Jon Christopher Reid
age ~50
from Nashville, TN
- Also known as:
-
- Jon C Reid
- Chris Reid
- John Chris Reid
- Christopher Reid
- Phone and address:
- 271B Blackman Rd, Nashville, TN 37211
Jon Reid Phones & Addresses
- 271B Blackman Rd, Nashville, TN 37211
- 10703 114Th St, Bixby, OK 74008 • 9183691114
- Portland, OR
- Shawnee, OK
- Tulsa, OK
- 271B Blackman Rd, Nashville, TN 37211 • 9183691114
Work
-
Company:Hunt, patton & brazeal, inc.
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Address:7170 S Braden Ave Ste 185, Tulsa, OK 74136
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Phones:9184926910
-
Position:Associate director
-
Industries:Management Consulting Services
Associate Director
Management Consulting Services
Associate Director
Employment Agency · Management Consulting Services Employment Agency · Executive Search Services
9184926910, 9184927023
Resumes
Jon Reid
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Jon Reid
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Department Manager
view sourceDepartment Manager
Amazon
Beginning Visual C# 2005
view sourceCreating next-generation software and applications is now easier than ever with the release of Visual C# 2005. This accessible book guides you through all aspects of C# programming and the capabilities of Visual Studio 2005 so that you can begin developing customized applications. You'll first learn...
Author
Karli Watson, Christian Nagel, Jacob Hammer Pedersen, Jon D. Reid, Morgan Skinner, Eric White
Binding
Paperback
Pages
1104
Publisher
Wrox
ISBN #
0764578472
EAN Code
9780764578472
ISBN #
10
Beginning C# 2005 Databases: From Novice to Professional
view sourceBeginning C# 2005 Databases: From Novice to Professional teaches you everything you need to know about relational databases, the SQL database language, and ADO.NET 2.0. You’ll also get a sound start in developing console, Windows Forms, ASP.NET, and even XML database applications. This book also tea...
Author
Jacob Hammer Pedersen, Syed Fahad Gilani, Jon Reid, James Huddleston, Ranga Raghuram
Binding
Paperback
Pages
500
Publisher
Apress
ISBN #
159059777X
EAN Code
9781590597774
ISBN #
7
Beginning Visual C# 2012 Programming
view sourceStep-by-step beginner’s guide to Visual C# 2012 Written for novice programmers who want to learn programming with C# and the .NET framework, this book offers programming basics such as variables, flow control, and object oriented programming. It then moves into web and Windows programming and data a...
Author
Karli Watson, Jacob Vibe Hammer, Jon D. Reid, Morgan Skinner, Daniel Kemper, Christian Nagel
Binding
Paperback
Pages
912
Publisher
Wrox
ISBN #
1118314417
EAN Code
9781118314418
ISBN #
4
Beginning Visual C# 2010
view sourceUpdate to Wrox's leading C# book for beginners Get ready for the next release of Microsoft's C# programming language with this essential Wrox beginner's guide. Beginning Microsoft Visual C# 2010 starts with the basics and brings you thoroughly up to speed. You'll first cover the fundamentals such as...
Author
Karli Watson, Christian Nagel, Jacob Hammer Pedersen, Jon D. Reid, Morgan Skinner
Binding
Paperback
Pages
1080
Publisher
Wrox
ISBN #
0470502266
EAN Code
9780470502266
ISBN #
3
Beginning C# 6 Programming with Visual Studio 2015
view sourceGet started with Visual C# programming with this great beginner's guide Beginning C# 6 Programming with Visual Studio 2015 provides step-by-step directions for programming with C# in the .NET framework. Beginning with programming essentials, such as variables, flow control, and object-oriented progr...
Author
Benjamin Perkins, Jacob Vibe Hammer, Jon D. Reid
Binding
Paperback
Pages
840
Publisher
Wrox
ISBN #
1119096685
EAN Code
9781119096689
ISBN #
1
Fast Track C#
view sourceC# is a modern, object-oriented language, designed by Microsoft to be the language of choice for programming the .NET Framework. .NET provides a new environment for developing almost any Windows-based or web-based application. By taking the "Fast Track" to C#, you have a compact guide to this new wo...
Author
Julian Templeman, Jon Reid, Neil Avent, K. Scott Allen, Syed Fahad Gilani
Binding
Paperback
Pages
420
Publisher
Peer Information Inc.
ISBN #
1861007116
EAN Code
9781861007117
ISBN #
9
Beginning VB 2005 Databases: From Novice to Professional (Beginning: From Novice to Professional)
view sourceThis book walks new readers through the intricacies of developing data-driven solutions using VB 2005 and ADO.NET 2.0. Helpful for those new to the .NET 2.0 technologies or new to data access and manipulation in general, this book surely gives these developers a thorough but easy-to-understand intro...
Author
Jacob Hammer Pedersen, Ranga Raghuram, Jon Reid, James Huddleston, Syed Fahad Gilani, Scott Allen
Binding
Paperback
Pages
491
Publisher
Apress
ISBN #
1590598105
EAN Code
9781590598108
ISBN #
8
Beginning C# 2008 Databases: From Novice to Professional (Books for Professionals by Professionals)
view sourceAssuming only basic knowledge of C# 3.0, Beginning C# 3.0 Databases teaches all the fundamentals of database technology and database programming readers need to quickly become highly proficient database users and application developers. It explains and demonstrates how to create database objects and...
Author
Syed Fahad Gilani, Vidya Vrat Agarwal, Jon Reid, Ranga Raghuram, James Huddleston, Jacob Hammer Pedersen
Binding
Paperback
Pages
482
Publisher
Apress
ISBN #
1590599004
EAN Code
9781590599006
ISBN #
6
Us Patents
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Method And Apparatus For Uniform Electroplating Of Integrated Circuits Using A Variable Field Shaping Element
view source -
US Patent:6402923, Jun 11, 2002
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Filed:Mar 27, 2000
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Appl. No.:09/537467
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Inventors:Steven T. Mayer - Lake Oswego OR 97034
Richard Hill - San Jose CA 94027
Alain Harrus - Palo Alto CA 94303
Evan Patton - Portland OR 97219
Robert Contolini - Lake Oswego OR 97035
Steve Taatjes - West Linn OR 97068
Jon Reid - Sherwood OR 97140 -
International Classification:C25D 500
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US Classification:205 96, 204224 R, 20429705, 204DIG 7, 204118, 204123, 204157
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Abstract:An electrochemical reactor is used to electrofill damascene architecture for integrated circuits. A shield is used to screen the applied field during electroplating operations to compensate for potential drop along the radius of a wafer. The shield establishes an inverse potential drop in the electrolytic fluid to overcome the resistance of a thin film seed layer of copper on the wafer.
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Methods For The Electrochemical Deposition Of Copper Onto A Barrier Layer Of A Work Piece
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US Patent:7405157, Jul 29, 2008
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Filed:Mar 2, 2005
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Appl. No.:11/071135
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Inventors:Jon Reid - Sherwood OR, US
Seyang Park - Beaverton OR, US -
Assignee:Novellus Systems, Inc. - San Jose CA
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International Classification:H01L 21/44
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US Classification:438677, 438674, 205187, 205291
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Abstract:Methods are provided for electrochemically depositing copper on a work piece. One method includes the step of depositing overlying the work piece a barrier layer having a surface and subjecting the barrier layer surface to a surface treatment adapted to facilitate deposition of copper on the barrier layer. Copper then is electrochemically deposited overlying the barrier layer.
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Current Ramping And Current Pulsing Entry Of Substrates For Electroplating
view source -
US Patent:20140224661, Aug 14, 2014
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Filed:Jan 7, 2013
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Appl. No.:13/987311
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Inventors:- Fremont CA, US
Jian Zhou - West Linn OR, US
Edward C. Opocensky - Aloha OR, US
Jon Reid - Sherwood OR, US
Steven T. Mayer - Lake Oswego OR, US -
International Classification:H01L 21/768
H01L 21/67 -
US Classification:205 83, 2042287, 205104
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Abstract:In some method and apparatus disclosed herein, the profile of current delivered to the substrate provides a relatively uniform current density on the substrate surface during immersion. These methods include controlling the current density applied across a substrate's surface during immersion by dynamically controlling the current to account for the changing substrate surface area in contact with electrolyte during immersion. In some cases, current density pulses and/or steps are used during immersion, as well.
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Low Copper Electroplating Solutions For Fill And Defect Control
view source -
US Patent:20140209476, Jul 31, 2014
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Filed:Jan 29, 2013
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Appl. No.:13/753333
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Inventors:Jian Zhou - West Linn OR, US
Jon Reid - Sherwood OR, US -
International Classification:C25D 7/12
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US Classification:205123, 205136
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Abstract:Certain embodiments herein relate to a method of electroplating copper into damascene features using a low copper concentration electrolyte having less than about 10 g/L copper ions and about 2-15 g/L acid. Using the low copper electrolyte produces a relatively high overpotential on the plating substrate surface, allowing for a slow plating process with few fill defects. The low copper electrolyte may have a relatively high cloud point.
Isbn (Books And Publications)
Myspace
News
Digital COVID-19 vaccine records encouraged in Utah - fox13now.com
view source- "This is a process called vaccine credentialing and its a way for you to get verification of your vaccine status, whether thats for COVID or other vaccines," said Jon Reid, the Immunization Program Manager with the Utah Department of Health.
- Date: Aug 22, 2021
- Category: More news
- Source: Google
States ramp up for biggest vaccination effort in US history
view source- Supplying that inventory information might be a staffing strain for some providers, including a hospital in Utah that said it only has one person who currently enters the information, said Jon Reid, who manages the state's immunization registry.
- Date: Nov 13, 2020
- Category: More news
- Source: Google
Chickens used to fight West Nile Virus
view source- At this northside San Bernardino sentinel outpost, White Leghorn hens No. 2033 and 2040 have tested positive for the West Nile virus, said Jon Reid, who works in the countys mosquito and vector control program.
- Date: Aug 11, 2014
- Category: Health
- Source: Google
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