John E Simons

US Patent:

6346484, Feb 12, 2002

Filed:

Aug 31, 2000

Appl. No.:

09/651843

Inventors:

John Michael Cotte - New Fairfield CT
Christopher Vincent Jahnes - Upper Saddle River NJ
Kenneth John McCullough - Fishkill NY
Wayne Martin Moreau - Wappinger NY
Satyanarayana Venkata Nitta - Fishkill NY
Katherine Lynn Saenger - Ossinger NY
John Patrick Simons - Wappingers Falls NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01C 21302

US Classification:

438725, 438623

Abstract:

The present invention relates to formation of air gaps in metal/insulator interconnect structures, and to the use of supercritical fluid (SCF)-based methods to extract sacrificial place-holding materials to form air gaps in a structure. Supercritical fluids have gas-like diffusivities and viscosities, and very low or zero surface tension, so SCFs can penetrate small access holes and/or pores in a perforated or porous bridge layer to reach the sacrificial material. Examples of SCFs include CO (with or without cosolvents or additives) and ethylene (with or without cosolvents or additives). In a more general embodiment, SCF-based methods for forming at least partially enclosed air gaps in structures that are not interconnect structures are disclosed.

US Patent:

6398875, Jun 4, 2002

Filed:

Jun 27, 2001

Appl. No.:

09/893231

Inventors:

John Michael Cotte - New Fairfield CT
Dario L. Goldfarb - Putnam Valley NY
Kenneth John McCullough - Fishkill NY
Wayne Martin Moreau - Wappinger NY
Keith R. Pope - Danbury CT
John P. Simons - Wappingers Falls NY
Charles J. Taft - Wappingers Falls NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B08B 304

US Classification:

134 2, 134 3, 134 10, 134 11, 134 31, 134 34, 134 36, 134 37, 134 41, 134902, 34448, 34467, 34468, 34469, 34470, 34516, 34517

Abstract:

A process of drying a semiconductor wafer which includes at least one microelectric structure disposed thereon which includes contacting a water-containing thin film-covered semiconductor wafer with a composition which includes liquid or supercritical carbon dioxide and a surfactant.

US Patent:

6425956, Jul 30, 2002

Filed:

Jan 5, 2001

Appl. No.:

09/755267

Inventors:

John Michael Cotte - New Fairfield CT
Donald J. Delehanty - Wappingers Falls NY
Kenneth John McCullough - Fishkill NY
Wayne Martin Moreau - Wappinger NY
John P. Simons - Wappingers Falls NY
Charles J. Taft - Wappingers Falls NY
Richard P. Volant - New Fairfield CT

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

C23G 102

US Classification:

134 3, 134 2, 134 2219, 134 36, 134 41, 134 42, 134902, 438690, 438691, 438692, 438693

Abstract:

A process of removing residual slurry resulting from chemical mechanical polishing of a workpiece in which the workpiece is contacted with a composition of a supercritical fluid, said supercritical fluid including supercritical, carbon dioxide and a co-solvent, and a surfactant.

US Patent:

6451375, Sep 17, 2002

Filed:

Jan 5, 2001

Appl. No.:

09/755266

Inventors:

John Michael Cotte - New Fairfield CT
Kenneth John McCullough - Fishkill NY
Wayne Martin Moreau - Wappinger NY
John P. Simons - Wappingers Falls NY
Charles J. Taft - Wappingers Falls NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B05D 512

US Classification:

427 58, 427123, 4271261, 427377, 427405, 4274431, 438678

Abstract:

A process of depositing a thin film on a nanometer structure in which a coating, which may be an aerogel material or metallic seed layer, is prepared. The coating is combined with a supercritical composition to form a supercritical coating composition. The supercritical coating composition is deposited upon a nanometer structure under supercritical conditions. Supercritical conditions are removed whereby the supercritical composition is removed and the coating solidifies into a thin solid film.

US Patent:

6454869, Sep 24, 2002

Filed:

Jun 27, 2001

Appl. No.:

09/893206

Inventors:

John Michael Cotte - New Fairfield CT
Dario L. Goldfarb - Putnam Valley NY
Kenneth John McCullough - Fishkill NY
Wayne Martin Moreau - Wappinger NY
Keith R. Pope - Danbury CT
John P. Simons - Wappingers Falls NY
Charles J. Taft - Wappingers Falls NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B08B 304

US Classification:

134 2, 134 36, 134 34, 134 2219, 134 42, 134902

Abstract:

A process of cleaning semiconductor processing, handling and manufacturing equipment in which such equipment is contacted with a cleaning effective amount of liquid or supercritical carbon dioxide.

US Patent:

6457480, Oct 1, 2002

Filed:

Jun 27, 2001

Appl. No.:

09/893208

Inventors:

John Michael Cotte - New Fairfield CT
Kenneth John McCullough - Fishkill NY
Wayne Martin Moreau - Wappinger NY
Keith R. Pope - Danbury CT
John P. Simons - Wappingers Falls NY
Charles J. Taft - Wappingers Falls NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B08B 900

US Classification:

134 221, 134 19, 134 2218, 134 2219, 134 34, 134 36, 134 42

Abstract:

A process and apparatus for cleaning filters prior to recycling or disposal. In this process and apparatus liquid or supercritical carbon dioxide contacts the plugged pores of a filter under conditions in which carbon dioxide remains in the liquid or supercritical state.

US Patent:

6509136, Jan 21, 2003

Filed:

Jun 27, 2001

Appl. No.:

09/893267

Inventors:

Dario L. Goldfarb - Putnam Valley NY
Kenneth John McCullough - Fishkill NY
David R. Medeiros - Ossining NY
Wayne M. Moreau - Wappinger NY
John P. Simons - Wappingers Falls NY
Charles J. Taft - Wappingers Falls NY

Assignee:

International Business Machines Corporation - Armonk CA

International Classification:

G03F 7027

US Classification:

4302721, 4302701, 430327, 430331, 430935, 427336, 427341, 427352, 427541

Abstract:

A process of drying a cast film polymeric disposed upon a workpiece. In this process a cast polymeric film, which includes a volatile organic compound therein, disposed on a workpiece, is contacted with an extraction agent which may be liquid carbon dioxide or supercritical carbon dioxide.

US Patent:

6561220, May 13, 2003

Filed:

Apr 23, 2001

Appl. No.:

09/840611

Inventors:

Kenneth J. McCullough - Fishkill NY
Wayne M. Moreau - Wappingers Falls NY
John P. Simons - Wappingers Falls NY
Charles J. Taft - Wappingers Falls NY
John M. Cotte - New Fairfield CT

Assignee:

International Business Machines, Corp. - Armonk NY

International Classification:

F17D 104

US Classification:

13756512, 13756517, 134 13, 118715

Abstract:

A method and an apparatus, the apparatus including appropriate valves and conduits, for increasing throughput in pressurized fluid processing including storing in a storage chamber of the apparatus a quantity of fluid at a pressure higher than a pressure at which an operation is to take place, while a processing chamber is depressurized to allow reception of a new object; sealing the processing chamber; and allowing fluid stored in the storage chamber to pass to the processing chamber to re-pressurize the processing chamber before performing the operation. The fluid may be preheated in the storage chamber to further reduce processing times.

Address:

2968 State Rte 5 And 20, Stanley, NY 14561

Phone:

5855005360

VIN:

1C6RD7FT1CS144632

Make:

RAM

Model:

RAM PICKUP 1500

Year:

2012