John Michael Greene

US Patent:

RE37740, Jun 11, 2002

Filed:

Jan 17, 1995

Appl. No.:

08/373084

Inventors:

Curt H. Chadwick - Los Gatos CA
Robert R. Sholes - Ben Lomond CA
John D. Greene - Santa Cruz CA
Michael E. Fein - Mountain View CA
P. C. Jann - Mountain View CA
David J. Harvey - Campbell CA
William Bell - San Jose CA

Assignee:

KLA-Tencor Corporation - San Jose CA

International Classification:

G01B 1130

US Classification:

356394, 356636, 356446

Abstract:

Substrate inspection apparatus and methods, and illumination apparatus. The inspection apparatus and method includes memory for storing the desired features of the surface of the substrate, focussed illuminator for substantially uniformly illuminating a region of the surface of the substrate to be inspected. Additionally there is a sensor for imaging the region of the substrate illuminated by the illuminator, and a comparator responsive to the memory and sensor for comparing the imaged region of the substrate with the stored desired features of the substrate. The illumination apparatus is designed to provide substantially uniform focussed illumination along a narrow linear region. This apparatus includes first, second and third reflectors elliptically cylindrical in shape, each with its long axis substantially parallel to the long axes of each of the others. Fourth and fifth reflectors are also included with each being flat and mounted parallel to each other and at opposite ends of each of said first, second and third reflectors, and first, second and third linear light sources each mounted parallel to a corresponding one of said first, second and third reflectors with each of the light sources mounted so that it is at the first focus of the corresponding reflector and the illuminated linear region is at the second focus of each of the first, second and third reflectors. The questions raised in reexamination request No.

US Patent:

6833913, Dec 21, 2004

Filed:

Jun 24, 2002

Appl. No.:

10/180807

Inventors:

Ralph C. Wolf - Palo Alto CA
Eva L. Benitez - Sunnyvale CA
Dongsheng Don Chen - Union City CA
John D. Greene - Santa Cruz CA
Jamie M. Sullivan - Sunnyvale CA
Eric N. Vella - Mountain View CA
Khiem D. Vo - Milpitas CA

Assignee:

KLA-Tencor Technologies Corporation - Milpitas CA

International Classification:

G01N 2188

US Classification:

3562372, 250214 AG

Abstract:

Disclosed are methods and apparatus for detecting a relatively wide dynamic range of intensity values from a beam (e. g. , scattered light, reflected light, or secondary electrons) originating from a sample, such as a semiconductor wafer. In other words, the inspection system provides detected output signals having wide dynamic ranges. The detected output signals may then be analyzed to determine whether defects are present on the sample. For example, the intensity values from a target die are compared to the intensity values from a corresponding portion of a reference die, where a significant intensity difference may be defined as a defect. In a specific embodiment, an inspection system for detecting defects on a sample is disclosed. The system includes a beam generator for directing an incident beam towards a sample surface and a detector positioned to detect a detected beam originating from the sample surface in response to the incident beam. The detector has a sensor for detecting the detected beam and generating a detected signal based on the detected beam and a non-linear component coupled to the sensor.

US Patent:

7012683, Mar 14, 2006

Filed:

Nov 18, 2004

Appl. No.:

10/993473

Inventors:

Ralph C. Wolf - Palo Alto CA, US
Eva L. Benitez - Sunnyvale CA, US
Dongsheng (Don) Chen - Union City CA, US
John D. Greene - Santa Cruz CA, US
Jamie M. Sullivan - Sunnyvale CA, US
Eric N. Vella - Mountain View CA, US
Khiem D. Vo - Milpitas CA, US

Assignee:

KLA-Tencor Technologies Corporation - Milpitas CA

International Classification:

G01N 21/88

US Classification:

3562372

Abstract:

Disclosed are methods and apparatus for detecting a relatively wide dynamic range of intensity values from a beam (e. g. , scattered light, reflected light, or secondary electrons) originating from a sample, such as a semiconductor wafer. In other words, the inspection system provides detected output signals having wide dynamic ranges. The detected output signals may then be analyzed to determine whether defects are present on the sample. For example, the intensity values from a target die are compared to the intensity values from a corresponding portion of a reference die, where a significant intensity difference may be defined as a defect. In a specific embodiment, an inspection system for detecting defects on a sample is disclosed. The system includes a beam generator for directing an incident beam towards a sample surface and a detector positioned to detect a detected beam originating from the sample surface in response to the incident beam. The detector has a sensor for detecting the detected beam and generating a detected signal based on the detected beam and a non-linear component coupled to the sensor.

US Patent:

7253410, Aug 7, 2007

Filed:

Sep 13, 2005

Appl. No.:

11/225917

Inventors:

Kirk J. Bertsche - San Jose CA, US
John Greene - Santa Cruz CA, US

Assignee:

KLA-Tencor Technologies Corporation - Milpitas CA

International Classification:

H01J 37/244

US Classification:

250310, 250396 R, 250397, 250307, 438 18, 438 14, 324751, 324750

Abstract:

One embodiment described relates to a method of electron beam imaging of a target area of a substrate. An electron beam column is configured for charge-control pre-scanning using a primary electron beam. A pre-scan is performed over the target area. The electron beam column is re-configured for imaging using the primary electron beam. An imaging scan is then performed over the target area. Other embodiments are also described.

US Patent:

8196732, Jun 12, 2012

Filed:

Aug 2, 2010

Appl. No.:

12/848442

Inventors:

Roumen Iliev Deyanov - Freemont CA, US
Kevin Tzou - San Jose CA, US
Pablo Gonzalez - Oakland CA, US
Robert Carlson - Milpitas CA, US
John Brooks Greene - Pleasanton CA, US

Assignee:

Muratec Automation Co., Ltd. - Kyoto

International Classification:

B65G 49/06
B66B 17/04
H01L 21/677

US Classification:

1983463, 1983462, 41422207, 414281

Abstract:

A transport mechanism is configured to transport a work piece carrier within a buffer in fabrication facility, comprising: a transporter configured to travel on two rails, wherein the transporter comprises (i) a flat belt hoist mechanism configured to lift and to lower one or more work piece carriers, and (ii) a gripper mechanism configured to capture and to release the one or more work piece carriers.

US Patent:

8294125, Oct 23, 2012

Filed:

Dec 9, 2009

Appl. No.:

12/634444

Inventors:

Liqun Han - Pleasanton CA, US
Marian Mankos - Palo Alto CA, US
Xinrong Jiang - Palo Alto CA, US
Rex Runyon - Fremont CA, US
John Greene - Santa Cruz CA, US

Assignee:

KLA-Tencor Corporation - Milpitas CA

International Classification:

H01J 37/20
H01J 37/29
G01N 23/225

US Classification:

25049223, 2504921, 2504922, 25049222, 250397, 250398

Abstract:

One embodiment relates to an electron-beam apparatus for defect inspection and/or review of substrates or for measuring critical dimensions of features on substrates. The apparatus includes an electron gun and an electron column. The electron gun includes an electron source configured to generate electrons for an electron beam and an adjustable beam-limiting aperture which is configured to select and use one aperture size from a range of aperture sizes. Another embodiment relates to providing an electron beam in an apparatus. Advantageously, the disclosed apparatus and methods reduce spot blur while maintaining a high beam current so as to obtain both high sensitivity and high throughput.

US Patent:

8362425, Jan 29, 2013

Filed:

Apr 27, 2011

Appl. No.:

13/095585

Inventors:

Liqun Han - Pleasanton CA, US
Xinrong Jiang - Palo Alto CA, US
John D. Greene - Santa Cruz CA, US

Assignee:

KLA-Tencor Corporation - Milpitas CA

International Classification:

G01N 23/04
G01N 23/00

US Classification:

250307, 250306, 250310

Abstract:

One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.

US Patent:

20100257466, Oct 7, 2010

Filed:

Apr 1, 2009

Appl. No.:

12/416720

Inventors:

Luke Wroblewski - San Jose CA, US
Aramys Miranda - San Jose CA, US
John Greene - Portland OR, US

Assignee:

Yahoo! Inc. - Sunnyvale CA

International Classification:

G06F 3/048
G06F 17/30

US Classification:

715760, 715764, 707E17108

Abstract:

The automatic generation of a mini-application corresponding to a web site is disclosed. A web site is identified via a Uniform Resource Locator (URL). The web site is analyzed via a computing device to determine its functionality, where the functionality includes features and functions of the web site. The computing device extracts a subset of the web site functionality based on characteristics of the web site. A mini-application corresponding to the web site is then automatically generated by computer code executing on the computing device. The mini-application includes the extracted subset of the web site functionality so that the subset of the web site functionality is accessible when the mini-application executes.