John Brett Mccarty

US Patent:

8082525, Dec 20, 2011

Filed:

Apr 14, 2009

Appl. No.:

12/423693

Inventors:

Yong Liu - Fremont CA, US
John F. McCarty - Redwood City CA, US
Kelly Gordon Russell - Santa Clara CA, US
Linyong Pang - Palo Alto CA, US

Assignee:

Luminescent Technologies, Inc. - Palo Alto CA

International Classification:

G06F 17/50
G06F 19/00
G03F 1/00
G21K 5/00

US Classification:

716 52, 716 53, 716 54, 716 55, 716111, 700120, 700121, 430 5, 378 35

Abstract:

Embodiments of a method for determining a mask pattern to be used on a photo-mask in a lithography process are described. This method may be performed by a computer system. During operation, this computer system receives at least a portion of a first mask pattern including first regions that violate pre-determined rules associated with the photo-mask. Next, the computer system determines a second mask pattern based on at least the portion of the first mask pattern, where the second mask pattern includes second regions that are estimated to comply with the pre-determined rules. Note that the second regions correspond to the first regions, and the second mask pattern is determined using a different technique than that used to determine the first mask pattern.