Jeffrey H Hoffman

US Patent:

6683710, Jan 27, 2004

Filed:

Feb 7, 2002

Appl. No.:

10/071375

Inventors:

Jeffrey M. Hoffman - Tucson AZ
James P. McGuire - Pasadena CA

Assignee:

Optical Research Associates - Pasadena CA

International Classification:

G02F 103

US Classification:

359256, 359252, 359253

Abstract:

An optical system includes multiple cubic crystalline optical elements aligned along a common optical axis and having their crystal lattices oriented with respect to each other to minimize the effects of intrinsic birefringence and produce a system with reduced retardance. The optical system may be a refractive or catadioptric system having a high numerical aperture and using light with a wavelength at or below 248 nanometers. The net retardance of the system is less than the sum of the retardance contributions of the respective optical elements as the elements are oriented such that the intrinsic birefringences of the individual elements cancel each other out. In one embodiment, two [110] cubic crystalline optical elements are clocked with respect to one another and used in conjunction with a [100] cubic crystalline optical element to reduce retardance. Various birefringent elements, wave plates, and combinations thereof provide additional correction for residual retardance and wavefront aberrations. The optical system may be used in a photolithography tool to pattern substrates such as semiconductor substrates and thereby produce semiconductor devices.

US Patent:

6885488, Apr 26, 2005

Filed:

Feb 20, 2003

Appl. No.:

10/371269

Inventors:

Jeffrey M. Hoffman - Tucson AZ, US
James P. McGuire - Pasadena CA, US

Assignee:

Optical Research Associates - Pasadena CA

International Classification:

G02F001/07
H01L021/00
H01L029/26

US Classification:

359256, 359494, 438150, 438942, 257 80

Abstract:

An optical system includes multiple cubic crystalline optical elements aligned along a common optical axis and having their crystal lattices oriented with respect to each other to minimize the effects of intrinsic birefringence and produce a system with reduced retardance. The optical system may be a refractive or catadioptric system having a high numerical aperture and using light with a wavelength at or below 248 nanometers. The net retardance of the system is less than the sum of the retardance contributions of the respective optical elements as the elements are oriented such that the intrinsic birefringences of the individual elements cancel each other out. In one embodiment, two [110] cubic crystalline optical elements are clocked with respect to one another and used in conjunction with a [100] cubic crystalline optical element to reduce retardance. Various birefringent elements, wave plates, and combinations thereof provide additional correction for residual retardance and wavefront aberrations. The optical system may be used in a photolithography tool to pattern substrates such as semiconductor substrates and thereby produce semiconductor devices.

US Patent:

6917458, Jul 12, 2005

Filed:

Feb 20, 2003

Appl. No.:

10/371266

Inventors:

Jeffrey M. Hoffman - Tucson AZ, US
James P. McGuire - Pasadena CA, US

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G02F001/03
G02B027/28

US Classification:

359256, 359497, 359499

Abstract:

An optical system includes multiple cubic crystalline optical elements aligned along a common optical axis and having their crystal lattices oriented with respect to each other to minimize the effects of intrinsic birefringence and produce a system with reduced retardance. The optical system may be a refractive or catadioptric system having a high numerical aperture and using light with a wavelength at or below 248 nanometers. The net retardance of the system is less than the sum of the retardance contributions of the respective optical elements as the elements are oriented such that the intrinsic birefringences of the individual elements cancel each other out. In one embodiment, two [110] cubic crystalline optical elements are clocked with respect to one another and used in conjunction with a [100] cubic crystalline optical element to reduce retardance. Various birefringent elements, wave plates, and combinations thereof provide additional correction for residual retardance and wavefront aberrations. The optical system may be used in a photolithography tool to pattern substrates such as semiconductor substrates and thereby produce semiconductor devices.

US Patent:

6947192, Sep 20, 2005

Filed:

Jan 19, 2004

Appl. No.:

10/759699

Inventors:

Jeffrey M. Hoffman - Tucson AZ, US
James P. McGuire - Pasadena CA, US

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G02F001/03

US Classification:

359256, 359252, 359253

Abstract:

An optical system includes multiple cubic crystalline optical elements aligned along a common optical axis and having their crystal lattices oriented with respect to each other to minimize the effects of intrinsic birefringence and produce a system with reduced retardance. The optical system may be a refractive or catadioptric system having a high numerical aperture and using light with a wavelength at or below 248 nanometers. The net retardance of the system is less than the sum of the retardance contributions of the respective optical elements as the elements are oriented such that the intrinsic birefringences of the individual elements cancel each other out. In one embodiment, two [110] cubic crystalline optical elements are clocked with respect to one another and used in conjunction with a [100] cubic crystalline optical element to reduce retardance. Various birefringent elements, wave plates, and combinations thereof provide additional correction for residual retardance and wavefront aberrations. The optical system may be used in a photolithography tool to pattern substrates such as semiconductor substrates and thereby produce semiconductor devices.

US Patent:

7009769, Mar 7, 2006

Filed:

Aug 19, 2004

Appl. No.:

10/921345

Inventors:

Jeffrey M. Hoffman - Tucson AZ, US
James P. McGuire - Pasadena CA, US

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G02B 27/28
G02B 1/07

US Classification:

359494, 359497, 359499, 359355, 359256

Abstract:

A photolithography tool including an optical system for transmitting a beam of radiation toward a substrate is presented. The optical system includes a plurality of calcium fluoride lens elements, optically transmissive of the beam of radiation, each having respective optical axes and imparting a retardance to the beam. The plurality of calcium fluoride lens elements are aligned along an optical path for propagation of the beam of radiation therethrough. Each of the calcium fluoride lens elements includes a cubic crystalline calcium fluoride that is aligned with its [111] lattice direction, or a lattice direction optically equivalent to the [111] lattice direction, substantially parallel with its optical axis. A first calcium fluoride lens element of the plurality of calcium fluoride lens elements is rotated about its optical axis with respect to a second calcium fluoride lens element. The optical system has less than or about 0.

US Patent:

7072124, Jul 4, 2006

Filed:

Jun 24, 2003

Appl. No.:

10/602128

Inventors:

Brian L. Wilt - Madison WI, US
Patrick J. Shipley - Sun Prairie WI, US
Jeffrey M. Hoffman - Tucson AZ, US
Jasmin Côté - Île Bizard, CA

Assignee:

Kerr Corporation - Orange CA

International Classification:

G02B 13/00
G02C 1/00

US Classification:

359744, 359362, 359642, 351158

Abstract:

A magnification loupe carried by spectacles has a Galilean lens system comprising a single-element eyepiece lens and a two-element objective lens. The loupes may be mounted to eyeglass frames by a flip-up mounting member, or they may be mounted through the eyeglass lenses of the spectacles. The loupes provide high magnification while minimizing weight to thereby reduce strain and discomfort to users. In an exemplary embodiment, the objective lens has a non-circular shape that provides a wide field of view while further minimizing the weight of the loupe. A correction lens may be interchangeably coupled to the loupe housing to permit selective replacement with another correction lens to vary the working distance of the loupe.

US Patent:

7075696, Jul 11, 2006

Filed:

Oct 18, 2005

Appl. No.:

11/251959

Inventors:

Jeffrey M. Hoffman - Tucson AZ, US

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G02F 1/03
G02B 27/28
G03B 27/54

US Classification:

359256, 359499, 355 67

Abstract:

A lithographic apparatus includes a projection system, which includes a plurality of cubic crystalline optical elements that each impart retardance to a beam of radiation. The optical elements are aligned along an optical axis of the projection system and include two adjacent crystalline optical elements having a common crystalline lattice direction oriented along the optical axis. A first of the two adjacent elements is rotated about the optical axis with respect to a second of the adjacent elements with a predetermined rotation angle. The crystalline optical elements are selected and positioned along the optical axis and the rotation angle is selected such that, for each of two substantially perpendicular polarization states of the beam of radiation having a radiation wavelength of about 193 nm, the patterned beam of radiation has less than about 0. 012 waves RMS of wavefront aberration across an exit pupil of the projection system.

US Patent:

20060245052, Nov 2, 2006

Filed:

Jun 29, 2006

Appl. No.:

11/427492

Inventors:

Brian Wilt - Madison WI, US
Patrick Shipley - Sun Prairie WI, US
Jeffrey Hoffman - Tucson AZ, US
Jasmin Cote - Ile Bizard QC, CA

Assignee:

KERR CORPORATION - Orange CA

International Classification:

G02B 23/00

US Classification:

359407000, 359800000

Abstract:

A magnification loupe carried by spectacles has a Galilean lens system comprising a single-element eyepiece lens and a two-element objective lens. The loupes may be mounted to eyeglass frames by a flip-up mounting member, or they may be mounted through the eyeglass lenses of the spectacles. The loupes provide high magnification while minimizing weight to thereby reduce strain and discomfort to users. In an exemplary embodiment, the objective lens has a non-circular shape that provides a wide field of view while further minimizing the weight of the loupe. A correction lens may be interchangeably coupled to the loupe housing to permit selective replacement with another correction lens to vary the working distance of the loupe.