John D Skinner

US Patent:

57668027, Jun 16, 1998

Filed:

Mar 21, 1996

Appl. No.:

8/621144

Inventors:

John G. Skinner - Gladstone NJ

International Classification:

G03F 900

US Classification:

430 5

Abstract:

In accordance with the invention, a mask is produced of high quality and accuracy. This is accomplished by reducing the nominal writing scan width, relative to the total scan width, in an electron or optical beam raster scan pattern generator, and overlapping the adjacent scans by the difference between the writing scan width and the total scan width. When a pattern feature of small size overlaps into adjacent scan areas, the width of the writing scan is increased so the pattern area is within the increased writing scan area. In the case of a large pattern area with only a small portion extending into the adjacent scan area, no increase in the writing scan length is made.