Joost J Vlassak

US Patent:

8265884, Sep 11, 2012

Filed:

Jul 21, 2009

Appl. No.:

12/506648

Inventors:

Han Li - Cambridge MA, US
Joost Vlassak - Lexington MA, US

Assignee:

President and Fellows of Harvard College - Cambridge MA

International Classification:

B82Y 30/00
G01N 33/00
G01N 3/42

US Classification:

702 33, 73 81, 73150 R, 73823, 702 85, 977956

Abstract:

A method of measuring the elastic modulus and hardness of a thin film on substrate using nanoindentation technique is provided. The method includes calculating a series of experimental corrected stiffness and contact radius pairs associated with one or more presumed parameters and information obtained from a loading curve associated with the thin film and substrate. Also, the method includes calculating a series of theoretical corrected stiffness and contact radius pairs associated with the same one or more presumed parameters and information obtained from the loading curve associated with the thin film and substrate. Furthermore, the method includes using results obtained from the experimental and theoretical corrected stiffness and contact radius pairs to compute the elastic modulus and hardness of the film material.

US Patent:

20070286769, Dec 13, 2007

Filed:

Jun 7, 2007

Appl. No.:

11/759497

Inventors:

Joost Vlassak - Lexington MA, US
Patrick McCluskey - Cambridge MA, US

International Classification:

G01N 25/20

US Classification:

422051000

Abstract:

A calorimetric system includes a plurality of cell structures being used to define a selective region for calorimetric measurements of a nano-structure. Heating units are positioned on the cell structures to provide the necessary energy needed to perform calorimetric measurements in each of the cell structures. The cell structures and the heating units are arranged so as to allow the calorimetric system to perform, in combinatorial fashion, calorimetric measurements associated with the nano-structure.

US Patent:

62478427, Jun 19, 2001

Filed:

Jun 15, 1999

Appl. No.:

9/334147

Inventors:

Vassili M. Kitch - San Ramon CA
Kevin C. Brown - Sunnyvale CA
Joost J. Vlassak - Palo Alto CA

Assignee:

National Semiconductor Corporation - Santa Clara CA

International Classification:

G01K 1500
G01K 716

US Classification:

374183

Abstract:

A method for determining the temperature of a wafer during processing is disclosed. A test wafer is specially prepared in conjunction with a calibration chart. The difference in stack sheet resistance of the test wafer before and after processing is plotted onto the calibration chart to determine the temperature of the test wafer during processing.

US Patent:

63197278, Nov 20, 2001

Filed:

Feb 8, 1999

Appl. No.:

9/246497

Inventors:

Joost Vlassak - Palo Alto CA

Assignee:

National Semiconductor Corporation - Santa Clara CA

International Classification:

H01L 2144

US Classification:

436652

Abstract:

A process for manufacturing metallic interconnect lines of low stress. Process steps according to the present invention first include a step of providing a semiconductor substrate (e. g. a silicon wafer) with an overlying insulating layer, followed by forming a multi-layer stack on the insulating layer. The multi-layer stack includes at least two adjoining layers: one being a metal M layer (for example an aluminum layer) and the other being a material Q layer, where material Q is a material that forms either (i) an electrically conductive intermetallic layer, or (ii) an electrically conducting solid solution layer, with metal M when subjected to the subsequent thermal treatment step. Silicon and titanium meet this requirement when metal M is aluminum. The multi-layer stack is then pattered to form a multi-layer metallic interconnect line.

US Patent:

20210353830, Nov 18, 2021

Filed:

May 14, 2021

Appl. No.:

17/320726

Inventors:

- Cambridge MA, US
- Seoul, KR
Kyu Hwan Oh - Seocho-Gu, KP
Joost J. Vlassak - Lexington MA, US
Zhigang Suo - Lexington MA, US
Jianyu Li - Cambridge MA, US
David J. Mooney - Sudbury MA, US

International Classification:

A61L 27/52
A61L 27/48
A61L 27/50
C08J 3/075
C08J 3/24
A61L 27/16
A61L 27/20
A61L 27/60
A61L 27/26
C08L 5/04
C08L 33/26
C08L 71/02

Abstract:

The invention features a composition comprising a self-healing interpenetrating network hydrogel comprising a first network and a second network. The first network comprises covalent crosslinks and the second network comprises ionic or physical crosslinks. For example, the first network comprises a polyacrylamide polymer and second network comprises an alginate polymer.

US Patent:

20200000967, Jan 2, 2020

Filed:

Jul 2, 2019

Appl. No.:

16/459907

Inventors:

- Cambridge MA, US
- Seoul, KR
Kyu H. Oh - Seocho-gu, KR
Joost J. Vlassak - Lexington MA, US
Zhigang Suo - Lexington MA, US
Jianyu Li - Cambridge MA, US
David J. Mooney - Sudbury MA, US

International Classification:

A61L 27/52
A61L 27/16
A61L 27/20
A61L 27/26
A61L 27/48
A61L 27/50
A61L 27/60
C08J 3/075
C08J 3/24
C08L 5/04
C08L 33/26
C08L 71/02

Abstract:

The invention features a composition comprising a self-healing interpenetrating network hydrogel comprising a first network and a second network. The first network comprises covalent crosslinks and the second network comprises ionic or physical crosslinks. For example, the first network comprises a polyacrylamide polymer and second network comprises an alginate polymer.

US Patent:

20190383758, Dec 19, 2019

Filed:

Nov 13, 2017

Appl. No.:

16/462059

Inventors:

- Cambridge MA, US
Joost J Vlassak - Lexington MA, US

International Classification:

G01N 25/48
B01L 7/00

Abstract:

A microcalorimeter device capable of measuring cellular bioenergetics and systems that are limited in analytic volume. The microcalorimeter device provides sub-nWatt resolution and even tens of pico-Watt resolution, thus enabling resolution of the metabolic rate of a single cell.

US Patent:

20180244858, Aug 30, 2018

Filed:

Sep 1, 2016

Appl. No.:

15/756054

Inventors:

- Cambridge MA, US
Zhigang Suo - Lexington MA, US
Joost J. Vlassak - Lexington MA, US

Assignee:

President and Fellows of Harvard College - Cambridge MA

International Classification:

C08J 3/075
C08J 3/24
G01L 1/14

Abstract:

Hydrogel compositions, and corresponding methods of making, are provided. The hydrogels do not freeze, or only partially freeze, over a wide range of temperatures below the freezing temperature of water. Concurrently, these hydrogels also retain their room temperature mechanical properties (e.g., strength, modulus, elasticity) over a wide range of temperatures, including temperatures below the freezing temperature of water. The hydrogels are synthesized by adding a suitable amount of a salt together with previously cross-linked polymer gel. Hydration of the gel with aqueous solutions containing the prescribed salts not only depresses the hydrogel freezing point but protects the structure. For example, the salts do not allow the hydrogel to completely freeze, thus protecting the hydrogel from brittle failure. Whether the hydrogels partially freeze or remain non-frozen when chilled below the freezing temperature of water is determined by concentration of salt within the hydrogel.