Thomas E. Grebs - South Jordan UT, US Jayson S. Preece - Riverton UT, US
International Classification:
H01L 29/78
US Classification:
257331, 257E29262, 257E29264
Abstract:
This document discusses, among other things, a semiconductor device including first and second conductive layers, the first conductive layer including a gate runner and a drain contact and the second conductive layer including a drain conductor, at least a portion of the drain conductor overlying at least a portion of the gate runner. A first surface of the semiconductor device can include a gate pad coupled to the gate runner and a drain pad coupled to the drain contact and the drain conductor.
Methods And Apparatus Related To Termination Regions Of A Semiconductor Device
- San Jose CA, US Dean E. PROBST - West Jordan UT, US Richard STOKES - Shavertown PA, US Suku KIM - South Jordan UT, US Jason HIGGS - Mountain Top PA, US Fred SESSION - Sandy UT, US Hui CHEN - South Jordan UT, US Steven P. SAPP - Felton CA, US Jayson PREECE - Riverton UT, US Mark L. Rinehimer - Mountain Top PA, US
Assignee:
Fairchild Semiconductor Corporation - San Jose CA
International Classification:
H01L 29/78 H01L 21/02 H01L 29/06
US Classification:
257330, 257618, 438478
Abstract:
In one general aspect, an apparatus can include a semiconductor region, and a trench defined within the semiconductor region. The trench can have a depth aligned along a vertical axis and have a length aligned along a longitudinal axis orthogonal to the vertical axis. The trench can have a first portion of the length included in a termination region of the semiconductor region and can have a second portion of the length included in an active region of the semiconductor region.
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