Jie Jie Lin

US Patent:

20080306936, Dec 11, 2008

Filed:

Jun 6, 2007

Appl. No.:

11/810936

Inventors:

Edwin Ho - Palo Alto CA, US
King Sun Wai - Castro Valley CA, US
Jie Lin - San Francisco CA, US

International Classification:

G06F 17/30

US Classification:

707 5, 707E17001

Abstract:

A method and apparatus for compiling user preferences and providing access to preferred digital content on a mobile handset is provided.

US Patent:

20220317372, Oct 6, 2022

Filed:

Mar 31, 2021

Appl. No.:

17/218748

Inventors:

- Singapore, SG
Jie LIN - San Jose CA, US

International Classification:

G02B 6/12
G02B 6/122
G02B 6/136

Abstract:

A method for making a multimode interference (MMI) coupler with an arbitrary desired splitting ratio includes forming a thin-film of silicon-nitride material overlying a SOI substrate. The method further includes obtaining geometric parameters of a standard MIMI coupler including a rectangular MMI block and one input port and two output ports in taper shape with one of standard splitting ratios under self-imaging principle which is close to the desired splitting ratio. Additionally, the method includes tunning the input port to an off-center position at front edge of the MMI block. The method further includes making a first output port to a first off-center position flushing with a side edge of the MMI block, adjusting a second output port to a second off-center position. The method includes tunning the MMI block to obtain optimized geometric parameters for approaching the selected arbitrary splitting ratio, and etching the thin-film of silicon-nitride material.

US Patent:

20210325606, Oct 21, 2021

Filed:

Apr 15, 2020

Appl. No.:

16/849197

Inventors:

- Santa Clara CA, US
Jie LIN - Santa Clara CA, US

International Classification:

G02B 6/122
G02B 6/13

Abstract:

An optical splitter includes a silicon-on-insulator substrate having a cladding layer. The optical splitter also includes a first waveguide of a first width and a first length buried in the cladding layer and a second waveguide of a second width and a second length buried in the cladding layer disposed in close proximity of the first waveguide by a gap distance. A ratio of the second width over the first width is configured to be smaller than 1 while the first length, the second length, and the gap distance are configured to allow evanescent coupling of a first confined mode of an optical signal in the first waveguide into the second waveguide with a certain splitting ratio being achieved in a range of 1% to

US Patent:

20200257127, Aug 13, 2020

Filed:

Feb 13, 2019

Appl. No.:

16/274826

Inventors:

- Santa Clara CA, US
Jie LIN - Santa Clara CA, US

International Classification:

G02B 27/28

Abstract:

The present application discloses a polarization beam splitter (PBS). The PBS includes a silicon substrate and a planar structure formed thereon characterized by an isosceles trapezoid shape with a first parallel side and a second parallel side connected by two tapered sides. The first parallel side has longer width than the second parallel side, both of which is separated by a length no greater than 100 μm along a line of symmetry bisecting the pair of parallel sides. The PBS further includes a pair of input ports coupled to the first parallel side and a pair of output ports coupled to the second parallel side. The planar structure is configured to receive an input light wave of any wavelength in C-band via one input port and split to a TE-mode light wave and a TM-mode light wave respectively outputting to the pair of output ports.

US Patent:

20190324366, Oct 24, 2019

Filed:

Apr 23, 2018

Appl. No.:

15/959968

Inventors:

- San Jose CA, US
Jie Lin - San Jose CA, US
Jihui Huang - San Jose CA, US

International Classification:

G03F 1/70
G03F 1/76

Abstract:

Methods, apparatuses, and systems for determining a binary mask pattern from a pixelated mask pattern include: determining, by a processor, based on a fast marching method (FMM), arrival values for pixels of a portion of the pixelated mask pattern; determining the binary mask pattern based on the arrival values; and updating at least one of the arrival values based on a comparison between a design pattern corresponding to the pixelated mask pattern and a substrate pattern simulated based on the binary mask pattern.

US Patent:

20180321443, Nov 8, 2018

Filed:

Jul 2, 2018

Appl. No.:

16/025890

Inventors:

- Santa Clara CA, US
Jie LIN - Santa Clara CA, US

International Classification:

G02B 6/293
G02B 6/12

Abstract:

A multiplexer/demultiplexer for at least two wavelengths in O-band. The multiplexer/demultiplexer includes a silicon waveguide block having a first port, a second/third port respectively in bar/cross position at an opposing end plane relative to the first port. The silicon waveguide block is configured to provide a general interference excitation of a light wave of a first wavelength and a second wavelength respectively selected from two windows in O-band. The light wave is either inputted via the first port and split into a first output light of the first wavelength out of the second port and a second output light of the second wavelength out of the third port, or is combined of a first input light of the first wavelength from the second port and a second input light of the second wavelength from the third port and outputted via the first port with both wavelengths.

US Patent:

20180284348, Oct 4, 2018

Filed:

Jan 26, 2018

Appl. No.:

15/881428

Inventors:

- Santa Clara CA, US
Jie LIN - Santa Clara CA, US

International Classification:

G02B 6/126
G02B 6/27

Abstract:

A waveguide-based polarization splitter-rotator (PSR) includes a converter with tapered rib-structure configured to convert TM0/TE0 polarization mode of an input light to a TE1/TE0 mode, a splitter coupled to the first plane for splitting the input light evenly to a first wave at a first port and a second wave at a second port. Furthermore, the PSR includes a phase shifter having a first arm coupled to first port and a second arm coupled to the second port. The first arm guides the first wave to a third port with no phase shift while the second arm adds 90 or 270 degrees to the second wave. The PSR also includes a 2×2 MMI coupler for coupling the first wave and the second wave to output a first output light in TE0 mode exclusively from TM0 mode and a second output light in TE0 mode exclusively from TE0 mode.

US Patent:

20180218090, Aug 2, 2018

Filed:

Jan 30, 2017

Appl. No.:

15/419624

Inventors:

- Beijing, CN
Jie Lin - San Jose CA, US
Zhaoli Zhang - San Jose CA, US
Zongchang Yu - San Jose CA, US

International Classification:

G06F 17/50
H01L 21/66

Abstract:

A method and system for detecting defects of integrated circuits have been provided. The method comprises generating process sensitive patterns of an integrated circuit, scanning the process sensitive patterns using a high-resolution system to provide process condition parameters of the integrated circuit, determining care areas of the integrated circuit using the process condition parameters, and scanning the care areas using the high-resolution system to detect at least one defect of the integrated circuit. The system comprises a processor and a memory with instructions executable by the processor to generate process sensitive patterns of an integrated circuit, scan the process sensitive patterns using a high-resolution system to provide process condition parameters of the integrated circuit, determine care areas of the integrated circuit using the process condition parameters, and scan the care areas using the high-resolution system to detect at least one defect of the integrated circuit.