992
Filed:

Oct 29, 1990
Appl. No.:

7/605601
Inventors:

Steven J. Kirch - Lagrangeville NY
James P. Levin - Jericho VT
Alfred Wagner - Brewster NY
Assignee:

International Business Machines Corporation - Armonk NY
International Classification:

H01J 37317
US Classification:

2504922
Abstract:

An ion beam structure includes a gas container, such as a cylindrical can having first and second apertures through the center of the top and bottom walls respectively of the container such that a narrow ion beam is passed through the apertures and the center axis of the can and onto a target specimen such as a mask or chip or other article of manufacture disposed closely below the bottom of the can. The can may further include deflection means for applying voltages and/or magnetic fields to locations on the can (i. e. , top, bottom, sides) to direct secondary charged particles such as electrons emitted from the specimen onto an electron detection means such that the structure functions as an imaging system. The electric and/or magnetic fields may be employed to increase the collection efficiency of the detector and thereby improve the quality of the image by increasing the signal to noise ratio. When the collected image produced by the secondary charged particles indicates that a repair or other modification be performed, a gas is introduced into the can from a gas reservoir via a tube.

Single Component Developer For Copolymer Resists
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US Patent:

62709496, Aug 7, 2001
Filed:

Apr 11, 2000
Appl. No.:

9/529316
Inventors:

Thomas B. Faure - Milton VT
Steven D. Flanders - Colchester VT
James P. Levin - South Burlington VT
Harold G. Linde - Richmond VT
Jeffrey F. Shepard - Starksboro VT
Assignee:

International Business Machines Corporation - Armonk NY
International Classification:

G03F 730
US Classification:

430329
Abstract:

A method for developing copolymer photosensitive resists wherein a single solvent is used in conjunction with a puddle develop tool. The copolymer resist is ZEP 7000 and the developer is ethyl 3-ethoxy propionate (EEP).

Test Pattern Layout For Test Photomask And Method For Evaluating Critical Dimension Changes
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US Patent:

20160223902, Aug 4, 2016
Filed:

Apr 8, 2016
Appl. No.:

15/094226
Inventors:

- Armonk NY, US
- Tokyo, JP
Raymond W. Jeffer - South Burlington VT, US
James P. Levin - South Burlington VT, US
Steven C. Nash - Essex Junction VT, US
International Classification:

G03F 1/50
Abstract:

Aspects of the present invention relate to a test photomask and a method for evaluating critical dimension changes in the test photomask. Various embodiments include a test photomask. The test photomask includes a plurality of cells having a varied density pattern. The plurality of cells include a first group of cells arranged along a first line, the first group of cells having a first combined density ratio. The plurality of cells also include a second group of cells arranged along a second line, the second group of cells having a second combined density ratio. In the plurality of cells, the second combined density ratio for the second group of cells is equal to the first combined density ratio of the first group of cells. The varied density pattern is configured to substantially neutralize fogging effects.

Test Pattern Layout For Test Photomask And Method For Evaluating Critical Dimension Changes
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US Patent:

20160224720, Aug 4, 2016
Filed:

Apr 8, 2016
Appl. No.:

15/094220
Inventors:

- Armonk NY, US
- Tokyo, JP
Raymond W. Jeffer - South Burlington VT, US
James P. Levin - South Burlington VT, US
Steven C. Nash - Essex Junction VT, US
International Classification:

G06F 17/50
G03F 1/70
Abstract:

Aspects of the present invention relate to a test photomask and a method for evaluating critical dimension changes in the test photomask. Various embodiments include a test photomask. The test photomask includes a plurality of cells having a varied density pattern. The plurality of cells include a first group of cells arranged along a first line, the first group of cells having a first combined density ratio. The plurality of cells also include a second group of cells arranged along a second line, the second group of cells having a second combined density ratio. In the plurality of cells, the second combined density ratio for the second group of cells is equal to the first combined density ratio of the first group of cells. The varied density pattern is configured to substantially neutralize fogging effects.

Resumes

James Levin

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James Levin

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James Levin

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Isbn (Books And Publications)

Meteorology

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Author
James Levin

ISBN #
0072420723

Principles of Classroom Management: A Professional Decision-making Model

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Author
James Levin

ISBN #
0205166156

Principles of Classroom Management: A Professional Decision-making Model

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Author
James Levin

ISBN #
0205288626

What Every Teacher Should Know About Classroom Management

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Author
James Levin

ISBN #
0205380646

Principles of Classroom Management: A Professional Decision-making Model

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Author
James Levin

ISBN #
0205381235

Principles of Classroom Management: A Professional Decision-making Model

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Author
James Levin

ISBN #
0205482953

Meteorology

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Author
James Levin

ISBN #
0073659630

Baby, You Can Be...

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Author
James Levin

ISBN #
0307130622

Name / Title

Company / Classification

Phones & Addresses

James Levin

EVENTS ARE US LTD

James Levin

CLEVELAND BRIDGE PROJECT, INC

James A Levin

CLEVELAND FESTIVAL OF ART AND TECHNOLOGY, INC

James A. Levin

CASH BUYER 1, LLC

James Levin

WOOSTER JAM INC

James Levin

HINMAN HOLDINGS, LLC

James Levin

PEOPLE NOT MASCOTS INC

James Levin

AGENCY FOR INTERNATIONAL PERFORMING ARTISTS, INC

Medicine Doctors

James M. Levin

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Specialties:

Infectious Disease

Work:

Dean Clinic
1313 Fish Hatchery Rd, Madison, WI 53715
6082528000 (phone), 6082537193 (fax)

Dean ClinicSSM Health Dean Medical Group Janesville
3200 E Racine St, Janesville, WI 53546
6083718000 (phone), 6083718008 (fax)

Dean ClinicDean Specialty Clinic
1626 Tuttle St STE 3, Baraboo, WI 53913
6083552033 (phone), 6083556810 (fax)

Education:

Medical School
Medical College of Wisconsin School of Medicine
Graduated: 1988

Conditions:

Candidiasis
HIV Infection
Infectious Diseases of the Brain or Spinal Cord
Osteomyelitis
Septicemia

Languages:

English
Spanish

Description:

Dr. Levin graduated from the Medical College of Wisconsin School of Medicine in 1988. He works in Baraboo, WI and 2 other locations and specializes in Infectious Disease. Dr. Levin is affiliated with St Clare Hospital & Health Services and St Marys Hospital.

Youtube

Sculptor Strategy Is 'Invest in Anything, Any...

Oct.24 -- Jimmy Levin, chief investment officer at Sculptor Capital, d...

Duration:

6m 5s

Sculptor Capitals multi strategy investing pl...

Jimmy Levin, Chief Investment Officer and Chief Executive Officer and ...

Duration:

2m 52s

Jimmy Levin sees opportunities in corporate c...

Jimmy Levin, Sculptor Capital Management's CIO, discusses energy and m...

Duration:

2m 8s

Sculptor Capitals Jimmy Levin on the firms ap...

Jimmy Levin, Sculptor's CIO and CEO, discusses the firm's flexible app...

Duration:

1m 34s

Oz Management's Levin on Investment Challenges

Oct.19 -- Jimmy Levin, co-chief investment officer at Oz Management, d...

Duration:

11m 4s

Och-Ziff's $280 Million Bet on Co-CIO Jimmy L...

Jul.24 -- Bloomberg's Sri Natarajan reports on Co-Chief Investment Off...

Duration:

2m 52s

Myspace

James Levin

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Locality:

TEMPLE, Pennsylvania

Birthday:

1944

James Levin

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Locality:

OREGON CITY, Oregon

Birthday:

1927

James Levin

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Locality:

Clevleand

Birthday:

1913

James Levin

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Locality:

BENNINGTON

Birthday:

1955

James Levin

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Locality:

BRONX, New York

Birthday:

1950

Classmates

James Levin

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Schools:

Rhodes Preparatory New York NY 1957-1961

Community:

Cornelia Radkai, Marc Fisher, Richard Rathman

James Levin

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Schools:

Green Forest Elementary School Salem MO 1994-1998

Community:

Stevee Seay, Tonya Boxx, George Benedict, Kristina Steiner, Nicholas Cahill, Michael Jones, Megan Blair, Brenda Mcgowen, Lauren Brown, Deanna Nash, Nathan Pitchford

James Levin

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Schools:

St. Louis Park High School St. Louis Park MN 1970-1974

Community:

Howard Reynolds, Mike Harvego, Bonnie Rietz

James Levin, Red bluff, CA

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James Levin 1988 graduate of Salisbury High School in Red bluff, CA

James Levin, Baltimore, MD

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James Levin 1957 graduate of Forest Park High School 406 in Baltimore, MD

James Levin, Hewlett, NY

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James Levin, La mesa, CA

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Community Christian Schoo...

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Graduates:

James Levin (1981-1983),
Jo Plow (1995-1999)

News

Bernie Sanders endorses Hillary Clinton, but some grumbles remain: Ohio Politics Roundup

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Send in the clowns: Cleveland arts activist James Levin and others have formed a guerrilla theater group called "#notfunny" to protest the RNC, writes The Plain Dealer's Laura Demarco. The group plans to perform small skits while dressed up like clowns between 4 and 6 p.m. daily during the conventio
Date: Jul 13, 2016
Source: Google