Jeffrey A Doyle

US Patent:

20070049164, Mar 1, 2007

Filed:

Aug 26, 2005

Appl. No.:

11/162068

Inventors:

Clifford Thomson - Mayer AZ, US
Scott Daskiewich - Oriskany NY, US
Jeffrey Doyle - Poland NY, US

International Classification:

B24B 51/00
B24B 1/00

US Classification:

451005000, 451056000

Abstract:

A polishing pad comprising particles having an average diameter between 1 nanometer and 100 nanometers, wherein the total weight of the particles is greater than about 3% of the total weight of the pad. Also, a method of manufacturing a polishing pad comprises the steps of: mixing a pre-polymer and abrasive particles together; wherein the abrasive particles have an average diameter of between 1 nanometer and 100 nanometers in diameter, and wherein the abrasive particles comprise more than about 3% by weight of the polishing pad; mixing a curative with the mixed pre-polymer and particles; and pouring the mixture of pre-polymer, particles and curative into a mold. In one exemplary embodiment the particles are silica and the pre-polymer is a polyurethane pre-polymer.