Jonathan W Mayo

US Patent:

20020182522, Dec 5, 2002

Filed:

Sep 5, 2001

Appl. No.:

10/178165

Inventors:

Ram Sabnis - Rolla MO, US
Jonathan Mayo - Rolla MO, US
Terry Brewer - Rolla MO, US
Michael Stroder - Springfield MO, US
Kiyomi Ema - Chiba-shi, JP
Yasuhisa Sone - Funabashi-shi, JP
Takayasu Nihira - Tokyo, JP
Kazuhiro Aoba - Narashino-shi, JP
Akira Yanagimoto - Tokyo, JP

International Classification:

G03C005/00

US Classification:

430/025000, 430/028000

Abstract:

A spin coatable, photosensitive black matrix coating having high surface resistivity and exhibiting an optical density greater than 3 at film thicknesses of 1 micron has been developed for flat panel display applications where a chrome/chrome oxide black matrix is usually employed. It possesses excellent thermal, light, and chemical stability and good shelf life. It is deposited and patterned by a simple photolithographic processes excellent thermal, light, and chemical stability and good shelf life. It is deposited and patterned by a simple photolithographic process, thereby reducing the cost of processing in relation to chrome/chrome oxide black matrix fabrication processes.

US Patent:

20030113640, Jun 19, 2003

Filed:

Oct 21, 2002

Appl. No.:

10/277654

Inventors:

Ram Sabnis - Rolla MO, US
Jonathan Mayo - Rolla MO, US
Terry Brewer - Rolla MO, US
Michael Stroder - Springfield MO, US
Kiyomi Ema - Chiba-shi, JP
Yasuhisa Sone - Funabashi-shi, JP
Takayasu Nihira - Tokyo, JP
Kazuhiro Aoba - Narashino-shi, JP
Akira Yanagimoto - Tokyo, JP

International Classification:

G03C005/00
G03C001/725

US Classification:

430/025000, 430/281100

Abstract:

A spin coatable, photosensitive black matrix coating having high surface resistivity and exhibiting an optical density greater than 3 at film thicknesses of 1 micron has been developed for flat panel display applications where a chrome/chrome oxide black matrix is usually employed. It possesses excellent thermal, light, and chemical stability and good shelf life. It is deposited and patterned by a simple photolithographic processes excellent thermal, light, and chemical stability and good shelf life. It is deposited and patterned by a simple photolithographic process, thereby reducing the cost of processing in relation to chrome/chrome oxide black matrix fabrication processes.

US Patent:

20040048197, Mar 11, 2004

Filed:

Sep 8, 2003

Appl. No.:

10/657436

Inventors:

Ram Sabnis - Rolla MO, US
Jonathan Mayo - Rolla MO, US
Terry Brewer - Rolla MO, US
Michael Stroder - Springfield MO, US
Kiyomi Ema - Chiba-shi, JP
Yasuhisa Sone - Funabashi-shi, JP
Takayasu Nihira - Tokyo, JP
Kazuhiro Aoba - Narashino-shi, JP
Akira Yanagimoto - Tokyo, JP

International Classification:

G03C001/725

US Classification:

430/286100, 430/281100, 430/025000, 430/028000

Abstract:

A spin coatable, photosensitive black matrix coating having high surface resistivity and exhibiting an optical density greater than 3 at film thicknesses of 1 micron has been developed for flat panel display applications where a chrome/chrome oxide black matrix is usually employed. It possesses excellent thermal, light, and chemical stability and good shelf life. It is deposited and patterned by a simple photolithographic processes excellent thermal, light, and chemical stability and good shelf life. It is deposited and patterned by a simple photolithographic process, thereby reducing the cost of processing in relation to chrome/chrome oxide black matrix fabrication processes.

US Patent:

57802017, Jul 14, 1998

Filed:

Sep 27, 1996

Appl. No.:

8/721841

Inventors:

Ram W. Sabnis - Rolla MO
Jonathan W. Mayo - Rolla MO
Edith G. Hays - Rolla MO
Terry L. Brewer - Rolla MO
Michael D. Stroder - Springfield MO
Akira Yanagimoto - Tokyo, JP
Yasuhisa Sone - Chiba, JP
Yoshitane Watanabe - Tokyo, JP
Kiyomi Ema - Chiba, JP

Assignee:

Brewer Science, Inc. - Rolla MO
Nissan Chemical Industries, Ltd. - Chiyoda-ku

International Classification:

G03F 7004

US Classification:

4302701

Abstract:

An organic black matrix having high resistivity (. gtoreq. 10. sup. 11 ohm/square), high optical density (. gtoreq. 2. 0) at ultra thin film thicknesses (. ltoreq. 1. 0 microns) for improved STN and TFT pixel display applications is made possible by combining polyimide/dye solutions and mixed metal oxide pigment dispersions at a weight/weight ratio of dye to pigment of 1:15 to 3:15. The need for low resistivity carbon black, as a replacement for sputtered chrome, is negated.