Jinggao Li

from Fairfield, CT

Also known as:
  • Li Jinggao
Phone and address:
560 Black Rock Tpke, Fairfield, CT 06825

Jinggao Li Phones & Addresses

  • 560 Black Rock Tpke, Fairfield, CT 06825
  • Darien, CT

Work

  • Company:
    Dragonsun corp
    May 2009
  • Position:
    Patent agent/founder

Education

  • School / High School:
    SUNY-STONY BROOK- Stony Brook, NY
    Dec 2004
  • Specialities:
    Ph.D. in Mechanical Engineering

Resumes

Jinggao Li Photo 1

Jinggao Li Fairfield, CT

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Work:
DragonSun Corp

May 2009 to 2000
Patent Agent/Founder
ASML

Mar 2008 to 2000
Sr. Design Engineer/Sr. Analyst
SUSS MicroTec Inc
Waterbury Center, VT
Feb 2007 to Feb 2008
Sr. Mechanical Engineer/Project Manager
Quantronix Laser Corp
East Setauket, NY
Jan 2005 to Sep 2006
Opto-Mechanical Engineer
Education:
SUNY-STONY BROOK
Stony Brook, NY
Dec 2004
Ph.D. in Mechanical Engineering
UNIVERSITY OF CONNECTICUT SCHOOL OF LAW
Hartford, CT
Juris Doctor in Intellectual Property Law

Lawyers & Attorneys

Jinggao Li Photo 2

Jinggao Li - Lawyer

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ISLN:
1001176962
Admitted:
2021

Us Patents

  • Lithographic Apparatus And Device Manufacturing Method

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  • US Patent:
    20120249983, Oct 4, 2012
  • Filed:
    Mar 26, 2012
  • Appl. No.:
    13/430159
  • Inventors:
    Herman Vogel - Sandy Hook CT, US
    Jeroen Gerard Gosen - Geldrop, NL
    Bart Dinand Paarhuis - Waalre, NL
    Frank Johannes Jacobus Van Boxtel - Eindhoven, NL
    Jinggao Li - Fairfield CT, US
  • Assignee:
    ASML NETHERLANDS B.V. - Veldhoven
    ASML HOLDING N.V. - Veldhoven
  • International Classification:
    G03B 27/42
  • US Classification:
    355 53
  • Abstract:
    An apparatus, in an embodiment, having a patterning device support including a first planar element having a first flow-restricting surface; a second planar element including a second flow-restricting surface facing the first flow-restricting surface; a support driver to linearly move the support along a certain direction relative to the second planar element, wherein the first and/or second flow-restricting surface has one or more projections and/or recesses between the first and second flow-restricting surfaces, and wherein the projection and/or recess on the first and/or second flow-restricting surface is arranged to provide a flow resistance, per unit width of the first and/or second flow-restricting surface perpendicular to the flow, that is lower against flow that is parallel to the certain direction than against flow that is perpendicular to the certain direction. The flow-restricting surfaces may direct gas flow onto a driver part that generates heat.
  • Lithographic Apparatus, An Illumination System, A Projection System And A Method Of Manufacturing A Device Using A Lithographic Apparatus

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  • US Patent:
    20110228239, Sep 22, 2011
  • Filed:
    Mar 17, 2011
  • Appl. No.:
    13/050476
  • Inventors:
    Jeroen Gerard GOSEN - Geldrop, NL
    Antonius Johannus Van Der Net - Tilburg, NL
    Bart Dinand Paarhuis - Waalre, NL
    Frank Johannes Jacobus Van Boxtel - Eindhoven, NL
    Jinggao Li - Fairfield CT, US
  • Assignee:
    ASML NETHERLANDS B.V. - Veldhoven
    ASML HOLDING N.V. - Veldhoven
  • International Classification:
    G03B 27/52
  • US Classification:
    355 30
  • Abstract:
    A gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.

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Jinggao Li


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