Jonathan D Goetz

age ~65

from Sarver, PA

Also known as:
  • Jonathan R Goetz
  • John D Goetz
Phone and address:
408 Primrose Dr, Sarver, PA 16055
7248224163

Jonathan Goetz Phones & Addresses

  • 408 Primrose Dr, Sarver, PA 16055 • 7248224163
  • Butler, PA
  • Gibsonia, PA
  • Columbus, OH
  • Portersville, PA
  • Dallas, TX
  • 408 Primrose Dr, Sarver, PA 16055

Work

  • Position:
    Professional/Technical

Education

  • Degree:
    Graduate or professional degree

Resumes

Jonathan Goetz Photo 1

Electronic Technician

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Work:
Us Navy
Electronic Technician
Jonathan Goetz Photo 2

Jonathan Goetz

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Jonathan Goetz Photo 3

Jonathan Goetz

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Location:
United States

Us Patents

  • Coating Compositions Which Contain A Low Surface Tension (Meth) Acrylate Containing Block Copolymer Flow Control Agent

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  • US Patent:
    6583223, Jun 24, 2003
  • Filed:
    Sep 27, 2001
  • Appl. No.:
    09/965547
  • Inventors:
    Jonathan D. Goetz - Sarver PA
    Kurt A. Humbert - Pittsburgh PA
    Karl F. Schimmel - Verona PA
    Karen A. Barkac - Murrysville PA
    Simion Coca - Pittsburgh PA
    Joanne H. Smith - Allison Park PA
  • Assignee:
    PPG Industries Ohio, Inc. - Cleveland OH
  • International Classification:
    C08L 5300
  • US Classification:
    525 88, 525 92 R, 525 92 H, 525 93, 525 94
  • Abstract:
    A thermosetting composition that includes a first reactant having functional groups; a second reactant having functional groups coreactive with the functional groups of the first reactant; and a block copolymer flow control agent. The block copolymer includes a first block made up of residues of a radically polymerizable fluoroalkyl(meth)acrylate monomer, a second block made up of residues of a second radically polymerizable ethylenically unsaturated monomer, and optionally a third block made up of residues of a third radically polymerizable ethylenically unsaturated monomer. The first, second and third blocks are made of different residues from each other and the block copolymer has a polydispersity index of less than 2. 5. Also disclosed is a method of coating a substrate including the steps of applying the present thermosetting composition to the substrate; coalescing the thermosetting composition to form a substantially continuous film; and curing said thermosetting composition by the application of heat.
  • Low Surface Tension (Meth) Acrylate Containing Block Copolymer Prepared By Controlled Radical Polymerization

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  • US Patent:
    6586530, Jul 1, 2003
  • Filed:
    Sep 27, 2001
  • Appl. No.:
    09/965546
  • Inventors:
    Jonathan D. Goetz - Sarver PA
    Kurt A. Humbert - Pittsburgh PA
    Karl F. Schimmel - Verona PA
    Karen A. Barkac - Murrysville PA
    Simion Coca - Pittsburgh PA
    Joanne H. Smith - Allison Park PA
  • Assignee:
    PPG Industries Ohio, Inc. - Cleveland OH
  • International Classification:
    C08F25900
  • US Classification:
    525227, 525276, 525199, 525280, 5253312, 5253262, 525254, 5253265, 525294, 525295, 526169, 526170, 526171, 526172
  • Abstract:
    A block copolymer including a block of residues of a low surface tension (meth)acrylate monomer; a block of residues of a monomer free of hydroxyl group and amine group residues; and, optionally, a third block of residues of a monomer free of hydroxyl groups and amine groups. The first, second and third blocks are made of different residues from each other and the block copolymer has a polydispersity index of less than 2. 5. A controlled radical polymerization method is disclosed to make the low surface tension block copolymers. The method includes the steps of sequentially adding a first monomer composition that is free of hydroxyl groups and amine groups and a second monomer composition that includes the low surface tension monomer to a suitable atom transfer radical polymerization initiator and polymerizing the monomer compositions to form a block copolymer.
  • Photoimageable Electrodepositable Photoresist Composition For Producing Non-Tacky Films

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  • US Patent:
    52682560, Dec 7, 1993
  • Filed:
    Jan 6, 1992
  • Appl. No.:
    7/817207
  • Inventors:
    Jonathan D. Goetz - Gibsonia PA
    Charles F. Kahle - Allison Park PA
  • Assignee:
    PPG Industries, Inc. - Pittsburgh PA
  • International Classification:
    G03C 173
  • US Classification:
    430284
  • Abstract:
    An electrodepositable photoresist composition for producing non-tacky films on an electroconductive substrate comprises an aqueous dispersion of a water-dispersible photosensitive ionic polymeric material and a polyalkylene oxide-modified polysiloxane sufficient to give slip and blocking properties that enables direct placement of a photomask on the resultant dehydrated film. The composition also preferably contains a nonionic unsaturated material and a photoinitiator.
  • Block Copolymers

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  • US Patent:
    62881736, Sep 11, 2001
  • Filed:
    Jun 3, 1999
  • Appl. No.:
    9/325227
  • Inventors:
    Karl F. Schimmel - Verona PA
    Karen A. Barkac - Murrysville PA
    Kurt A. Humbert - Allison Park PA
    Jonathan D. Goetz - Sarver PA
    James B. O'Dwyer - Valencia PA
  • Assignee:
    PPG Industries Ohio, Inc. - Cleveland OH
  • International Classification:
    C08F29700
    C08F22034
    C08F22028
  • US Classification:
    525294
  • Abstract:
    Block copolymers containing at least two blocks are provided and comprise: (a) a first block containing residues of at least one first ethylenically unsaturated radically polymerizable monomer that is free of hydroxy functionality, e. g. , 2-ethylhexyl methacrylate, and a minor amount of at least one hydroxy functional ethylenically unsaturated radically polymerizable monomer, e. g. , hydroxypropyl methacrylate; and (b) a second block containing residues of at least one second ethylenically unsaturated radically polymerizable monomer that is free of hydroxy functionality, e. g. , iso-butyl methacrylate, and a minor amount of at least one hydroxy functional ethylenically unsaturated radically polymerizable monomer. The calculated Tg of the second monomer of the block copolymer is at least 20. degree. C. greater than the calculated Tg of the first monomer.
  • Thermosetting Coating Compositions Containing Flow Modifiers Prepared By Controlled Radical Polymerization

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  • US Patent:
    61978833, Mar 6, 2001
  • Filed:
    Jun 3, 1999
  • Appl. No.:
    9/325226
  • Inventors:
    Karl F. Schimmel - Verona PA
    Karen A. Barkac - Murrysville PA
    Kurt A. Humbert - Allison Park PA
    Jonathan D. Goetz - Sarver PA
    James B. O'Dwyer - Valencia PA
  • Assignee:
    PPG Industries Ohio, Inc. - Cleveland OH
  • International Classification:
    C08L 5300
    C08L 6300
    C08F 800
  • US Classification:
    525111
  • Abstract:
    Thermosetting coating compositions, e. g. , powder coating compositions, are provided and comprise: (a) a first reactant having functional groups, e. g. , an epoxide functional (meth)acrylic polymer; (b) a second reactant having functional groups that are co-reactive with the functional groups of the first reactant, e. g. , a carboxylic acid functional crosslinking agent; and (c) a polymeric flow control agent. The flow control agent is a block copolymer prepared by controlled radical polymerization and comprises: (i) a first block containing residues of at least one first ethylenically unsaturated radically polymerizable monomer that is free of hydroxy functionality; and (ii) a second block containing residues of at least one second ethylenically unsaturated radically polymerizable monomer that is free of hydroxy functionality. The second monomer of the flow control agent has a calculated Tg of at least 20. degree. C. greater than that of the first monomer.

Flickr

Youtube

"Valentine" by Kina Grannis by new guitar lea...

Love, it's a special day. we should celebrate and appreciate that you ...

  • Duration:
    2m 6s

thank you Stacy Abrams of the Great State of ...

  • Duration:
    37s

on behalf of the guy ya'll cancelled

  • Duration:
    52s

I would like to see immigration & justice ref...

  • Duration:
    24s

the love of God by Mercyme: The love of God i...

  • Duration:
    56s

Aaron Shust, Jonathan Dimmel, Joshua Aaaron, ...

ZION VERSE 1 O daughters of Zion O Abraham's sons (Psalm 105:6-9) Hear...

  • Duration:
    5m 12s

Classmates

Jonathan Goetz Photo 10

Jonathan Goetz

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Schools:
Canyon Del Oro High School Tucson AZ 1997-2001
Community:
Angelina Angel
Jonathan Goetz Photo 11

Jonathan Goetz

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Schools:
Jamestown High School Jamestown ND 1996-2000
Community:
Louis Mahinay, Mary Nestingen
Jonathan Goetz Photo 12

Jonathan Goetz

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Schools:
Page High School Edmonton Azores 1988-1992
Community:
Nikki Ringrose, Tannis Sears
Jonathan Goetz Photo 13

Jonathan Goetz

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Schools:
Gayville-Volin High School Gayville SD 1982-1986
Community:
Patty Ewalt, Terry Cowman, Amy Vollmer, Terrence Moore, Benjamin Clay, June Hsieh, Merk Oner, Patricia Sylliaasen, Chuck Price, Chuck Engen, Fast Fred
Jonathan Goetz Photo 14

Ryerson Public School, Ca...

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Graduates:
Jonathan Goetz (1995-1999),
Sara Renton (1994-1998),
Derek Smith (1975-1981),
Jen Skanes (1991-1992),
Rachel Weaver (1989-1996),
Lee Coombs (1979-1986)
Jonathan Goetz Photo 15

Gayville-Volin High Schoo...

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Graduates:
Jonathan Goetz (1982-1986),
Robert Gearhart (1987-1990),
Candace White (1970-1976),
Robin Jensen (1993-1997)
Jonathan Goetz Photo 16

Page High School, Edmonto...

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Graduates:
Jonathan Goetz (1988-1992),
Brandi Burlingame (1996-2000),
John Smithy (1997-2000),
Maneet Ahlawat (1997-2001),
Nadine Loutan (1998-2002)

Googleplus

Jonathan Goetz Photo 17

Jonathan Goetz

Relationship:
In_a_relationship
Jonathan Goetz Photo 18

Jonathan Goetz

Facebook

Jonathan Goetz Photo 19

Jonathan Goetz

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Jonathan Goetz Photo 20

Jonathan Goetz

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Jonathan Goetz Photo 21

Jonathan Goetz

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Jonathan Goetz Photo 22

Jonathan Goetz

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Jonathan Goetz Photo 23

Jonathan Goetz

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Jonathan Goetz Photo 24

Jonathan Goetz

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Jonathan Goetz Photo 25

Jonathan Goetz

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Jonathan Goetz Photo 26

Jonathan Goetz

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