James B Mattzela

US Patent:

20130244025, Sep 19, 2013

Filed:

Oct 5, 2011

Appl. No.:

13/876328

Inventors:

David A. Smith - Bellefonte PA, US
James B. Mattzela - State College PA, US
Paul H. Silvis - Port Matilda PA, US
Gary A. Barone - Bellefonte PA, US
Martin E. Higgins - Bellefonte PA, US

Assignee:

SILCOTEK CORP. - Bellefonte PA

International Classification:

C09D 5/00
C23C 16/30

US Classification:

428336, 42725528, 10628714, 428447, 428429

Abstract:

A wear coating is disclosed that includes a layer treated by a trifunctional organosilane. An article is also disclosed, the article having a surface to which the wear coating is applied. A method of applying the wear coating is also disclosed. In some embodiments, the organosilane is trimethylsilane and the wear coating is applied by chemical vapor deposition, followed by heat treating the wear coating in the presence of the trimethylsilane.

US Patent:

20120251797, Oct 4, 2012

Filed:

Oct 26, 2010

Appl. No.:

13/504533

Inventors:

David A. Smith - Bellefonte PA, US
James B. Mattzela - State College PA, US
Paul H. Silvis - Port Matilda PA, US
Gary A. Barone - State College PA, US

Assignee:

SILCOTEK CORP. - Bellefonte PA

International Classification:

C07F 7/08
B32B 3/10
C09D 7/12
C23C 16/42

US Classification:

4281951, 42725528, 556437, 106 1505

Abstract:

The present invention relates to a chemical vapor deposition coating, a chemical vapor deposition article, and a chemical vapor deposition method. The coating, article, and method involve thermal decomposition of dimethylsilane to achieve desired surface properties.

US Patent:

20220186040, Jun 16, 2022

Filed:

Mar 2, 2022

Appl. No.:

17/684860

Inventors:

- Bellefonte PA, US
Min YUAN - State College PA, US
James B. MATTZELA - Port Matilda PA, US
Paul H. SILVIS - Port Matilda PA, US

International Classification:

C09D 5/16
C23C 16/44
C23C 16/56
C23C 16/02
C23C 16/30

Abstract:

Industrial equipment articles and thermal chemical vapor coated articles are disclosed. The articles include a coating on a substrate of the industrial equipment article, the coating including silicon, carbon, and hydrogen. The industrial equipment article requires resistance to protein adsorption. The industrial equipment article was heated during application of the coating to a temperature of between 300 degrees C. and 600 degrees C. The thermal chemical vapor coated article includes a coating on the thermal chemical vapor coated article, the coating formed by thermal decomposition, oxidation, then functionalization. The thermal chemical vapor coated article is industrial equipment requiring resistance to protein adsorption. The coating is resistant to the protein adsorption and is on a substrate heated during the thermal decomposition.

US Patent:

20200190336, Jun 18, 2020

Filed:

Feb 26, 2020

Appl. No.:

16/801230

Inventors:

- Bellefonte PA, US
James B. Mattzela - Port Matilda PA, US
Paul H. Silvis - Port Matilda PA, US
Gary A. Barone - Bellefonte PA, US
Martin E. Higgins - Bellefonte PA, US

International Classification:

C09D 5/00
C23C 16/18
C23C 16/02
C23C 30/00
C23C 16/40
C23C 16/56
C23C 16/30

Abstract:

Amorphous coatings and coated articles having amorphous coatings are disclosed. The amorphous coating comprises a first layer and a second layer, the first layer being proximal to a metal substrate compared to the second layer, the second layer being distal from the metal substrate compared to the first layer. The first layer and the second layer comprise carbon, hydrogen, and silicon. The first layer further comprises oxygen.

US Patent:

20190309414, Oct 10, 2019

Filed:

Apr 9, 2019

Appl. No.:

16/379236

Inventors:

- Bellefonte PA, US
James B. MATTZELA - Port Matilda PA, US
Gary A. BARONE - State College PA, US
Jesse BISCHOF - State College PA, US
David A. SMITH - Bellefonte PA, US

International Classification:

C23C 16/44

Abstract:

Chemical vapor deposition processes and coated articles are disclosed. The process includes a first introducing of a first amount of silane to the enclosed chamber, the first amount of the silane remaining within the enclosed chamber for a first period of time, a first decomposing of the first amount of the silane during at least a portion of the first period of time, a second introducing of a second amount of the silane to the enclosed chamber, the second amount of the silane remaining within the enclosed chamber for a second period of time, and a second decomposing of the second amount of the silane during at least a portion of the second period of time. The process is devoid of inert gas purging between the first decomposing and the second introducing and/or produces a chemical vapor deposition coating devoid of hydrogen bubbles.

US Patent:

20190169750, Jun 6, 2019

Filed:

Feb 13, 2018

Appl. No.:

15/895566

Inventors:

- Bellefonte PA, US
David A. SMITH - Bellefonte PA, US
Paul H. SILVIS - Port Matilda PA, US
James B. MATTZELA - Port Matilda PA, US

International Classification:

C23C 16/52
C23C 16/56
C23C 16/22
C23C 16/30
C23C 16/46

Abstract:

Coated articles are disclosed. One embodiment of a coated article includes a substrate capable of being subjected to corrosion and a deposited coating on the substrate. The deposited coating has silicon with the substrate resisting corrosion with the deposited coating on the substrate when exposed to 15% NaClO by a rate of at least 5% greater than the corrosion rate of a coating applied with the same process but without introducing the deposition gas at the sub-decomposition temperature and/or the substrate with the deposited coating having a 15% NaClO corrosion rate of between 0 and 3 mils per year.

US Patent:

20190032201, Jan 31, 2019

Filed:

Aug 22, 2017

Appl. No.:

15/683399

Inventors:

- Bellefonte PA, US
James B. MATTZELA - Port Matilda PA, US
Paul H. SILVIS - Port Matilda PA, US
Gary A. BARONE - State College PA, US

International Classification:

C23C 16/32
C23C 16/56
C23C 8/10
B05D 1/00

Abstract:

The present invention relates to a coated article. The coated article includes a first layer, a second layer, and a diffusion region between the first layer and the second layer. The first layer has a first atomic concentration of C, a first atomic concentration of Si, and a first atomic concentration of O. The second layer has a first atomic concentration of Fe, a first atomic concentration of Cr, and a first atomic concentration of Ni. The diffusion region has a second atomic concentration of the C, a second atomic concentration of the Si, a second atomic concentration of the O, a second atomic concentration of the Fe, a second atomic concentration of the Cr, and a second atomic concentration of the Ni. All of the atomic concentrations are based upon Auger Electron Spectroscopy.

US Patent:

20190003044, Jan 3, 2019

Filed:

Sep 5, 2018

Appl. No.:

16/121994

Inventors:

- Bellefonte PA, US
James B. MATTZELA - Port Matilda PA, US
David A. SMITH - Bellefonte PA, US

International Classification:

C23C 16/34
C23C 16/455
C23C 16/04
C23C 16/30
C23C 16/56

Abstract:

Surfaces, articles, and processes having silicon-nitride-containing thermal chemical vapor deposition coating are disclosed. A process includes producing a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. Flow into and from the chamber is restricted or halted during the producing of the silicon-nitride-containing thermal chemical vapor deposition coating on the surface. A surface includes a silicon-nitride-containing thermal chemical vapor deposition coating. The surface has at least a concealed portion that is obstructed from view. An article includes a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. The surface has at least a concealed portion that is obstructed from view.