Jonathan S Hodges

US Patent:

7894370, Feb 22, 2011

Filed:

Mar 9, 2007

Appl. No.:

11/716479

Inventors:

Rab Mukraj - Scarsdale NY, US
Jonathan Hodges - New York NY, US
Nader Kazemi - North Hollywood CA, US
Sumit Mathur - Fords NJ, US
Darren Tome - Long Island City NY, US

Assignee:

NBC Universal, Inc. - New York NY

International Classification:

H04L 12/24

US Classification:

370254, 709227

Abstract:

A system and method for transfer of digital content, including providing a listing of sources and content destinations, receiving a user selection of a content source and a destination from the source and destination listing, providing a listing of available paths for the exchange of digital content, receiving a user selection of a routing path from the routing path listing, and permitting transmission of the content from the selected source to the destination via the selected routing path.

US Patent:

20080219158, Sep 11, 2008

Filed:

Mar 9, 2007

Appl. No.:

11/716435

Inventors:

Rab Mukraj - Scarsdale NY, US
Jonathan Hodges - New York NY, US
Nader Kazemi - North Hollywood CA, US
Sumit Mathur - Fords NJ, US
Darren Tome - Long Island City NY, US

International Classification:

H04J 3/14

US Classification:

370230

Abstract:

A system and method for media content distribution, including establishing a relation between a content source and a content destination, at least one of the content source and the content destination being external to an entity that establishes the relation. Transmission of the content is permitted from the source to the destination only if the relation exists between the source and the destination.

US Patent:

20160052789, Feb 25, 2016

Filed:

Sep 1, 2015

Appl. No.:

14/841922

Inventors:

- New York NY, US
Dirk R. Englund - New York NY, US
Jonathan Hodges - Princeton NJ, US
Luozhou Li - Ridge NY, US
Matthew Trushem - Cambridge MA, US

Assignee:

THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK - New York NY

International Classification:

C01B 31/06
H01J 37/32
C09K 11/65

Abstract:

Techniques for fabricating diamond nanostructures including application of a self-assembled hard mask to a surface of a diamond substrate to define a pattern of masked regions having a predetermined diameter surrounded by an exposed portion. The exposed portion can be vertically etched to a predetermined depth using inductively coupled plasma to form a plurality of nanoposts corresponding to the masked regions. The nanoposts can be harvested to obtain a nanostructure with a diameter corresponding to the predetermined diameter and a length corresponding to the predetermined depth.