Jeffrey Todd Hastings

US Patent:

7348104, Mar 25, 2008

Filed:

Oct 2, 2003

Appl. No.:

10/677173

Inventors:

Dario Gil - Cambridge MA, US
Jeffrey T. Hastings - Cambridge MA, US
James G. Goodberlet - Melrose MA, US
Rajesh Menon - Boston MA, US
David J. Carter - Cambridge MA, US
Henry I. Smith - Sudbury MA, US

Assignee:

Massachusetts Institute of Technology - Cambridge MA

International Classification:

G02B 27/44
G02B 27/42
G02B 5/18

US Classification:

430 4, 430 11, 430394, 359558, 359565, 359573

Abstract:

A method is disclosed for forming an array of focusing elements for use in a lithography system. The method involves varying an exposure characteristic over an area to create a focusing element that varies in thickness in certain embodiments. In further embodiments, the method includes the steps of providing a first pattern via lithography in a substrate, depositing a conductive absorber material on the substrate, applying an electrical potential to at least a first portion of the conductive absorber material, leaving a second portion of the conductive material without the electrical potential, and etching the second portion of the conductive material to provide a first pattern on the substrate that is aligned with the first portion of the conductive absorber material.

US Patent:

7417234, Aug 26, 2008

Filed:

May 17, 2005

Appl. No.:

11/130892

Inventors:

Jeffrey T. Hastings - Lexington KY, US
James G. Goodberlet - Melrose MA, US
Feng Zhang - Cambridge MA, US
Henry I. Smith - Sudbury MA, US

Assignee:

Massachusetts Institute of Technology - Cambridge MA

International Classification:

H01J 37/304

US Classification:

250397, 250396 R, 2504911, 2504922, 25049223, 25049221

Abstract:

A method or system of spatial-phase locking a beam used in maskless lithography provides a fiducial grid with a single spatial-period, the fiducial grid being rotated at an angle with respect to a direction of scanning the beam; detects a signal generated in response to the beam being incident upon the fiducial grid; determines frequency components of the detected signal; and determines a two-dimensional location of the beam from phases of two determined fundamental frequency component. The method or system further determines a size of the beam from relative amplitudes of the determined fundamental and harmonic frequency components and/or determine a shape of the beam from relative amplitudes of the determined fundamental and harmonic frequency components. The method or system corrects a deflection of the beam in response to the determined two-dimensional location, and/or adjusts the size of the beam in response to the determined size, and/or adjusts the shape of the beam in response to the determined shape. If the method or system spatial-phase locks a plurality of beams used in maskless lithography, a fiducial grid with a varying spatial-period is utilized.

US Patent:

7861625, Jan 4, 2011

Filed:

Oct 24, 2008

Appl. No.:

12/257429

Inventors:

Christopher L. Greenwald - Waban MA, US
Jeffrey P. Hastings - Hanover NH, US

Assignee:

Pro-Cut Licensing Company, LLC - West Lebanon NH

International Classification:

B23B 25/06
B23B 5/04

US Classification:

82112, 82118

Abstract:

A dynamic alignment monitoring system allows an operator to monitor the misalignment of an on-vehicle disk brake lathe with respect to a vehicle axis about which the disk to be machined rotates, and can allow the operator to discontinue further alignment when appropriate in order to speed the overall time of the alignment process. The system processes signals from an angular rate sensor and a tachometer, using a scaling routine to derive a LRO value corresponding to the LRO of the disk which would result from machining in the current alignment condition. A representation of the derived LRO value is displayed to the operator. An operator override can allow the operator to discontinue further alignment adjustments when an acceptable alignment condition is indicated. The system can aid the operator by also presenting a representation of an acceptable LRO value for the particular vehicle being serviced.

US Patent:

8245609, Aug 21, 2012

Filed:

Feb 3, 2010

Appl. No.:

12/699091

Inventors:

Christopher L. Greenwald - Waban MA, US
Jeffrey P. Hastings - Hanover NH, US

Assignee:

Pro-Cut Licensing Company, LLC - West Lebanon NH

International Classification:

B23B 5/04
B23B 1/00

US Classification:

82112, 82 111, 82 47, 82118

Abstract:

A reporting system, employing a microprocessor, tracks the operation of an on-vehicle brake lathe and provides records of the resurfacing operations performed by the lathe. Identification of the vehicle and wheel position of a brake disk to be resurfaced are inputted using an operator interface, and stored in a temporary memory. When tool bits of the lathe are positioned to set a depth of cut, a thickness monitor indicates the resulting thickness for the brake disk, which is compared to a minimum thickness specification for the inputted vehicle and wheel position to determine whether the disk can be resurfaced to meet the specification. If so, a cutting operation evaluator monitors a continuity checker that is responsive to contact of the tool bits and the disk to determine when the resurfacing operation is complete, at which time the collected data can be reported.

US Patent:

20040037503, Feb 26, 2004

Filed:

May 28, 2003

Appl. No.:

10/446245

Inventors:

Jeffrey Hastings - Lexington KY, US
Michael Lim - Cambridge MA, US
Henry Smith - Sudbury MA, US

International Classification:

G02B006/34
G02B006/10

US Classification:

385/037000, 385/130000

Abstract:

A diffraction grating of non-uniform strength is introduced into an optical waveguide by modulating its width. The waveguide may be fabricated using one of several planar processing techniques. Varying the size, position, and/or thickness of the grating teeth provides the desired variation of grating strength. Certain functional variations of grating strength suppress side-lobe levels in the grating reflection and transmission spectra. This process, termed apodization, is necessary for precise wavelength filtering and dispersion compensation. If desired, different periodicity gratings can be introduced in each side of the waveguide, multiple periodicities can be superimposed, the grating can be angled with respect to the waveguide, and the grating period and phase can be varied.

US Patent:

20110160561, Jun 30, 2011

Filed:

Dec 30, 2010

Appl. No.:

12/982110

Inventors:

Jeffrey Todd Hastings - Lexington KY, US
E. Britt Brockman - Louisville KY, US
Ingrid L. St. Omer - Lexington KY, US
John C. Wright - Louisville KY, US

Assignee:

BROCKMAN HOLDINGS LLC - Louisville KY
THE UNIVERSITY OF KENTUCKY RESEARCH FOUNDATION - Lexington KY

International Classification:

A61B 3/16

US Classification:

600398

Abstract:

A system for determination of intraocular pressure includes: an intraocular pressure sensor; a light source illuminating the sensor with one or more wavelengths of light; and a detector that measures emitted light from the sensor. The sensor includes a substrate member, a spacer member, and a flexible membrane, which define a sealed cavity. The flexible membrane moves in response to intraocular pressure changes. A device for measuring intraocular pressure includes: the sensor; an anchoring member attached to the sensor for immobilizing the sensor in an eye; and a protective member attached to the anchoring member and covering the sensor to prevent contact between the flexible membrane and the eye. A method for determination of intraocular pressure includes: placing the sensor in an eye; illuminating, with a light source, the sensor with one or more wavelengths of light; and detecting, with a detector, a resultant light that contains information about intraocular pressure.

US Patent:

20110293847, Dec 1, 2011

Filed:

May 28, 2010

Appl. No.:

12/789457

Inventors:

Jeffrey Todd Hastings - Lexington KY, US

International Classification:

C23F 17/00
C23C 14/14
C23C 14/06

US Classification:

427524, 427523, 427527, 427531

Abstract:

A system or method of charge particle beam induced materials processing is disclosed. A charged particle beam (electron or ion) is focused at the interface of a substrate and a bulk liquid. The beam induces a localized chemical reaction that results in deposition or etching of deterministic micro- or nano-scale structures. The bulk liquid reactants permit the deposition and etching of metals, semiconductors, and insulators. A charged particle transparent membrane separates the liquid reactant from the vacuum chamber in which the beam is transmitted. In many cases, bulk liquid reactants permit processing of materials with much higher purity that of the prior art and permit processing of materials previously unavailable in charged particle beam processes.

US Patent:

20210298946, Sep 30, 2021

Filed:

Dec 31, 2020

Appl. No.:

17/139205

Inventors:

- Lexington KY, US
Jeffrey Todd Hastings - Lexington KY, US
Carlos Andres Jarro - Lexington KY, US
James L. Russell - Lexington KY, US

International Classification:

A61F 9/00
A61B 3/16
A61B 5/145
A61B 3/02
A61B 5/00

Abstract:

An eye implantation device has a body including a support system adapted to engage at three points with an iridocorneal angle of an anterior chamber of an eye into which the device is implanted.