Jason C Melvin

US Patent:

6984168, Jan 10, 2006

Filed:

Jul 31, 2000

Appl. No.:

09/628563

Inventors:

Jason Melvin - Cambridge MA, US
Nam P. Suh - Sudbury MA, US
Hilario L. Oh - Rochester Hills MI, US

Assignee:

Aviza Technology, Inc. - Scotts Valley CA
Massachusetts Institute of Technology - Cambridge MA

International Classification:

B24B 29/00
B24B 5/00

US Classification:

451285, 451287, 451288, 451390, 451398

Abstract:

A chemical mechanical polishing system having a wafer carrier assembly is provided. The wafer carrier assembly includes a wafer carrier support frame, a wafer carrier head housing rotable mounted on the wafer carrier support frame, with a base including a bladder bellows operating connecting the wafer carrier base to the wafer carrier head housing such that rotational torque is transferred from the wafer carrier head housing to the wafer carrier base. Further provided is a retaining ring, operatively connected to a retaining ring bearing which allows relative axial motion while constraining relative radial motion between the retaining ring and the wafer carrier head housing; and a retaining ring bellows, operatively connecting the retaining ring bearing to urge the retaining ring against a polishing member. A chamber formed by the bladder bellows, the wafer carrier base and the wafer carrier head housing may be pressurized to load the wafer carrier base against a polishing member, independent of any frictional loads on the retaining ring.

US Patent:

7029381, Apr 18, 2006

Filed:

Dec 21, 2001

Appl. No.:

10/029158

Inventors:

Jason Melvin - Cambridge MA, US
Nam P. Suh - Sudbury MA, US
Hilario L. Oh - Rochester Hills MI, US

Assignee:

Aviza Technology, Inc. - Scotts Valley CA

International Classification:

B24B 5/00

US Classification:

451285, 451287

Abstract:

A chemical mechanical polishing system having a wafer carrier assembly is provided. The wafer carrier assembly includes a wafer carrier support frame, a wafer carrier head housing rotable mounted on the wafer carrier support frame, with a base including a bladder bellows operating connecting the wafer carrier base to the wafer carrier head housing such that rotational torque is transferred from the wafer carrier head housing to the wafer carrier base. Further provided is a retaining ring, operatively connected to a retaining ring bearing which allows relative axial motion while constraining relative radial motion between the retaining ring and the wafer carrier head housing; and a retaining ring bellows, operatively connecting the retaining ring bearing to urge the retaining ring against a polishing member. A chamber formed by the bladder bellows, the wafer carrier base and the wafer carrier head housing may be pressurized to load the wafer carrier base against a polishing member, independent of any frictional loads on the retaining ring.