James O Unruh

US Patent:

6567588, May 20, 2003

Filed:

Aug 28, 2001

Appl. No.:

09/940947

Inventors:

James Owen Unruh - Allen TX

Assignee:

Photronics, Inc. - Jupiter FL

International Classification:

G02B 634

US Classification:

385 37, 385 31, 385147, 65 31

Abstract:

A chirped Bragg grating is fabricated in an optical fiber by exposing the fiber to a coherent beam of light through a parallel phase mask having a series of progressively chirped segments produced on a lithography tool. The chirped phase mask is fabricated by exposing a photoresist-coated substrate to an image writing element such as an electron beam or a laser according to a set of parameters provided to the lithography tool. The parameters include a basic grating pattern for each segment, a value that defines the expansion or contraction of the grating pattern and an axis location to which the grating pattern is to be written to the substrate. By selecting machine commands that implement these parameters with a minimum throughput overhead, the mask can be produced in a reduced time, and therefore with increased accuracy.

US Patent:

6868209, Mar 15, 2005

Filed:

Feb 19, 2003

Appl. No.:

10/369262

Inventors:

James Owen Unruh - Allen TX, US

Assignee:

Photronics, Inc. - Brookfield CT

International Classification:

G02B006/34

US Classification:

385 37, 385147, 65 31

Abstract:

A chirped Bragg grating is fabricated in an optical fiber by exposing the fiber to a coherent beam of light through a parallel phase mask having a series of progressively chirped segments produced on a lithography tool. The chirped phase mask is fabricated by exposing a photoresist-coated substrate to an image writing element such as an electron beam or a laser according to a set of parameters provided to the lithography tool. The parameters include a basic grating pattern for each segment, a value that defines the expansion or contraction of the grating pattern and an axis location to which the grating pattern is to be written to the substrate. By selecting machine commands that implement these parameters with a minimum throughput overhead, the mask can be produced in a reduced time, and therefore with increased accuracy.