John Nathan Matthews

US Patent:

7106057, Sep 12, 2006

Filed:

Mar 17, 2005

Appl. No.:

11/081529

Inventors:

John Matthews - Greenbelt MD, US
Frederick Charles Wellstood - Fairfax VA, US
Soun Pil Kwon - Hyattsville MD, US
Kosta P. Vlahacos - Clarksville MD, US

Assignee:

University of Maryland - College Park MD
National Security Agency - Fort George Meade MD

International Classification:

G01R 33/02
G01R 33/035

US Classification:

324248, 505846

Abstract:

A scanning SQUID microscope capable of high frequency magnetic field measurements uses a hysteretic SQUID detector and a pulsed sampling technique which permits to extend the bandwidth of the SQUID microscope to above GHz region. The system can be readily incorporated into a 4. 2scanning SQUID microscope for imaging chips at room temperature. By biasing the hysteretic SQUID with pulses of a predetermined amplitude, and adjusting a modulation flux applied to the hysteretic SQUID at a plurality of time delays between the activation of the sample under study and the bias pulse, the hysteretic SQUID can be switched on, and the modulation flux value corresponding to such a switching event as a function of time is considered as representation of the magnetic field emanating from the sample under study.

US Patent:

7268542, Sep 11, 2007

Filed:

Feb 16, 2005

Appl. No.:

11/081361

Inventors:

Frederick C. Wellstood - Fairfax VA, US
Su-Young Lee - Berlin, DE
John Matthews - Greenbelt MD, US

Assignee:

United States of America as represented by the Secretary of the Air Force - Washington DC

International Classification:

G01R 33/035

US Classification:

324248, 326 5, 505162, 505846

Abstract:

A scanning SQUID microscope is set forth to provide improved output imaging. The SQUID microscope includes a vertically adjustable housing adapted to securely retain a SQUID loop or sensor. A scanning stage of the SQUID microscope is adapted to support a sample while moving the sample along a predetermined path to selectively position predetermined portions of the sample in close proximity to the SQUID loop or sensor to permit the loop or sensor to detect predetermined magnetic field information provided by the predetermined portions of the sample. A position control processor coupled to the scanning stage is operative to receive and process the predetermined magnetic field information to provide corresponding position noise information. Criteria are also presented for determining the expected level of position noise under given experimental conditions.

US Patent:

49303228, Jun 5, 1990

Filed:

Sep 11, 1989

Appl. No.:

7/405828

Inventors:

Joseph L. Ashley - Fairfax VA
John D. Matthews - Simi Valley CA

Assignee:

The United States of America as represented by the Secretary of the Navy - Washington DC

International Classification:

F25D 2100

US Classification:

62271

Abstract:

A heat pump is disclosed which includes a first packed bed of liquid desint for removing moisture from outside air in the heating mode of operation, and a pump for transferring the moisture laden desiccant to a second packed bed which humidifies condenser heated inside air by adding water vapor to the air. The first packed bed, by removing moisture from the outside air before it passes through the heat pump's evaporator coils, prevents frost from forming on the coils. In the cooling mode of operation the second packed bed of liquid desiccant removes water vapor from the air inside of the building. The moisture laden desiccant is then transferred to the first packed bed by a second pump where condenser heat transfers the moisture from the desiccant to outside air.

US Patent:

50714856, Dec 10, 1991

Filed:

Sep 11, 1990

Appl. No.:

7/580928

Inventors:

John C. Matthews - Gaithersburg MD
Robert D. Wooten - Rockville MD
David S. Ferris - Washington DC
Stuart N. Rounds - Germantown MD

Assignee:

Fusion Systems Corporation - Rockville MD

International Classification:

B08B 500

US Classification:

134 2

Abstract:

A method and apparatus for stripping a photoresist layer from a semiconductor wafer, wherein oxidizing gas is fed from the edge of the wafer to the center. The oxidizing gas may be directed so that it is incident on the heated wafer support platform before it is incident on the wafer.

US Patent:

48850470, Dec 5, 1989

Filed:

Jan 11, 1988

Appl. No.:

7/141856

Inventors:

Michael G. Ury - Bethesda MD
John C. Matthews - Gaithersburg MD
Stuart N. Rounds - Germantown MD

Assignee:

Fusion Systems Corporation - Rockville MD

International Classification:

B44C 122
B29C 3700
C03C 1500
C03C 2506

US Classification:

156345

Abstract:

An apparatus for rapidly stripping a photoresist which utilizes an oxidizing fluid such as ozone. A very thin layer of oxidizing fluid of four millimeters or less is flowed over the photoresist. The fluid flows at high velocity over the resist, while the resist is heated. Additionally, the resist may be irradiated with ultraviolet radiation at an irradiance of at least about 800 milliwatts/cm. sup. 2.

US Patent:

43139698, Feb 2, 1982

Filed:

Sep 10, 1979

Appl. No.:

6/073630

Inventors:

John C. Matthews - Columbia MD
Robert W. Couch - Frederick MD

Assignee:

Fusion Systems Corporation - Rockville MD

International Classification:

B05D 306

US Classification:

427 44

Abstract:

A method and apparatus for providing low gloss and controlled gloss radiation cured coatings, and for effecting on-line control of the degree of gloss provided. A radiation-curable coating of a composition which includes inert particulates is first irradiated with curing radiation of wavelengths to which the coating is responsive but having substantially no distribution beneath about 300 nm, and is subsequently irradiated with curing radiation of wavelengths to which the coating is responsive including substantial radiation at wavelengths beneath 300 nm. Gloss control is obtained by adjusting the spectral distribution, the intensity, or the dose of the initial radiation, or by adjusting the time interval between the initial and subsequent irradiation steps.

US Patent:

45324271, Jul 30, 1985

Filed:

Mar 29, 1982

Appl. No.:

6/362825

Inventors:

John C. Matthews - Columbia MD
Michael G. Ury - Bethesda MD
Charles H. Wood - Rockville MD
Marshal Greenblatt - Silver Spring MD

Assignee:

Fusion Systems Corp. - Rockville MD

International Classification:

H01J 6504

US Classification:

2504922

Abstract:

A method and apparatus for performing deep UV photolithography which utilizes a microwave generated electrodeless light source for producing deep UV radiation. This results in faster semiconductor exposure times and less system downtime for changing failed bulbs as well as other advantages which are detailed herein.

US Patent:

45486883, Oct 22, 1985

Filed:

May 23, 1983

Appl. No.:

6/497466

Inventors:

John C. Matthews - Columbia MD

Assignee:

Fusion Semiconductor Systems - Rockville MD

International Classification:

B32B 2716

US Classification:

20415918

Abstract:

Photoresist is hardened by exposing it to UV radiation while subjecting it to elevated temperatures upon an increase in the degree of polymerization due to exposure to the radiation. The temperature of the photoresist can be controlled by a thermal chuck which contains a thermal ballast of heat conducting material.