Jeffrey Scott Campbell

US Patent:

D587885, Mar 10, 2009

Filed:

Jul 16, 2008

Appl. No.:

29/308927

Inventors:

Jeffrey Campbell - Los Angeles CA, US

International Classification:

0299

US Classification:

D 2946, D2964, D2965

US Patent:

D588345, Mar 17, 2009

Filed:

Jul 16, 2008

Appl. No.:

29/308931

Inventors:

Jeffrey Campbell - Los Angeles CA, US

International Classification:

0299

US Classification:

D 2946, D2964, D2965

US Patent:

D634532, Mar 22, 2011

Filed:

Dec 9, 2010

Appl. No.:

29/380682

Inventors:

Jeffrey Campbell - Los Angeles CA, US

Assignee:

Jeffrey Campbell LLC - Los Angeles CA

International Classification:

0299

US Classification:

D 2971, D2970

US Patent:

7976634, Jul 12, 2011

Filed:

Nov 8, 2007

Appl. No.:

11/937388

Inventors:

David Keith Carlson - San Jose CA, US
Satheesh Kuppurao - San Jose CA, US
Howard Beckford - San Jose CA, US
Herman Diniz - Fremont CA, US
Kailash Kiran Patalay - Santa Clara CA, US
Brian Hayes Burrows - San Jose CA, US
Jeffrey Ronald Campbell - San Francisco CA, US
Xiaowei Li - Austin TX, US
Errol Antonio Sanchez - Tracy CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C23C 16/452
C23C 16/46
C23C 16/02
C23F 1/00
H01L 21/306
C23C 16/06

US Classification:

118724, 1563451

Abstract:

A method and apparatus for delivering precursor materials to a processing chamber is described. The apparatus includes a gas distribution assembly having multiple gas delivery zones. Each zone may include a plenum having an inlet for receiving a precursor gas and at least one source of non-thermal energy, such as an infrared light source. The at least one source of non-thermal energy is may be varied to control the intensity of wavelengths from the infrared light source.

US Patent:

20080017116, Jan 24, 2008

Filed:

Jul 18, 2006

Appl. No.:

11/458163

Inventors:

Jeffrey Campbell - Mountain View CA, US
Brian H. Burrows - San Jose CA, US

International Classification:

H01L 21/306
C23F 1/00
C23C 16/00

US Classification:

118729, 15634551, 15634554, 118728

Abstract:

A method and apparatus for positioning a substrate support within a processing chamber is provided. In one embodiment, an apparatus for positioning a substrate support includes a first portion configured to mount to a bottom of a processing chamber and second portion configured to support a substrate support. The first portion is releaseably coupled to the second portion. The second portion includes a lower housing coupled to a lower collar. The lower collar is laterally positionable relative to the first portion. The lower housing has a planar orientation that is adjustable relative to a planar orientation of the lower collar.

US Patent:

20080017117, Jan 24, 2008

Filed:

Jul 18, 2006

Appl. No.:

11/458167

Inventors:

JEFFREY CAMPBELL - Mountain View CA, US
BRIAN H. BURROWS - San Jose CA, US

International Classification:

H01L 21/306
C23F 1/00
C23C 16/00

US Classification:

118729, 118728, 15634551, 15634554

Abstract:

Methods for positioning a substrate support within a processing chamber are provided. In one embodiment, a method for adjusting the orientation of a substrate support within a processing chamber using a mounting assembly is provided. The mounting assembly includes an upper portion coupled to the processing chamber and a lower portion coupled to the upper portion. The method includes adjusting a lateral position of a collar of the second portion relative to the first portion, and adjusting a planar orientation of the lower housing of the second portion relative to the first portion.

US Patent:

20080072820, Mar 27, 2008

Filed:

Jun 25, 2007

Appl. No.:

11/767619

Inventors:

Brian Burrows - San Jose CA, US
Craig Metzner - Fremont CA, US
Dennis Demars - Santa Clara CA, US
Roger Anderson - Sunnyvale CA, US
Juan Chacin - Palo Alto CA, US
David Carlson - San Jose CA, US
David Ishikawa - Mountain View CA, US
Jeffrey Campbell - Mountain View CA, US
Richard Collins - Santa Clara CA, US
Keith Magill - San Jose CA, US
Imran Afzal - Sunnyvale CA, US

International Classification:

B05C 11/00

US Classification:

118642000

Abstract:

The present invention provides methods and apparatus for processing semiconductor substrates. Particularly, the present invention provides a modular processing cell to be used in a cluster tool. The modular semiconductor processing cell of the present invention comprises a chamber having an inject cap, a gas panel module configured to supply one or more processing gas to the chamber through the inject cap, wherein the gas panel module is position adjacent the inject cap. The processing cell further comprises a lamp module positioned below the chamber. The lamp module comprises a plurality of vertically oriented lamps.

US Patent:

20110259432, Oct 27, 2011

Filed:

Jul 1, 2011

Appl. No.:

13/175499

Inventors:

DAVID KEITH CARLSON - San Jose CA, US
SATHEESH KUPPURAO - San Jose CA, US
HOWARD BECKFORD - San Jose CA, US
HERMAN DINIZ - Fremont CA, US
KAILASH KIRAN PATALAY - Santa Clara CA, US
BRIAN HAYES BURROWS - San Jose CA, US
JEFFREY RONALD CAMPBELL - San Francisco CA, US
XIAOWEI LI - , US
ERROL ANTONIO SANCHEZ - Tracy CA, US

International Classification:

C23C 16/48
H05B 6/00
F15D 1/00

US Classification:

137 1, 118723 R

Abstract:

A method and apparatus for delivering precursor materials to a processing chamber is provided. In one embodiment, a deposition apparatus is provided. The apparatus includes a chamber having a longitudinal axis, and a gas distribution assembly coupled to a sidewall of the chamber. The gas distribution assembly comprises a plurality of plenums coupled to one or more gas sources, an energy source positioned to provide energy to each of the plurality of plenums, and a variable power source coupled to the energy source, wherein the gas distribution assembly provides a flow path through the chamber that is normal to the longitudinal axis of the chamber.